• Title/Summary/Keyword: 강유전 특성

Search Result 340, Processing Time 0.032 seconds

Electronic Properties of Polymer LB Films for the Metal Ion Concentration (금속이온 농도에 의한 고분자 LB막의 전자 특성)

  • 박재철;정상범;유승엽
    • Journal of the Institute of Electronics Engineers of Korea TE
    • /
    • v.37 no.2
    • /
    • pp.1-5
    • /
    • 2000
  • We have investigated dielectric properties of IMI-O LB films for the effect of complex concentration by electrical conductivity, dielectric constant and dielectric relaxation time at different frequencies. In the surface pressure-area$\pi$-A) isotherms for the increase of $FE^{3+}$ concentration, the molecular area was expanded with $FE^{3+}$concentration increase by electrostatic repulsion between the polymer chains and hydrophobic increase of ionic strength. In the I-V characteristics, it is found that the limiting area has effects on the change of conductivity And, the dielectric relaxation time decreased for increase of the $FE^{3+}$concentration.

  • PDF

Characterization of Ferroelectric Thin Film in Microwave Region (마이크로파대에서의 강유전 박막 유전 특성 평가)

  • Park, Jeong-Heum
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
    • /
    • v.17 no.10
    • /
    • pp.1061-1067
    • /
    • 2004
  • In this study, ferroelectric (Ba,Sr)TiO$_3$ and high temperature superconductor YBCO thin films were fabricated by PLD (Pulsed Laser Deposition) method and tuneable bandstop filters were implemented with two different IDC(Interdigital Capacitance) gap patterns, 20${\mu}{\textrm}{m}$ and 30${\mu}{\textrm}{m}$ using these two thin film layers. The resonant frequency was changed by DC bias voltage. By comparing measured results with simulation, the dielectric properties of ferroelectric thin film have been extracted. The permittivity was 820 ~ 900 at 30 K and had an acceptable error range but the loss tangent had a great difference, 0.018 in 30${\mu}{\textrm}{m}$ IDC gap pattern and 0.037 in 20 ${\mu}{\textrm}{m}$.

Characterization of Pt thin Fiims for Bottom Electrode of Ferroelectric Thin Films Using Metal-organic Chemical Vapor Deposition (강 유전체 박막을 위한 하부전극 MOCVD-pt 박막의 특성)

  • Gwon, Ju-Hong;Yun, Sun-Gil
    • Korean Journal of Materials Research
    • /
    • v.6 no.12
    • /
    • pp.1263-1269
    • /
    • 1996
  • 반도체 메모리 소자에 이용되는 하부전극의 Pt 박막을 MOCVD 증착방법을 이용하여 SiO2(100nm)/Si 기판위에 증착하였다. 반응개스로 O2개스를 사용하였을 경우에 순수한 Pt 박막을 얻었으며 증착층은(11)우선방향을 가지고 성장하였다. 증착온도가 45$0^{\circ}C$에서는 결정립 경계에 많은 hole이 형성되어 박막의 비저항을 증가시켰다. MOCVD에 의해 얻어진 Pt 박막은 전 증착온도범위에서 인장응력을 가지고 있었으며 40$0^{\circ}C$이상의 온도에서 hole이 형성되면서 응력은 감소하였다. MOCVD-Pt 위에 PEMOCVD로 증착한 강 유전체 SrBi2Ta2O9박막은 균일하고 치밀한 미세구조를 보였다.

  • PDF

Effect of B$_2$O$_3$ Addition on the Sintering Behavior Dielectric and Ferroelectric Properties of $Ba_{0.7}$Sr$_{0.3}$TiO$_3$Ceramics (저온 액상 소결제 B$_2$O$_3$ 첨가에 의한 $Ba_{0.7}$Sr$_{0.3}$TiO$_3$ 세라믹스의 소결거동 및 유전 강유전 특성변화)

  • 임성민;홍석민;박홍진;김옥경
    • Journal of the Korean Ceramic Society
    • /
    • v.36 no.7
    • /
    • pp.767-772
    • /
    • 1999
  • The effect of B2O3 addition on the sintering behavior dielectric and ferroelectric properties of Ba0.7Sr0.3TiO3 ceramics were investigated. The sample with 0.5wt% B2O3 was sintered under 115$0^{\circ}C$. The dielectric and ferroelectric properties of BST with 0.5wt% B2O3 was as good as BST without B2O3 sintered at 135$0^{\circ}C$ and its dielectric loss was even better When B2O3 was added over 1.0wt% the overdoped B2O3 remained in the specimens and formed a second phase which degraded the sintering behaivor dielectric properties of BST.

  • PDF

The Effect of Ar/O2 Partial Pressure Ratio on the Ferroelectric Properties of (Pb0.92La0.08)(Zr0.65Ti0.35)O3 Thin Films Deposited by RF Magnetron Sputtering Method (RF Magnetron Sputtering법으로 제작된 (Pb0.92La0.08)(Zr0.65Ti0.35)O3 박막의 Ar/O2 분압비에 따른 강유전 특성연구)

  • Kim, Sang-Jih;Yoon, Ji-Eon;Hwang, Dong-Hyun;Lee, In-Seok;Ahn, Jung-Hoon;Son, Young-Guk
    • Journal of the Korean Vacuum Society
    • /
    • v.18 no.2
    • /
    • pp.141-146
    • /
    • 2009
  • PLZT ferroelectric thin films were deposited on Pt/Ti/$SiO_2$/Si substrate with $TiO_2$ buffer layer in between by rf magnetron sputtering method. In order to investigate the effect of Ar/$O_2$ partial pressure ratio on the ferroelectric properties of PLZT thin films, PLZT thin films were deposited at various Ar/$O_2$ partial pressure ratio ; 27/1.5 seem, 23/5.5 seem, 21/7.5 seem and 19/9.5 seem. The crystallinities of PLZT thin films were analyzed by XRD. The surface morphology was observed using FE-SEM. The P-E hysteresis loops, the remanent polarization characteristics and the leakage current characteristics were obtained using a Precision LC. The crystallinity and elaborateness of PLZT thin films were decreased as increasing the oxygen partial pressure ratio. And preferred orientation of PLZT thin films changed from (110) plane to (111) plane. The oxygen partial pressure ratio affects the thin film surface morphology and the ferroelectric properties.

The Discharge and Ozone Generation Characteristics of Ferroelctric-Pellet Reactor for Ozone Generation (오존발생기용 강유전 펠렛 방전관의 방전 및 오존발생 특성)

  • Park, Myoung-Ha;Kwak, Dong-Joo
    • Proceedings of the KIEE Conference
    • /
    • 2000.07c
    • /
    • pp.2147-2149
    • /
    • 2000
  • The silent discharge is known to be one of the most effective methods for ozone generation. In this paper. in order to improve ozone concentration and energy yield, some kind of silent discharge-type reactors with different dielectric materials were prepared. Some silent discharge characteristics of these reactors were studied and discussed.

  • PDF

Simulataneous X-ray Diffraction Measurements of the Antiferroelectric-ferroelectric Phase Transition of PLZT under Electric Field (전장하에서 PLZTd의 반강유전-강유전 상전이의 동시적 X-선 회절 측정)

  • 고태경;조동수;강현구
    • Journal of the Korean Ceramic Society
    • /
    • v.33 no.11
    • /
    • pp.1292-1300
    • /
    • 1996
  • In-site X-ray diffraction measurements under electric field up to 20kV/ cm were carried out on PLZT (x/70/30) with x=7.5, 8.0, 8.5, and 10.5 All of PLZT belonged to cubic phases. At x=7.5, 8.0 and 8.5 PLZT behaved as an antiferroelectric under low electric fields up to 4-8 kV/cm. PLZT became ferroelectric at the higher electric fields. The high-temperature measurements on the dielectric constants of PLZT with x=7.5, 8.0 and 8.5 showed that they were similar to relaxor ferroelectrics and underwent a diffuse phase transition from antiferroelectrics to paraelectrics at 50-7$0^{\circ}C$. Their P-E hysteresis curves confirmed that they were antifer-roelectrics. The broad distribution of Curie points suggests that there is a significant disorder of cations and vacances in the crystal structure of those PLZT due to La-substitution. The variation of the lattice strain of PLZT(10.5/70/30) with electic field was very small and did not show any hysteresis confirming that it was paraelectric. The degree of the electric-induced strain variation decreased as La doping increased. In PLZT(7.5/70/30) the intensity of 110 reflection changes sensitively by applying electric field. Some domains with polarization parallel to [110] appeared to be developed in the field-induced ferroelectric phase of the PLZT.

  • PDF