Atomic Layer Deposition of ZrSiO4 and HfSiO4 Thin Films using a newly designed DNS-Zr and DNS-Hf bimetallic precursors for high-performance logic devices (DNS-Zr과 DNS-Hf 바이메탈 전구체를 이용한 Gate Dielectric용 ZrSiO4 및 HfSiO4 원자층 증착법에 관한 연구)
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- Proceedings of the Korean Institute of Surface Engineering Conference
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- 2017.05a
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- pp.138-138
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- 2017