• The Korean Journal of Pesticide Science
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• v.4 no.4
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• pp.12-18
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• 2000

In order to artificially reduce the quinclorac residue in aqueous solution and soil, six potential photosensitizers were screened for their effectiveness in enhancing the photodegradation. The degraded amount of quinclorac in distilled water by sunlight was minor compared to that in the dark, indicating that there was little direct photolysis. The photodegradation ratio of quinclorac in methanol was 40.3%. Whereas, the ratios in the presence of photosensitizers PS-1 (aromatic ketone), PS-3 (polycyclic quinone), and PS-6 (inorganic semiconductor) were 96.6, 72.7, and 95.7%, respectively, showing the most photosensitizing effects. In sand, PS-3 was more effective than any other photosensitizer PS-1 (19.6%), PS-3 (64.1%) and PS-6 ($17.9{\sim}19.4%$). five photoproducts of quinclorac in methanol were identified by GC-MS and quinclorac added with the photosensitizer PS-1 gave three photoproducts. Photoproducts with an aldehyde group formed in methanol were confirmed by the reduction of sodium 3,5-dinitrosalicylate in the Lindsay's method. E. crus-galli war. oryzicola was not controlled by the quinclorac residues photodegraded at tile concentrations higher than 30 ppm of the photosensitizer PS-3 in a flooded rice paddy soil. These results indicate that the quinclorac residues in aqueous solution and soil can be degraded efficiently by tile photosensitizers PS-1, PS-3, and PS-6.

• The Korean Journal of Pesticide Science
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• v.3 no.2
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• pp.47-53
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• 1999

Photosensitizing activities of some photosensitizers (PS) for the artificial diminution of pesticide residues on horticultural crops were investigated. Five fungicides, iprodione, bitertanol, chlorothalonil, myclobutanil, and dichlofluanid were sprayed on apple and cucumber, followed by the application of each selected photosensitizer, and the samples were collected 0, 1, 3, 7, 15 days after the photosensitizer application and analyzed for the residual amounts. Of the 40 photosensitizers tested, six selected on the basis of the eliminating effect of pesticide residues were PS-1 (aromatic ketone), PS-2 (aromatic amine), PS-3 (quinone), PS-4 (inorganic compound), PS-5 (organic acid salt), and PS-6 (semiconductor photocatalyst). The residual amount of iprodione after 15 days of the application of PS-1 was 74% of that of the control. For bitertanol, the residual amount after 15 days of the application of PS-1 accounted for 78% of that of the control. The residual amounts of chlorothalonil after 1 day of the application of PS-1 and PS-2 accounted for 56 and 54% of those of the control, respectively. The residual amounts of iprodione on cucumber after 3 days of the application of the photosensitizers PS-1 and PS-2 were 44 and 67% of those of the untreated control, respectively. For myclobutanil, the residual amount after 15 days of the application of PS-6 accounted for 45% of that of the control. In case of dichlofluanid, the residual amount after 3 days of the application of PS-1 accounted for 44% of that of the control. Based on the results, PS-1 turned out to be the most promising photosensitizer for the accelerated photodegradation of the above fungicides on apple and cucumber.

• Korean Journal of Food Science and Technology
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• v.54 no.3
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• pp.272-279
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• 2022

Polyphenols are chemically unstable, and their bioactivities are reduced through oxidation. Photosensitizers (PS) induce photo-oxidation in various food systems. In this study, effects of dietary PS such as riboflavin (Rb), erythrosin B (EB), and zinc protoporphyrin on the auto-oxidation of polyphenols, gallic acid (GA) and tannic acid (TA) were evaluated under a fluorescent light. The formation of oxidation products from GA and TA increased in a PS concentration- and irradiation time-dependent manner. In addition, Rb and EB induced significant reduction in the polyphenols contents and ABTS radical scavenging activity of GA and TA under light. PS significantly enhanced the amount of reactive oxygen species generated from GA and TA. Therefore, the interaction of polyphenols with PS under light results in acceleration of polyphenol oxidation. This phenomenon should be carefully considered during food processing and storage.

• Korean Journal of Food Science and Technology
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• v.54 no.1
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• pp.1-7
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• 2022

Riboflavin (Rb), in the presence of methionine (Met) under light, generates superoxide radicals that can reduce nitro blue tetrazolium (NBT) to its corresponding formazan. The Rb-Met/NBT system has been used to measure the superoxide dismutase (SOD)-like activities of various antioxidants. However, the reaction mechanisms have not been clearly defined, and the assay conditions are not consistent. In this study, the effects of different photosensitizers and amino acids on NBT reduction in different solvents were investigated. NBT reduction in the Rb-Met/NBT system was more pronounced in phosphate-buffered saline, compared to distilled water or Tris (pH 7.5); histidine (His) instead of Met also led to considerable Rb-induced NBT reduction. Among the photosensitizers, methylene blue with His caused potent NBT reduction in Tris. Rb-induced NBT reduction combined with Met or His was quantitatively inhibited by SOD or gallic acid, but did not affect MB-induced reduction sensitively.

• Proceedings of the Korean Society Of Semiconductor Equipment Technology
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• 2005.05a
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• pp.168-172
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• 2005

본 연구에서는 평판 디스플레이 Photo공정 중에서 무회전 도포(Spinless Coating)방식으로 기판(Glass)에 감광제 약액을 도포한 후 용매(Solvent)를 제거시키기 위한 진공건조장치(Vacuum dryer)에서 감광제 도포막의 품질에 영향을 주지 않는 범위 안에서의 용매 제거시간을 단축하기 위한 진공챔버의 용적에 따른 진공포트의 크기 및 배치에 대한 최적화를 구현하였다. 구현된 챔버의 용적과 진공포트의 크기 및 배치를 바탕으로 진공건조장치를 챔버, 챔버 구동부, 기판 구동부, 진공펌프, 그리고 $N_2$ 공급부로 모듈화하여 구성하였으며. 실제 도포 기판을 이용하여 진공건조를 실시한 후 도포막을 검사함으로써 진공포트에 대한 최적화를 검증함과 동시에 진공건조 능력을 확인하였다.

• Korean Journal of Optics and Photonics
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• v.16 no.6
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• pp.508-515
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• 2005

We propose a fabrication method for refractive lens by variable velocity moving mask lithography and slit pattern. Distribution of exposure dose should be controlled for the curved photoresist surface that works as a refractive surface. We analyze theoretically the distribution of exposure dose by change of moving velocity, moving direction of mask and the shape of mask pattern, and confirm for the curved surface experimentally. The lens could have sag height of a few of hundreds ${\mu}m$, by using thick photoresist or Deep RIE process.

• Clean Technology
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• v.24 no.3
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• pp.175-182
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• 2018

In this research, we investigated the cleanliness by optimizing the water content of the aqueous stripper in fluidic strip process. The stripping properties of the photoresist with optimized aqueous stripper were compared with the commercial organic stripper. The stripping performance was evaluated by electrical and optical characteristics on the surface of the transparent electrode that compare with stripped the transparent electrode surface and the rare surface before patterning by the photoresist. As a result of the photoresist stripping process of the organic stripper and the aqueous stripper optimized for water content, the aqueous stripper exhibited better electrical and optical characteristics than the organic stripper. In the case of the fluidic strip process with organic stripper, the photoresist dissolves in the stripper solution during stripping which can cause re-adsorption by contamination. Whereas that the aqueous stripper under development seems to decrease the photoresist dissolution in the stripper solution. Because the cyclodextrin contained in the stripper captures organic photoresist into hall of cyclodextrin which stripped through swelling and tearing. The photoresist residue captured by the cyclodextrin can be filtered. After the fluidic stripping process by different chemical stripping mechanism, the cleanliness of the organic stripper and aqueous stripper was compared and analyzed.

• Electrical & Electronic Materials
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• v.9 no.9
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• pp.918-924
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• 1996

A downstream oxygen plasma is generated by capacitively coupled RF power and applied to photoresist stripping. Stripping rate (ashing rate) is measured in terms of RF power, chamber pressure, oxygen flow rate and temperature. Ashing reaction is thermally activated and depends on oxygen radical density. The ashing process is optimized to have the high ashing rate, good uniformity and minimal plasma damage using a statistical method.

• Proceedings of the Optical Society of Korea Conference
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• 2001.02a
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• pp.78-79
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• 2001

노광 후 지연(Post Exposure Delay： PED) 효과는 그림 1과 같이 노광 후 지연 시간에 따른 감광제의 Profile에 thinning, T-top, foot, undercut 를 보여주는 현상으로 화학 증폭형 감광제(Chemically Amplified Resist, CAR) 개발에 있어 PED의 안정성은 중요한 요소이다(1). 따라서 노광후 지연 효과에 대한 모델링은 연구와 개발을 위한 시뮬레이션 tool에 있어 매우 의미 있는 일이다. T-top 이나 undercut 를 형성하는 Surface inhibition layer(SIL) 은 노광 후 지연시 발생되는 environmental base contamination, acid evaporation 이 주요 원인이며 다른 원인으로는 감광제 속에서 acid migration, spin coating 동안에 photoacid generator (PAG)의 고갈, internal basic impurities 이며 그 외에 nonbsic atmospheric contamination, high power laser source의 영향 등이 있다. (중략)

• Korean Journal of Environmental Agriculture
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• v.19 no.2
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• pp.116-121
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• 2000

Photosensitizing activities of some selected photosensitizers (PS) on the artificial diminution of pesticide residues on red pepper were investigated. Red peppers were sprayed 4 times with the three fungicides, dithianon, triflumizole, and triforine, according to the conventional method, followed by the application of photosensitizers once. Recoveries for the analyses of the pesticide residues were high $(90.7{\sim}98.5%)$ except for dithianon $(76.6{\sim}78.3%)$. In case of dithianon, after 1 day of the application of PS-1 (10 ppm), the residual amount was 76% of that of the control. For triflumizole, the residual amount after 3 days of the application of PS-4 (50 ppm) accounted for 48% of that of the control. In case of triforine, the residual amount after 1 day of the application of PS-3 (100 ppm) was 55% of that of the control. The results indicated that the photosensitizing activities of photosensitizers varied with chemicals and the matrices where pesticide residues are remaining.