• 제목/요약/키워드: $j{\omega}$ Method

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온도변화에 따른 주석 도금한 전기 커넥터의 미동마멸 부식 거동 (Fretting Corrosion Behavior of Tin-plated Electric Connectors with Variation in Temperature)

  • 오만진;강세형;이만석;김호경
    • Tribology and Lubricants
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    • 제30권3호
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    • pp.146-155
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    • 2014
  • In this study, we conduct fretting corrosion tests on tin-plated brass coupons to investigate the effect of temperature on fretting corrosion for various span amplitudes. We prepare a coupled fretting corrosion specimens using a tin-plated brass coupon with a thickness of $10{\mu}m$. One specimen is a flat coupon and the other specimen is a coupon with a protuberance in 1 mm radius, which is produced using 2 mm diameter steel ball. We conduct fretting corrosion tests at $25^{\circ}C$, $50^{\circ}C$, $75^{\circ}C$, $100^{\circ}C$ by rubbing the coupled coupons together at the contact between the flat and protuberance coupons. We measure electric resistance of the contact during the fretting corrosion test period. There is increase in resistance with fretting cycles. It is found that rate of increase in electric resistance becomes faster with increase in testing temperature. Magnitude of friction coefficient increases with fretting span amplitudes. And, change in friction coefficient becomes desensitized to the increment in span amplitude. Assuming that failure cycle is the cycle with an electric resistance of $0.01{\Omega}$, we find that failure lifetime ($N_f$) decreases with increase in testing temperature. Furthermore, based on the assumption that the damage rate of the connector is inversely related to the failure cycle, we calculate the activation energy for fretting damage to be 13.6 kJ/mole by using the Arrhenius equation. We propose a method to predict failure cycle at different temperatures for span amplitudes below $30{\mu}m$. Friction coefficients generally increase with increase in span amplitude and decrease in testing temperature.

조성변화에 따른 Fe-Sm-O계 박막의 연자기적 성질 (Influence of Composition on Soft Magnetic Properties of As-Deposited Fe-Sm-O Thin Films)

  • 윤대식;조완식;고은수;이영;박종봉;김종오
    • 한국재료학회지
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    • 제11권1호
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    • pp.39-43
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    • 2001
  • Nanocrystalline Fe-Sm-O thin films were prepared by RF magnetron reactive sputtering method in $Ar+O_2$mixed atmosphere with the $O_2$content of 5%. The compositions of the thin films were changed by changing the number of $Sm_2O_3$ chips. The best soft magnetic properties of the thin film with the composition of $Fe_{83.4}Sm_{3.4}O_{13.2}$ were saturation flux density of 18 kG, coercivity of 0.82 Oe and effective permeability about 2,600 at 0.5~100 MHz, respectively. The electrical resistivity of Fe-Sm-O thin films was increased with increasing the amount of Sm and O elements which combined each other, the electrical resistivity of$Fe_{83.4}Sm_{3.4}O_{13.2}$ thin film was $130{\mu}{\Omega}cm$. In case of the small amount of Sm and O elements, the microstructures of Fe-Sm-O thin films showed a precipitated phase of $Sm_2O_3$ on the ${\alpha}-Fe$ phase. With the increase of the amount of Sm and O elements, the microstructures of the Fe- Sm-O thin films were changed into a mixed structure of ${\alpha}-Fe$ crystal-phase and Sm-oxide amorphous phase. The Fe-Sm-O thin films with Fe content in the range of 72~94 at% exhibited the quality factor (Q = $\mu$′/$\mu$") of 7~75 up to 50 MHz.

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차단막 코팅에 의한 염료 태양전지의 전하전송효율 개선에 관한 연구 (Improvement of Charge Transfer Efficiency of Dye-sensitized Solar Cells by Blocking Layer Coatings)

  • 최우진;김광태;곽동주;성열문
    • 전기학회논문지
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    • 제60권2호
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    • pp.344-348
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    • 2011
  • A layer of $TiO_2$ thin film less than ~200nm in thickness, as a blocking layer, was deposited by 13.56 MHz radio frequency magnetron sputtering method directly onto the anode electrode to be isolated from the electrolyte in dye-sensitized solar cells (DSCs). This is to prevent the electrons from back-transferring from the electrode to the electrolyte ($I^-/{I_3}^-$). The presented DSCs were fabricated with working electrode of F:$SnO_2$(FTO) glass coated with blocking $TiO_2$ layer, dye-attached nanoporous $TiO_2$ layer, gel electrolyte and counter electrode of Pt-deposited FTO glass. The effects of blocking layer were studied with respect to impedance and conversion efficiency of the cells. The, electrochemical impedances of DSCs using this electrode were $R_1$: 13.9, $R_2$: 15.0, $R_3$: 10.9 and $R_h$: $82{\Omega}$. The $R_2$ impedance related by electron movement from nanoporous $TiO_2$ to TCO showed lower than that of normal DSCs. The photo-conversion efficiency of prepared DSCs was 5.97% ($V_{oc}$: 0.75V, $J_{sc}$: 10.5 mA/$cm^2$, ff: 0.75) and approximately 1% higher than general DSCs sample.

Fabrication and performance evaluation of ultraviolet photodetector based on organic /inorganic heterojunction

  • Abdel-Khalek, H.;El-Samahi, M.I.;Salam, Mohamed Abd-El;El-Mahalawy, Ahmed M.
    • Current Applied Physics
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    • 제18권12호
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    • pp.1496-1506
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    • 2018
  • Organic/inorganic ultraviolet photodetector was fabricated using thermal evaporation technique. Organic/inorganic heterojunction based on thermally evaporated copper (II) acetylacetonate thin film of thickness 200 nm deposited on an n-type silicon substrate is introduced. I-V characteristics of the fabricated heterojunction were investigated under UV illumination of intensity $65mW/cm^2$. The diode parameters such as ideality factor, n, barrier height, ${\Phi}_B$, and reverse saturation current, $I_s$, were determined using thermionic emission theory. The series resistance of the fabricated diode was determined using modified Nord's method. The estimated values of series resistance and barrier height of the diode were about $0.33K{\Omega}$ and 0.72 eV, respectively. The fabricated photodetector exhibited a responsivity and specific detectivity about 9 mA/W and $4.6{\times}10^9$ Jones, respectively. The response behavior of the fabricated photodetector was analyzed through ON-OFF switching behavior. The estimated values of rise and fall time of the present architecture under UV illumination were about 199 ms and 154 ms, respectively. Finally, enhancing the photoresponsivity of the fabricated photodetector, post-deposition plasma treatment process was employed. A remarkable modification of the device performance was noticed as a result of plasma treatment. These modifications are representative in a decrease of series resistance and an increase of photoresponsivity and specific detectivity. The process of plasma treatment achieved an increment of external quantum efficiency from 5.53% to 8.34% at -3.5 V under UV illumination.