Analysis and Reduction of Impurity Contamination Induced by Plasma Etching on Si Surface (플라즈마 식각에 의하여 실리콘 표면에 유기된 불순물 오염의 분석 및 제거)
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- Journal of the Korean Institute of Electrical and Electronic Material Engineers
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- v.19 no.12
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- pp.1078-1084
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- 2006