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http://dx.doi.org/10.3807/KJOP.2005.16.6.508

Generation of Lens surface by moving mask lithography  

Lee Joon-Sub (Micro Optics Laboratory, Department of Physics, Hanyang University)
Park Woo-Jae (Micro Optics Laboratory, Department of Physics, Hanyang University)
Song Seok-Ho (Micro Optics Laboratory, Department of Physics, Hanyang University)
Oh Cha-Hwan (Micro Optics Laboratory, Department of Physics, Hanyang University)
Kim Pill-Soo (Micro Optics Laboratory, Department of Physics, Hanyang University)
Publication Information
Korean Journal of Optics and Photonics / v.16, no.6, 2005 , pp. 508-515 More about this Journal
Abstract
We propose a fabrication method for refractive lens by variable velocity moving mask lithography and slit pattern. Distribution of exposure dose should be controlled for the curved photoresist surface that works as a refractive surface. We analyze theoretically the distribution of exposure dose by change of moving velocity, moving direction of mask and the shape of mask pattern, and confirm for the curved surface experimentally. The lens could have sag height of a few of hundreds ${\mu}m$, by using thick photoresist or Deep RIE process.
Keywords
Lens fabrication; moving mask lithograghy; Lens array; toric lens; f-;
Citations & Related Records
Times Cited By KSCI : 1  (Citation Analysis)
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