• Journal of the Korean Crystal Growth and Crystal Technology
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• v.10 no.5
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• pp.350-355
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• 2000

The fabrication of sapphire wafer in C plane has been developed by horizontal Bridgeman method and GaN based semiconductor epitaxial growth has been carried out in metal organic chemical vapour deposition. The single crystalline ingot of sapphire has been utilized for 2 inch sapphire wafers and wafer slicing and lapping machines were designed. These several steps of lapping processes provided the mirror-like surface of sapphire wafer. The measurements of the surface flatness and the roughness were carried out by the atomic force microscope. The GaN thin film growth on the developed wafer was confirmed the wafer quality and applicability to blue light emitting devices.

• Korean Journal of Crystallography
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• v.8 no.2
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• pp.75-80
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• 1997

A perovskite relaxor ferroelectrics PMN is used as an important material to investigate the diffusive phase transition phenomena. In this study PMN single crystals were grown and the microstructure were observed. For the growth of PMN single crystals, the spontaneous nucleation technique and the TSSG technique were used. 2-5mm single crystals were grown from PbO self flux and it was observed that only PMN crystals were grown when excess MgO was added over 100% as flux. Single crystals with well developed (001) faces were obtained from PbO-B2O3 flux. single crystals larger than 1 cm were grown from PbO-B2O3 flux by TXXG technique. For higher quality crystals, optimization of the variables such as the rotation speed of seed crystal, the orientation of seed crystal, and cooling rate is needed. With grown crystals, it was confirmed by TEM diffraction pattern of thin plate crystal that the 1:1 ordering of Mg2+ and Nb5+ with small volume exists.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.10 no.6
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• pp.389-393
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• 2000

High-quality $Er^{3+}$ doped Mg : $LiNbO_3$single crystal fibers were grown by a micro-pulling down ($\mu$-PD) method. Single crystal fibers were pulled down through the nozzle, at a pulling down rate of 0.5 mm/min and using a Pt crucible with a nozzle 1 mm in diameter in air atmosphere. Defects such as bubbles, cracks and inclusions were not detected in any of the grown crystals. The optical transmission of Er : Mg : $LiNbO_3$crystal was measured and the energy levels of $Er_2O_3$ ion could be calculated. The photoluminescence spectrum of crystal fibers showed an energy band emission with the strongest line corresponding to the $^4I_{3/2}{\to}^4I_{15/2}$transition. The concentration dependence of the entire wavelength region emission intensity upon excitation intensity measured emission intensity for the 3 mol% MgO doped fibers was larger than that for the 1, 5 mol% MgO doped fibers.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.3 no.2
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• pp.125-130
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• 1993

We has made 2-zone vertical electric furnace and has been grown CdS single crystal by sublimation method in crystal growth tube with tail tube without seed crystal for growth. While it has been growing, temperature difference ${\Delta}T$ of source and growth part has nearly agreed with theoritical value $14.7^{\circ}C$and experimental value $15^{\circ}C$ Then, crystal of best quality has been grown, when temperature of tail tube has been $110^{\circ}C$, in spite of quickly pulling up crystal growth tube a degree O.38mm per hour. The grown crystal have had hexagonal structure and single crystal with c-axis to length of crystal growth tube from X- ray diffraction pattern of powder method and Laue pattern of back reflection Laue method. Also, the mobility and carrier density from Hall effect measurement have been $316cm^2/V{\cdot}sec$ and $2.90{\times}10^{16}cm^{-3}$ at the room temperature, respectively.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.24 no.5
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• pp.190-195
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• 2014

Because of the temperature gradient occurring during the growth of the ingot with directional solidification method, defects are generated and the residual stress is produced in the ingot. Changing the growth and cooling rate during the crystal growth process will be helpful for us to understand the defects and residual stress generation. The defects and residual stress can affect the properties of wafer. Generally, it was found that the size of grains and twin boundaries are smaller at the top area than at the bottom of the ingot regardless of growth and cooling condition. In addition to that, in the top area of silicon ingot, higher density of dislocation is observed to be present than in the bottom area of the silicon ingot. This observation implies that higher stress is imposed to the top area due to the faster cooling of silicon ingot after solidification process. In the ingot with slower growth rate, dislocation density was reduced and the TTV (Total Thickness Variation), saw mark, warp, and bow of wafer became lower. Therefore, optimum growth condition will help us to obtain high quality silicon ingot with low defect density and low residual stress.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.26 no.1
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• pp.8-13
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• 2016

A top-seeded solution growth (TSSG) is a method of growing SiC single crystal from the Si melt dissolved the carbon. In this study, multiphysics modeling was conducted using COMSOL Multiphysics, a commercialized finite element analysis package, to get analytic results about electromagnetic analysis, heat transfer and fluid flow in the Si melt. Experimental results showed good agreements with simulation data, which supports the validity of the simulation model. Based on the understanding about solution growth of SiC and our set-up, crystal growth was conducted on off-axis 4H-SiC seed crystal in the temperature range of $1600{\sim}1800^{\circ}C$. The grown layer showed good crystal quality confirmed with optical microscopy and high resolution X-ray diffraction, which also demonstrates the effectiveness of the multiphysics model to find a process condition of solution growth of SiC single crystal.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.18 no.5
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• pp.184-190
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• 2008

$CaMoO_4$ crystals with ellipsoid, peanut, dumbbell, and notched sphere shapes were synthesized using a simple precipitation reaction. The morphology of $CaMoO_4$ crystals evolved from ellipsoids, through peanut-like structures and dumbbells, to notched spheres with increasing the concentration of $Ca^{2+}$ and $MoO_4^{2-}$ ions. This morphology evolution of $CaMoO_4$ crystals is attributed to a fractal mechanism. Branched crystal growth started at both ends of the ellipsoids. The peanut-like and dumbbell morphologies were formed by the first and second fractal growths, respectively. Finally, the notched spheres were formed by further fractal growth of dumbbells.

• Proceedings of the Materials Research Society of Korea Conference
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• 2011.05a
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• pp.39.1-39.1
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• 2011

본 연구에서는 전해증착법을 이용하여 결정성 ZnTe 나노와이어를 성장시켰고, 구조적 및 전기적 특성을 평가하였다. 또한 나노와이어 성장에 앞서, 결정성 ZnTe 박막을 전해증착법으로 형성하였고, 그 박막의 특성을 관찰하였다. 화학양론적(stoichiometric) 조성을 가지는 박막을 성장시키기 위하여, 순환전류전압법(cyclicvoltammetry)을 이용하여 Zn, Te, 이온들과 구연산 착화체(citrate-complexes)로 구성된 수용액 전해질에서 각 원소의 환원전위 분석이 이루어졌고, 과전압(overpotential)과 전해질 온도와 농도등과 같은 전해증착 조건에 따라 박막을 증착하였다. 각 조건에서 전해증착된 박막은 주사전자현미경(SEM)과 EDS를 이용하여 표면과 두께 그리고 성분분석을 하였고, XRD 분석법을 이용하여 박막의 결정성 변화를 관찰하였다. 박막증착 실험에서의 알맞은 증착조건을 나노와이어 전해증착실험에 적용하여, 다공성의 양극산화알루미늄(Anodic Aluminium Oxide, AAO) 템플레이트를 이용하여 bottom-up 방식으로 결정성 ZnTe 나노와이어를 성장시켰다. 수산화 나트륨(NaOH)용액을 이용하여 템플레이트를 선택적으로 에칭하여 제거한 후, ZnTe 나노와이어의 구조적 및 전기적 특성을 분석하였다.

• Korean Journal of Crystallography
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• v.14 no.2
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• pp.84-92
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• 2003

The fast pulling is easy to modify the distribution of grown-in defects toward fine size, which can be readily removed by additional treatment. In this experiment, The fast pulled crystals with high pulling late over 1.0 mm/min were grown and their grown-in defect distributions were investigated. In our recent developments in the growth of Cz-Si, it could be found that the cooling rate in a specific temperature range and the uniformity of temperature gradient at solid/liquid interface are more important for the formation of grown-in defect than the pulling rate itself. We analyzed these cooling rates and temperature gradients for the various fast pulled crystals and compared them to the observed formation behavior of the grown-in defects. The effective factor (Ω) for the void defect formation was introduced and it could explain the radial distribution of void defects in the fast-pulled crystals effectively.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.1 no.1
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• pp.117-126
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• 1991

Silicon single crystal is the most frequently used materials for the semiconductor device fabrication, The crystal growth techniques have been steadily improving for achieving a greater degree of crystal perfection and large ingot size. This report present the advantages, disadvantages and technical problems of the various crystal pulling technique briefly on the economic impact of productivity. Also, future directions of the pulling technique and process including the economical and quantitative aspects are deal with.