• Journal of the Korean Magnetics Society
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• v.15 no.5
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• pp.287-291
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• 2005

We have investigated and tried to improve the characteristics of the thin $HfO_2$ layer deposited by ALD for fabricating a MOSFET device where the $HfO_2$ film worked as the gate dielectric. The substrate of MOSFET device is p-type (100) silicon wafer over which the $HfO_2$ dielectric layer with thickness of $5\~6\;nm$ has been deposited. Then the $HfO_2$ film was annealed with $1\~20\;atm\;H_2$ gas and subsequently aluminum electrodes was made so that the active area was $5{\times}10^{-5}\;cm^2$. We have found out that the drain current and transconductance increased by $5\~10\%$ when the $H_2$ gas pressure was 20 atm, which significantly contributed to the reliable operation of the high-density MOSFET devices.

• Journal of the Korean Magnetics Society
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• v.16 no.1
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• pp.28-33
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• 2006

La substituted perovskite $BiFeO_3$ have been prepared by a sol-gel method. Magnetic and structural properties of the powders were characterized with Mossbauer spectroscopy, XRD, SEM, and TG-DTA. The crystal structure is found to be a rhombohedrally distorted perovskite structure with the lattice constant $\alpha=3.985{\AA}\;and\;\alpha=89.5^{\circ}.\;Bi_{2/3}La_{1/3}FeO_3$ powders that were annealed at and above $600^{\circ}C$ have a single-phase perovskite structure. However, powders annealed at $900^{\circ}C$ have a typical perovskite structure with small amount of $Bi_2O_3$ phase. The Neel temperature of $Bi_{2/3}La_{1/3}FeO_3$ is found to be $680\pm3K$. The isomer shift value at room temperature is found to be 0.27 mm/s relative to the Fe metal, which is consistent with high-spin $Fe^{3+}$ charge states. Debye temperature far$Bi_{2/3}La_{1/3}FeO_3$ is found to be $305\pm5K$. The average hyperfine field $H_{hf}(T)$ of the $Bi_{2/3}La_{1/3}FeO_3$, shows a temperature dependence of $[H_{hf}(T)-H_{hf}(0)]/H_{hf}(0)=-0.42(T/T_N)^{3/2}-0.13(T/T_N)^{5/2}$ for $T/T_N<0.7$ indicative of spin-wave excitation.

• Proceedings of the Korean Vacuum Society Conference
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• 2013.02a
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• pp.359-360
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• 2013

The effect of electrode and deposition methods on non-linear interfacial resistive switching in HfO2 based $250{\times}250$ nm2 cross-point device was studied. HfO2 based device has the interfacial resistive switching properties of non-linearity and self-compliance current switching. The operating current in HfO2 based device was increased with negatively increasing the heat of formation energy in top electrode. Also, it was investigated that the operating current in HfO2 based device was changed with deposition methods of O3 reactant ALD, H2O reactant ALD and dc reactive sputtering, resulting the magnitude of the operating current and on/off ratio in order of HfO2 films deposited by dc reactive sputtering, H2O reactant ALD, and O3 reactant ALD. To investigate the effect of electrode and deposition methods on operating current of non-linear interfacial resistive switching in the cross-point device, X-ray photoelectron spectroscopy was measured. Through the analysis of O 1s spectra, non-lattice oxygen concentration, which is closely related to oxygen vacancies, was increased in order of Pt, TiN, and Ti top electrodes and in order of O3 reactant ALD, H2O reactant ALD, and O3 reactant ALD, and dc reactive sputtering deposition method. From all results, non-lattice oxygen concentration in ultra-thin HfO2 films play a crucial role in the operating current and memory states (LRS & HRS) in the non-linear interfacial resistive switching.

• Proceedings of the Korean Vacuum Society Conference
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• 2010.02a
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• pp.378-378
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• 2010

We report the electronic structure of CoFeO-R (R=Hf, La, Nb) thin films studied by x-ray absorption spectroscopy (XAS). These ferrites thin films were prepared by pulsed laser deposition method and characterized by XAS measurements at O K-, Co and Fe L-edges. The O K-edge spectra suggest that there is a strong hybridization between O 2p and 3d electrons of transition metal cations and Fe $L_{3,2}$-edge spectra indicate that Fe-ions exist in $Fe^{2+}$ with tetrahedral site of the spinel structure. Divalent Co ions is also distributed in tetrahedral site with rare earth ions goes to octahedral sites of spinel structure. X-ray magnetic circular dichroism (XMCD) is also used to explain the symmetry and magnetic nature dependence on rare-earth ions.

• Journal of the Korean Ceramic Society
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• v.39 no.3
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• pp.315-320
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• 2002

Treatment effects of dilute hydrofluoric acid (6 wt% HF) on the surface properties of $Al(OH)_3$ were investigated at the molar ratio of F/Al(fluoride/aluminum)=0.15. Temperature and pH variations in the reaction system were recorded to analyze reaction mechanism between $Al(OH)_3$ and aqueous Hf. The reaction of HF to the surface of $Al(OH)_3$ accompanied with a quantity of heat evolution, resulting in increasing temperature of a reactionsystem. And also the reaction was proceeded as transitional state which metastable ${\alpha}-form\;AlF_3{\cdot}3H_2O$ was transferred to insoluble ${\beta}$-form. The resulting ${\beta}-form\;AlF_3{\cdot}3H_2O$ formed by a surface treatment was identified by FT-IR and X-ray diffractormetry. The formation of ${\beta}$-form aluminum fluoride hydrates with diameter less than $1{\mu}m$ on the surface of $Al(OH)_3$ could be visulaized by SEM imgae, making up a coating layer as precipitate-like. The surface whiteness of $Al(OH)_3$ treated with aqueous HF was furthermore increased approximately 6.6% due to the formation of surface hydrates.

• Proceedings of the Korean Vacuum Society Conference
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• 2006.08a
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• pp.138-138
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• 2006

• Proceedings of the Korean Vacuum Society Conference
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• 2010.08a
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• pp.164-164
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• 2010

The impurity doped ZnO has been extensively studied because of its optoelectric properties. GIZO (Ga-In-Zn-O) amorphous oxide semiconductors has been widely used as transparent flexible semiconductor material. Recently, various amorphous transparent semiconductors such as IZO (In-Zn-O), GIZO, and HIZO (Hf-In-Zn-O) were developed. In this work, we examined the local structures of IZO, GIZO, and HIZO. The local coordination structure was investigated by the extended X-ray absorption fine structure. The IZO, GIZO and HIZO thin films ware deposited on the glass substrate with thickness of 400nm by the radio frequency sputtering method. The targets were prepared by the mixture of $In_2O_3$, ZnO and $HfO_2$ powders. The percent ratio of In:Zn in IZO, Ga:In:Zn in GIZO and Hf:In:Zn in HIZO was 45:55, 33:33:33 and 10:35:55, respectively. In this work, we found that IZO, GIZO and HIZO are all amorphous and have a similar local structure. Also, we obtained the bond distances of $d_{Ga-O}=1.85\;{\AA}$, $d_{Zn-O}=1.98\;{\AA}$, $d_{Hf-O}=2.08\;{\AA}$, $d_{In-O}=2.13\;{\AA}$.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2009.11a
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• pp.158-158
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• 2009

This paper focuses on improving organic thin film transistor (OTFT) characteristics by controlling the self-organization of pentacene molecules with an alignable high-dielectric-constant film. The process, based on the growth of pentacene film through high-vacuum sublimation, is a method of self-organization using ion-beam (IB) bombardment of the $HfO_2/Al_2O_3$ surface used as the gate dielectric layer. X-ray photoelectron spectroscopy indicates that the IB raises the rate of the structural anisotropy of the $HfO_2/Al_2O_3$film, and X-ray diffraction patterns show the possibility of increasing the anisotropy to create the self-organization of pentacene molecules in the first polarized monolayer. An effective mobility of $2.3{\times}10^{-3}cm^2V^{-1}s^{-1}$ was achieved, which is significantly different from that of pentacene films that are not aligned. The proposed OTFT devices with an ultrathin $HfO_2$ structure as the gate dielectric layer were operated at a gate voltage lower than 5 V.

• Ceramist
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• v.4 no.1
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• pp.46-55
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• 2001

$SiO_2$ 절연막의 우수한 절연특성 및 계면 특성으로 인해 지난 40여년 간 MOSFET 소자에 사용되어 왔으나, 차세대 $0.1{\mu}m$ 소자에서는 direct tunneling에 의한 누설전류가 지나치게 증가하여 더 이상 사용되기가 어렵다. 이에 대한 대안으로 많은 연구 그룹에서 고유전율 박막에 대한 연구를 하고 있으나 아직까지 $SiO_2$와 비교할 만한 탁월한 계면특성을 가진 절연막은 개발되어 있지 않아서, 수년 내에 개발될 $0.1{\mu}m$ MOSFET 소자의 개발에 가장 심각한 기술적 문제로 지적되고 있다. 현재의 연구경향을 종합할 때, $HfO_2$, $ZrO_2$, $HfSiO_x$, $ZrSiO_x$를 이용하여 계면 공정의 최적화를 통해 1-2nm급의 절연막을 구현하고, 1nm급 이하에서는 이보다 더 높은 유전상수를 가지는 재료의 선택과 이를 epitaxy로 성장시키는 방법에 대한 연구가 필수적이다.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2005.07a
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• pp.240-241
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• 2005

In this paper, Latin Hypercube Sampling based the neural network model for the electrical characteristics of $HfO_2$ thin films grown by metal organic molecular beam epitaxy was investigated. The accumulation capacitance and the hysteresis index are extracted to be the main responses to examine the characteristics of $HfO_2$ thin films. X-ray diffraction was used to analyze the characteristic variation for the different process conditions. The initial weights and biases are selected by Latin Hypercube Sampling method. This modeling methodology can allow us to optimize the process recipes and improve the manufacturability.