• Title/Summary/Keyword: 감광제

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Ecological Studies on Heading of Rice Plant I. The Response to Photoperiod of Major Rice Varieties (수도의 출수생태에 관한 연구 제1보 주요수도 품종의 일장반응)

  • 최경구;장영남;이성춘
    • KOREAN JOURNAL OF CROP SCIENCE
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    • v.28 no.2
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    • pp.151-163
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    • 1983
  • This study was conducted to investigate the responses to photoperiod of some Korean rice cultivars at four levels of the day length, 10, 12, 14 and 16 hours. Generally the days to heading were reduced in the short day length. Japonica varieties seemed to have shorter basic vegetative growth phase and, were more sensitive to day length, while Japonica crossed Indica varieties showed longer basic vegetative growth phase and, were less sensitive to day length. All tested varieties could be classified into 19 ecotypes based on the periods of the basic vegetative growth phase and the sensitivity to day length.

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A Study on the Development of Electrophotographic Photoreceptor by Dye Sinsitized System (색소증감계를 이용한 전자사진 감광체개발에 관한 연구)

  • Jeong, Eun-Sil;Kim, Yeong-Sun;Jeong, Pyeong-Jin
    • Korean Journal of Materials Research
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    • v.3 no.5
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    • pp.505-513
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    • 1993
  • To make the electrophotographic photoreceptor that srnsirizes for panchromatic matcrial, the dying element of sunfasr yellow which has an absorption ivavclength at near 400nm, and $\alpha,\beta$-copper phthalocyaninc dying elements with 700nm absorption wavelength were adsorbed and then dispersed onto the zine oxide(Zn0). In ordcr to characterize rhe change In sensitivity the various binders and different mole ratio of ZnO to binder were employed in here. It was found rhat the optimum sensitivity was obtained with 5.5 ratio. I;rom the measurements of electrostatic and spectral sensitivity, it was found that the maximum photographic properties were obtained for mixing the sunfast yellow and $\beta$-copper phthalocyaninr. In this case the electrophotographic sensiri\ity was found to he $E{1:2}$= 1440 lux . sec. And also the spectral sensitivity shows that it had a good properties for panchromatic matcrial.

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Image Reversal Photoresist for the Single Isolation Structure of OLEDs (오엘이디의 단열 소자분리 구조를 위한 이미지 라버셜 감광제)

  • Lee, Seung-Jun;Sin, Yun-Su;Chae, Gyeol-Yeo;Im, Dae-U;Choe, Gyeong-Hui
    • Proceedings of the Optical Society of Korea Conference
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    • 2009.02a
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    • pp.541-542
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    • 2009
  • We have developed an image reversal photoresist with high thermal stability and electric insulating properties for the single isolation structure of OLEDs. The thermal stability and electric insulating properties are investigated and compared with those of conventional insulator and cathode separator materials. The single isolation structure using the image reversal photoresist reduces the fabrication process steps and cuts down the manufacturing cost.

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Design of inductively couple dplasma ashing chamber (유도 결합형 플라즈마를 이용한 감광제 제거 반응로의 설계)

  • 김철식;김철호;이현중;이용규;배경진;이종근;박세근
    • Proceedings of the IEEK Conference
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    • 1998.06a
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    • pp.339-342
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    • 1998
  • Plasma etching of photoresist needs high etch rate, good uniformity and rae, good uniformity and low damage in low cost. ICP asher is expected to satisfy these requriement for next eneration semiconductor devices. ICPsimulator has been used to design the ashing chamber to redcue the development time and cost, and its results have been verified by QMS, OES and langmuir probe measurments. Plasma characteristics are monitored in terms of RF power and chamber pressure.

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Synthesis and Photocharacteristics of Resorcinols Photoresist (Resorcinol계 Photoresist의 합성과 그 감광 특성)

  • Keun, Jang-Hyoun;Kim, Seung-Jin;Park, Hong-Soo
    • Applied Chemistry for Engineering
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    • v.5 no.4
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    • pp.662-668
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    • 1994
  • The cinnamoyl esters of polyresorcinol-formaldehyde glycidyl ether (RGEFC) with photosensitive functional group were prepared. Photosensitivity of RGEFC were investigated by the change of solubility before and after exposure to light. Various samples coated on glass plates were exposed to light under various conditions and steeped in the same solvent as used for coating, and then the yield of residual film was calculated. The yield of the residual film which was closely related to the sensitivity of the film, was affected by the degree of polymerization of the backbone resin, sensitizers and their concentration. The sensitivity was depended upon the degree of polymerization. Most effective sensititizer for RGEFC among the sensitizers used was 2,6-dichloro-4-nitroaniline.

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축전결합형 고주파 $BCl_3$/He 플라즈마를 이용한 GaAs와 AlGaAs의 건식식각

  • Lee, Seong-Hyeon;Sin, Ju-Yong;Park, Ju-Hong;Choe, Gyeong-Hun;Song, Han-Jeong;Lee, Je-Won
    • Proceedings of the Korean Vacuum Society Conference
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    • 2010.08a
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    • pp.221-221
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    • 2010
  • 본 실험에서는 축전결합형 고주파 플라즈마와 $BCl_3$와 He의 혼합가스를 이용하여 화합물 반도체인 GaAs와 AlGaAs의 건식식각에 대해 연구하였다. 공정변수로는 첫째, BCl3와 He의 혼합가스 비율을 0%에서 100%까지 변화시켰다. 둘째, 고주파 파워를 50 W에서 200W 까지 변화를 주었고, 셋째, 공정압력을 120 mTorr~300 mTorr 까지 변화시켰다. 식각 실험을 마친 시료는 표면 단차 측정기와, 주사전자현미경을 이용하여 식각률과 선택비, 표면거칠기, 표면형상에 대하여 분석을 진행하였다. 또한, 광학발광분석계 (OES)를 이용하여 건식식각 실험 중 혼합가스에 의해 발생하는 플라즈마의 발광특성에 대한 실시간 분석을 하였다. 결과에 따르면, 1) 혼합가스에서 He의 비율이 20%일 때 GaAs와 AlGaAs 시료의 식각율이 $0.7\;{\mu}m/min$$0.6\;{\mu}m/min$ 로 가장 높게 나타났다. 2) 감광제에 대한 시료의 선택비 또한 동일 조건에서 GaAs의 경우 1 : 12, AlGaAs의 경우 1:8로 가장 높게 나타났다. 3)고주파 파워의 변화에 따른 식각률의 경우 100 W에서 GaAs 의 경우 $0.6\;{\mu}m/min$, AlGaAs의 경우 $0.5\;{\mu}m/min$ 이었고, 고주파 파워가 증가할수록 식각률은 감소하였다. 4) 감광제에 대한 시료의 식각 선택비의 경우 50 W에서 GaAs 시료가 1:14, AlGaAs 시료가 1:10으로 가장 높은 선택비를 보였고 고주파 전원이 증가할수록 선형적으로 감소하였다. 5) 표면거칠기는 50~100 W 구간에서는 1.0~1.5 nm 으로 큰 증가폭이 없다가 150 W 이상에서는 3.0~5.0 nm 으로 증가하였다. 반응기의 압력이 120 mTorr에서 300 mTorr로 변화할 때 식각률과 선택비는 비교적 선형적으로 감소하였으며, 표면거칠기 또한 증가하였다. 결론적으로 $BCl_3/He$ 고주파 플라즈마에서 약 20%의 He을 포함하고 있을 때 가장 우수한 건식 식각 결과를 얻었다.

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Microbial degradation and other methods for accelerated degradation the Herbicide Imazapyr (제초제 Imazapyr 의 미생물에 의한 분해 및 기타 방법에 의한 분해 촉진)

  • Lee, Jae-Koo;Kwon, Jeong-Wook
    • Korean Journal of Environmental Agriculture
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    • v.17 no.1
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    • pp.5-10
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    • 1998
  • The microbial degradation, photosensitizer-mediated photolysis, and bioceramic- accelerated degradation of the herbicide imazapyr were investigated using four types of soil. 1. Seven strains of microorganisms isolated from the soil A and the active sludge collected from the waste water disposal plant in CheongJu did not give any distinct degradation products in pure culture. When imazapyr (10ppm) was incubated for 14days with each of the 6strains of the known bacteria, they did not produce any noticeable products, either, suggesting that imazapyr was degraded very little by microorganisms in aqueous media. Meanwhile, when 50ppm of imazapyr was incubated in soil A and B for 6months, a degradation product of m/z 279 was detected. It turned out to be 2-[(1-carbamoyl-1,2-dimethylpropyl)carbamoyl]nicotinic acid, which was formed by the hydrolytic cleavage of the imidazolinone ring and by tautomerism. When imazapyr was exposed to sunlight, degradation rates were 14.6% under the control and 66.0, 76.5, 26.7, and 90.0% in the presence of PS-1 (100ppm), PS-1 (200ppm), PS-2(100ppm), and PS-3(100ppm), respectively, and a degradation product of m/z 149 was tentatively identified in the treatment of PS-1. 2. When soil C and D treated with bioceramic were incubated for 7weeks, the $^{14}C$-activities of $^{14}CO_2$ evolved were 2.03 and 1.12% of the originally applied ones, respectively, whereas those in control soils without bioceramic were 1.88 and 0.82% showing no significant defferences.After 5 weeks, however,the differences in the amounts of $^{14}CO_2$ between the two treatments increased gradually, suggesting the bioceramic effect.

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뉴 리얼라 테크놀러지 선명한 색상과 리얼리즘 구현

  • 윤형재
    • The Optical Journal
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    • v.11 no.4 s.62
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    • pp.56-59
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    • 1999
  • 후지필름(주)이 지난 4월 새로 내 놓은 필름 뉴 수퍼리아 시리즈 기술의 핵심은 '제4감광층 기술(일명 뉴 리얼라 기술)'이다. 이것은 인간의 눈을 통해 본 것이 뇌에 도달하는 과정 중에 일어나는 변화를 필름에 도입하기 위해 억제와 색소 보정이라는 발상을 도입한 특허 기술이다. 이 기술을 채용한 필름은 기존 필름에 비해서 그린을 억제해서 옐로우가 보다 충실하게 재현된다.

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Fabrication of Hydrogel and Gas Permeable Membranes for FET Type Dissolved $CO_{2}$ Sensor by Photolithographic Method (사진식각법을 이용한 FET형 용존 $CO_{2}$ 센서의 수화젤막 및 가스 투과막 제작)

  • Park, Lee-Soon;Kim, Sang-Tae;Koh, Kwang-Nak
    • Journal of Sensor Science and Technology
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    • v.6 no.3
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    • pp.207-213
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    • 1997
  • A field effect transistor(FET) type dissolved carbon dioxide($pCO_{2}$) sensor with a double layer structure of hydrogel membrane and $CO_{2}$ gas permeable membrane was fabricated by utilizing a $H^{+}$ ion selective field effect transistor(pH-ISFET) with Ag/AgCl reference electrode as a base chip. Formation of hydrogel membrane with photo-crosslinkable PVA-SbQ or PVP-PVAc/photosensitizer system was not suitable with the photolithographic process. Furthermore, hydrogel membrane on pH-ISFET base chip could be fabricated by photolithographic method with the aid of N,N,N',N'-tetramethyl othylenediarnine(TED) as $O_{2}$ quencher without using polyester film as a $O_{2}$ blanket during UV irradiation process. Photosensitive urethane acrylate type oligomer was used as gas permeable membrane on top of hydrogel layer. The FET type $pCO_{2}$ sensor fabricated by photolithographic method showed good linearity (linear calibration curve) in the range of $10^{-3}{\sim}10^{0}\;mol/{\ell}$ of dissolved $CO_{2}$ in aqueous solution with high sensitivity.

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