• Title/Summary/Keyword: $ZrO_2-8%Y_2O_3$

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Effect of Oxidation of Bond Coat on Failure of Thermal Barrier Coating (Bond Coat의 산화가 Thermal Barrier Coating의 파괴에 미치는 영향)

  • 최동구;최함메;강병성;최원경;최시경;김재철;박영규;김길무
    • Journal of the Korean Ceramic Society
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    • v.34 no.1
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    • pp.88-94
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    • 1997
  • The oxidation behavior of the NiCrAlY bond coat and thermal fatigue failure in the plasma-sprayed thermal barrier coating system, ZrO2.8wt%Y2O3 top coat/Ni-26Cr-5Al-0.5Y bond coat/Hastelloy X superalloy substrate, in commercial use for finned segment of gas turbine burner were investigated. The main oxides formed in the bond coat were NiO, Cr2O3, and Al2O3. It divided the oxide distribution at this interface into two types whether an Al2O3 thin layer existed beneath ZrO2/bond coat interface before operation at high temperature or not. While a continuous layer of NiO was formed mainly in the region where the Al2O3 thin layer was present, the absence of it resulted in the formation of mixture of Cr2O3 and Al2O3 beneath NiO layer. Analyses on the fracture surface of specimen spalled by thermal cycling showed that spalling occurred mainly along the ceram-ic coat near ZrO2/bond coat oxide layer interface, but slightly in the oxide layer region.

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Fabrication of Porous Al2O3-(m-ZrO2) Composites and Al2O3-(m-ZrO2)/PMMA Hybrid Composites by Infiltration Process

  • Lee, Byong-Taek;Quang, Do Van;Song, Ho-Yeon
    • Journal of the Korean Ceramic Society
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    • v.44 no.6 s.301
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    • pp.291-296
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    • 2007
  • Porous $Al_2O_3-(m-ZrO_2)$ composites were fabricated by pressureless sintering, using different volume percentages (40% - 60%) of poly methyl methacrylate (PMMA) powders as a pore-forming agent. The pore-forming agent was successfully removed, and the pore size and shape were well-controlled during the burn-out and sintering processes. The average pore size in the porous $Al_2O_3-(m-ZrO_2)$ bodies was about $200\;{\mu}m$ in diameter. The values of relative density, bending strength, hardness, and elastic modulus decreased as the PMMA content increased; i.e., in the porous body (sintered at $1500^{\circ}C$) using 55 vol % PMMA, their values were about 50.8%, 29.8 MPa, 266.4 Hv, and 6.4 GPa, respectively. To make the $Al_2O_3-(m-ZrO_2)$/polymer hybrid composites, a bioactive polymer, such as PMMA, was infiltrated into the porous $Al_2O_3-(m-ZrO_2)$ composites. After infiltration, most of the pores in the porous $Al_2O_3-(m-ZrO_2)$ composites, which were made using 60 vol % PMMA additions, were infiltrated with PMMA, and their values of relative density, bending strength, hardness, and elastic modulus remarkably increased.

Effect of $ZrO_2$Addition on the Microwave Dielectric Properties of BZN-SZN System Ceramics (BZN-SZN계 세라믹스의 마이크로파 유전 특성에 미치는 $ZrO_2$의 영향)

  • 윤석규;박우정;양우석;윤대호
    • Journal of the Korean Ceramic Society
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    • v.38 no.11
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    • pp.1042-1045
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    • 2001
  • Microwave dielectric properties of Ba(Zn$_{1}$3/Nb$_{2}$3/) $O_3$-Sr(Zn$_{1}$3/Nb$_{2}$3/) $O_3$(BZN-SZN) system were investigated as a function of sintering temperature and Zr $O_2$content. Density was increased and the temperature coefficient of resonant frequency (TCF, $\tau$$_{f}$) decreased with increasing sintering temperature. However dielectric constant (K) and Q$\times$f value did not change markedly with the sintering temperature. For the samples sintered at the same temperature, density, dielectric constant, and Q$\times$f value were increased and TCF was decreased with increasing Zr $O_2$concentration. Especially, the dielectric constant of the sample increased with x and exhibited the maximum value ($\varepsilon$$_{r}$=41) when x=0.6 at 1575$^{\circ}C$ sintered. TCF decreased with x and exhibited the minimum value ($\tau$$_{f}$=+0.8ppm/$^{\circ}C$) when x=1.0..0.

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Preparation of Fine-particle $(PbCa)ZrO_3$ for Resonator (동축형 공진기용 $(PbCa)ZrO_3$ 분말의 합성)

  • 이병하;이경희;윤성화
    • Journal of the Korean Ceramic Society
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    • v.30 no.8
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    • pp.635-642
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    • 1993
  • To obtain a higher dielectric constant material, we investigated Ca substitution for Pb in PbZrO3. In this study, the four mixtures of (Pb0.68Ca0.32)ZrO3, (Pb0.65Ca0.37)ZrO3, (Pb0.63Ca0.37)ZrO3, and (Pb0.60Ca0.40)ZrO3 were prepared by coprecipitation reaction of Pb(NO3)2, ZrOCl2, and CaCl2 with (NH4)2CO3 and NH4OH in aqueous solution. The (Pb1-xCax)ZrO3 with different x mole fractions (x=0.35, 0.37) showed not only high dielectric constant, but also high Q values and low temperature coefficient of the capacitance.

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Effect of ($\textrm{B}_{2}\textrm{O}_{3}$.$\textrm{Li}_{2}\textrm{O}$) on the Microwave Dielectric Properties of the ($\textrm{Zr}_{0.8}\textrm{Sn}_{0.2}$)$\textrm{TiO}_{4}$ Ceramics (($\textrm{Zr}_{0.8}\textrm{Sn}_{0.2}$)$\textrm{TiO}_{4}$ 세라믹스의 마이크로파 유전특성에 미치는 ($\textrm{B}_{2}\textrm{O}_{3}$.$\textrm{Li}_{2}\textrm{O}$)의 영향)

  • An, Il-Seok;Yun, Gi-Hyeon;Kim, Eung-Su
    • Korean Journal of Materials Research
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    • v.9 no.10
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    • pp.1041-1046
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    • 1999
  • (Zr(sub)0.8Sn(sub)0.2)$TiO_4$세라믹스와 소결조제로서 ($B_2$$O_3$.Li$_2$O)의 첨가에 따른 마이크로파 유전특성 및 미세구조에 미치는 영향에 대하여 연구하였다. 1.0 mol.% $Sb_2$O(sub)5를 첨가하고 130$0^{\circ}C$에서 5시간 소결한 (Zr(sub)0.8Sn(sub)0.2)$TiO_4$세라믹스의 경우 ($B_2$$O_3$.Li$_2$O)첨가량 증가에 따라 치밀화 및 결정립 성장에 의해 유전상수와 Q.f값은 증가하여 첨가량이 0.35wt.%에서 최대값인 38과 59,000을 각각 나타내었으며, 0.50wt.% 이상 첨가한 경우에서는 제 2상의 생성으로 인하여 감소하였다. 1.0 mol% Sb$_2$O(sub)5와 0.35wt.% ($B_2$$O_3$.$Li_2$O)를 첨가한 (Zr(sub)0.8Sn(sub)0.2)TiO$_4$세라믹스를 125$0^{\circ}C$와 135$0^{\circ}C$에서 5시간 소결한 경우에는 각각 미반응 TiO$_2$의 존재와 과대입자성장에 의한 결정립내기공의 생성으로 인하여 마이크로파 유전특성은 저하되었다.

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Ferroelectric properties of BLT films deposited on $ZrO_2$Si substrates

  • Park, Jun-Seo;Lee, Gwang-Geun;Park, Kwang-Hun;Jeon, Ho-Seung;Im, Jong-Hyun;Park, Byung-Eun;Kim, Chul-Ju
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2006.11a
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    • pp.172-173
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    • 2006
  • Metal-ferroelectric-insulator-semiconductor (MFIS) structures with $Bi_{3.35}La_{0.75}Ti_3O_{12}$ (BLT) ferroelectric film and Zirconium oxide ($ZrO_2$) layer were fabricated on p-type Si(100). $ZrO_2$ and BLT films were prepared by sol-gel technique. Surface morphologies of $ZrO_2$ and BLT film were measured by atomic force microscope (AFM). The electrical characteristics of Au/$ZrO_2$/Si and Au/BLT/$ZrO_2$/Si film were investigated by C-V and I-V measurements. No hysteretic characteristics was observed in the C-V curve of the Au/$ZrO_2$/Si structure. The memory window width m C-V curve of the Au/BLT/$ZrO_2$/Si diode was about 1.3 V for a voltage sweep of ${\pm}5$ V. The leakage current of Au/$ZrO_2$/Si and Au/BLT/$ZrO_2$/Si structures were about $3{\times}10^{-8}$ A at 30 MV/cm and $3{\times}10^{-8}$ A at 3 MV/cm, respectively.

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Processing and properties of the $SiO_2-ZrO_2-Na_2O-B_2O_3$glass ceramics ($SiO_2-ZrO_2-Na_2O-B_2O_3$계 결정화 유리의 제조와 물성)

  • 안주삼;이원유;채병준;최승철;박영선
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.8 no.3
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    • pp.518-523
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    • 1998
  • The fracture toughness and hardness of 62 %$SiO_2-19%ZrO_2-9%Na_2O-10%B_2O_3$(wt%) glass ceramics system were investigated. As a result of DTA study to find crystallization temperature, an exothermic peak near $820^{\circ}C$ was observed. The optimum nucleation temperature and the optimum crystal growth temperature were determined by XRD and SEM analysis, and were approximately $650^{\circ}C$, $840^{\circ}C$ respectively. The fracture toughness of this zirconia glass ceramics was determined by Vickers Indentation Method. The hardness value was not changed with increasing of the heat treatment temperature, but fracture toughness value was increased up to $1.8 MPa{\cdot}m^{1/2}$ at $840^{\circ}C$, with increasing of heat treatment temperature.

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Properties of Yttria Partially Stabilized Zirconia Nano-Powders Prepared by Coprecipitation Method (공침법으로 합성한 이트리아 부분안정화 지르코니아 나노분말의 특성)

  • Yoon, Hye-On;Shin, Mi-Young;Ahn, Joong-Jae
    • Journal of the Mineralogical Society of Korea
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    • v.19 no.2 s.48
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    • pp.81-88
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    • 2006
  • The Yttria Partially Stabilized Zirconia powder was prepared by spontaneous precipitation method using $ZrOCl_2{\cdot}8H_O-YCl_33{\cdot}6H_2O$ solution as a starting materials. The optimal experimental conditions such as concentration and pH of starting solutions, the amounts of stabilizer $Y_2O_3$ used, and sintered temperature were carefully studied. The best condition for synthesizing $ZrO_2$ was experimentally selected and applied throughout this study for the preparation of the 3 mole% $Y_2O_3$ partially stabilized zirconia, 3YSZ. The physical properties of 3YSZ was examined by XRD, Raman, DT A, and SEM. The structural transition from pure monoclinic high temperature $ZrO_2$ to tetragonal room temperature 3YSZ was made possible by the added amount of $Y_2O_3$ in the $ZrO_2+Y_2O_3$ system. All Raman Spectrum band appeared in the lower wave numbers rather than in higher wave numbers as structure changes from monoclinic to tetragonal.

Synthesis of Zirconium Oxide Nanoballs Using Colloid-Imprinted Carbon and Their Electrical Properties

  • Kim, Chy Hyung
    • Transactions on Electrical and Electronic Materials
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    • v.16 no.2
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    • pp.86-89
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    • 2015
  • Uniform ZrO2 nanoballs were synthesized at 700℃ using the inverse replication method through a colloid-imprinted carbon (CIC) template. The structural, dielectric, and conducting properties of the ZrO2 nanoballs were investigated and compared with those of ZrO2 film prepared by sol-gel method and powdered ZrO2 chemical. Both the monoclinic and cubic phases were found in the ZrO2 balls and film but the ZrO2 chemical showed a monoclinic phase, where the cubic structure is known to be formed at above 2,300℃. ZrO2 nanoballs showed the lower dielectric property of k = 21.2 at 1 MHz because the 8-coordinated cubic phase in the ZrO2 nanoball produced lower polarization than the polarization of the 7-coordinated monoclinic ZrO2 chemical (k = 23.6). The dielectric stability was maintained in each ZrO2 ball, film, and chemical under the applied forward and reverse voltage range (−5 to +5 V) at 1 MHz. The ionic conductivities were 7.86 × 10−8/Ω·cm for ZrO2 nanoballs, 3.29 × 10−8/Ω·cm for ZrO2 chemical, and 6.70 × 10−5/Ω·cm for the thickness of 1,053 nm ZrO2 film at room temperature with the electronic contribution being less than 0.006%.