• Journal of the Korean Vacuum Society
• /
• v.12 no.1
• /
• pp.55-63
• /
• 2003

A 150 kV gas cluster ion accelerator was constructed and the cluster sizes of $CO_2$ and $N_2O$ gases were measured using time-of-flight mast spectrometry. Through isolated cluster ion impact on a HOPG, hillock with 1 nm height and a few tenth m in diameter were found to be formed by an atomic force microscope. When monomer ion beams were irradiated on the hillocks existed on a ITO surface, they became sharper and the surface became rougher. But they changed into round-shaped ones by cluster ion irradiation and the surface became smooth after the irradiation of $5\times10^{-14}\textrm{cm}^2$ at 25 kV. As the cluster ion dose was varied, the change of surface morphology and roughness of Si was examined. At the lower dose, the density of hillocks and surface roughness were increased, called surface embossment process. And then after the critical dose at which the area of the formed hillocks equals to the unirradiated area, the sputtering from the hillocks was predominantly evolved, and dislocated atoms were diffused and filled among the valleys, called surface sputtering and smoothing process. At the higher ion dose, the surface consisting of loosely bounded atoms was effectively sputtered into the depth and etching phenomenon was happened, called surface etching process.

• Proceedings of the Materials Research Society of Korea Conference
• /
• 2002.05a
• /
• pp.27-27
• /
• 2002

• Proceedings of the Korean Ceranic Society Conference
• /
• 2003.10a
• /
• pp.23-23
• /
• 2003

• Proceedings of the Korean Society of Postharvest Science and Technology of Agricultural Products Conference
• /
• 2003.10a
• /
• pp.192.2-193
• /
• 2003

기존 저온저장고의 가습방법을 개선하고 아울러 음이온을 농산물의 선도 유지에 이용하고자 아쿠아이온발생시스템의 설계, 제작이 레너드효과를 응용하여 이루어졌다. 시스템의 아쿠아음이온의 발생량은 42,965음이온/cc, 입자크기는 $10^3$$\mu\textrm{m}$ 이하, 가습속도는 0.13$\ell$/h이었으며 85% 이상의 고습도 조건에서도 결로가 발생하지 않는 상태로 가습이 가능하였다. 아쿠아이온 클러스터에 의해 저장고는 90% 이상의 균일한 고습도와 정온을 유지할 수가 있었다. 아쿠아이온시스템의 경우 유해가스와 분진등을 흡착, 제거하여 저장고 내를 청정하게 유지시키는 기능이 있는데, 에틸렌가스 제거 효과는 초기 농도 50ppm에서 5분후에 50% 이상이 제거되고 2시간 후에는 3ppm 이하로 제거되었다. 아쿠아이온발생시스템이 브로콜리, 잎상추, 애호박 등의 보관에 적용되었다. 아쿠아이온발생시스템이 부착된 저장고($0^{\circ}C$)에서 20일동안 보관한 경우 기존 저장고에 보관한 경우에 비하여 감모율, 부패율 및 관능적 품질에 있어서 유의적으로 우수한 차이를 나타내었다.

• Applied Chemistry for Engineering
• /
• v.7 no.4
• /
• pp.661-669
• /
• 1996

Pt-Rh/NaY catalysts with various Pt/Rh ratios were prepared by an ion-exchange method and their characteristics were investigated by $^{129}Xe$-NMR and EXAFS. Both the $^{129}Xe$-NMR and EXAFS data indicate that the surface of PtRh bimetallic clusters was enriched with Rh atoms. The catalytic activities of these catalysts for conversion of CO, HC and $NO_x$ were measured by using simulated automobile engine exhausts under lean, rich and stoichiometric conditions. The Pt-Rh/NaY(Pt/Rh=1) catalyst exhibited the greatest reactive activity among the catalysts used in this study.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
• /
• 2002.07a
• /
• pp.232-235
• /
• 2002

An 150 kV gas cluster ion accelerator was fabricated and assessed. The change of surface morphology and surface roughness were examined by an atom force microscope (AFM) after irradiation of $CO_2$ gas clusters on Si (100) surfaces at the acceleration voltages of 50 kV. The density of hillocks induced by cluster ion impact was gradually increased with the dosage up to 5$\times$10$^{11}$ ions/$\textrm{cm}^2$. At the boundary of the ion dosage of 10$^{12}$ ions/$\textrm{cm}^2$, the density of the induced hillocks was decreased and RMS (root mean square) surface roughness was not deteriorated further. At the dosage of 5x10$^{13}$ ions/$\textrm{cm}^2$, the induced hillocks completely disappeared and the surface became very flat. In addition, the irradiated region was sputtered. $CO_2$ cluster ions are irradiated at the acceleration voltage of 25 kV to remove hillocks on indium tin oxide (ITO) surface and thus to attain highly smooth surfaces. $CO_2$ monomer ions are also bombarded on the ITO surface at the same acceleration voltage to compare sputtering phenomena. From the AFM results, the irradiation of monomer ions make the hillocks sharper and the surfaces rougher On the other hand, the irradiation of $CO_2$ cluster ions reduces the hight of hillocks and planarize the ITO surfaces. From the experiment of isolated cluster ion impact on the Si surfaces, the induced hillocks m high had the surfaces embossed at the lower ion dosages. The surface roughness was slightly increased with the hillock density and the ion dosage. At higher than a critical ion dosage, the induced hillocks were sputtered and the sputtered particles migrated in order to fill valleys among the hillocks. After prolonged irradiation of cluster ions, the irradiated region was very flat and etched.