• Title/Summary/Keyword: $ZnSnO_3$

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The Effects of Doping Hafnium on Device Characteristics of $SnO_2$ Thin-film Transistors

  • Sin, Sae-Yeong;Mun, Yeon-Geon;Kim, Ung-Seon;Park, Jong-Wan
    • Proceedings of the Korean Vacuum Society Conference
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    • 2011.02a
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    • pp.199-199
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    • 2011
  • Recently, Thin film transistors (TFTs) with amorphous oxide semiconductors (AOSs) can offer an important aspect for next generation displays with high mobility. Several oxide semiconductor such as ZnO, $SnO_2$ and InGaZnO have been extensively researched. Especially, as a well-known binary metal oxide, tin oxide ($SnO_2$), usually acts as n-type semiconductor with a wide band gap of 3.6eV. Over the past several decades intensive research activities have been conducted on $SnO_2$ in the bulk, thin film and nanostructure forms due to its interesting electrical properties making it a promising material for applications in solar cells, flat panel displays, and light emitting devices. But, its application to the active channel of TFTs have been limited due to the difficulties in controlling the electron density and n-type of operation with depletion mode. In this study, we fabricated staggered bottom-gate structure $SnO_2$-TFTs and patterned channel layer used a shadow mask. Then we compare to the performance intrinsic $SnO_2$-TFTs and doping hafnium $SnO_2$-TFTs. As a result, we suggest that can be control the defect formation of $SnO_2$-TFTs by doping hafnium. The hafnium element into the $SnO_2$ thin-films maybe acts to control the carrier concentration by suppressing carrier generation via oxygen vacancy formation. Furthermore, it can be also control the mobility. And bias stability of $SnO_2$-TFTs is improvement using doping hafnium. Enhancement of device stability was attributed to the reduced defect in channel layer or interface. In order to verify this effect, we employed to measure activation energy that can be explained by the thermal activation process of the subthreshold drain current.

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RF magnetron sputtering에 의해 제작된 $SnO_2$ 투명전극의 구조적 및 광학적 특성

  • Im, Jeong-U;Lee, Dong-Hun;Yu, Jae-Su
    • Proceedings of the Korean Vacuum Society Conference
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    • 2010.02a
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    • pp.205-205
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    • 2010
  • 투명 전극(transparent conducting oxide, TCO)은 높은 전기전도도 및 낮은 비저항 ($10^{-4}{\sim}10^{-3}\;{\Omega}cm$)과 가시광영역에서의 우수한 광투과도(> 80%) 특성을 가지며, 주로 디스플레이, 태양전지, 가스 센서 소자 등에 쓰인다. 투명전극으로 쓰이는 대표적인 물질로서는 ITO, ZnO, $SnO_2$ 등이 있으며, ITO는 전기적 특성이 우수하여 널리 사용되고 있으나 가격이 비싸고 화학적으로 불안정하고, ZnO는 ITO에 비해 가격이 저렴하지만 고온에서 불안정한 특성을 가지고 있다. 반면, $SnO_2$는 ITO와 ZnO에 비해 전기적 특성은 떨어지지만, 우수한 열적, 화학적 안정성 및 높은 내마모성을 가지고 제조단가가 저렴하여 TCO 재료로 많은 연구가 진행되고 있다. TCO 박막을 증착시키는 방법으로 CVD, ion plating, sputtering, spray pyrolysis 등이 있으며, 이 중 sputtering 방법은 균일한 입자로 균질의 박막을 입힐 수 있고 우수한 재현성과 낮은 온도에서도 증착이 가능하여 박막 제조 방법으로 널리 이용되고 있다. 본 연구에서는 $SnO_2$ 박막을 실리콘 (100) 및 글라스 (Eagle 2000) 기판 위에 RF magnetron sputtering 방법을 사용하여 제작하였다. 박막 증착을 위해 99.99%의 2 인치 un-doped $SnO_2$ 타겟을 사용하였고, 기판은 20 rpm 으로 회전시켜 균일한 박막이 형성될 수 있도록 하였으며, 초기 진공도는 $1{\times}10^{-6}\;Torr$가 되도록 하였다. 증착 변수로 기판-타겟간 거리, RF 파워, $O_2/(Ar+O_2)$ 비, 공정압력, 기판 온도 등을 각각 변화 시키며 $SnO_2$ 박막을 증착하였다. 증착된 박막의 구조적 및 광학적 특성을 분석하기위해 FE-SEM, AFM, XRD, UV/VIS spectrophotometer, Photoluminescence 등을 사용하였다.

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Multi-component $ZnO-In_2O_3-SnO_2$ thin films deposited by RF magnetron co-sputtering

  • Lee, Byoung-Hoon;Hur, Jae-Sung;Back, Sang-Yul;Lee, Jeong-Seop;Song, Jung-Bin;Son, Chang-Sik;Choi, In-Hoon
    • Proceedings of the Korean Society Of Semiconductor Equipment Technology
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    • 2006.10a
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    • pp.68-71
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    • 2006
  • Multi-component $ZnO-In_2O_3-SnO_2$ thin films have been prepared by RF magnetron co-sputtering using targets composed of $In_3Sn_4O_{12}$(99.99%) [1] and ZnO(99.99%) at room temperature. $In_3Sn_4O_{12}$ contains less In than commercial ITO, so that it lowers cost. Working pressure was held at 3 mtorr flowing Ar gas 20 sccm and sputtering time was 30 min. RF power ratio [RF1 / (RFI + RF2)] of two guns in sputtering system was varied from 0 to 1. Each RF power was varied $0{\sim}100W$ respectively. The thickness of the films was $350{\sim}650nm$. The composit ion concentrations of the each film were measured with EPMA, AES and XPS. The low resistivity of $1-2\;{\times}\;10^3$ and an average transmittance above 80% in the visible range were attained for the films over a range of ${\delta}\;(0.3\;{\leq}\;{\delta}\;{\leq}\;0.5)$. The films also showed a high chemical stability with time and a good uniformity.

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Study on Synthesis and Characterization of Magnetic ZnFe2O4@SnO2@TiO2 Core-shell Nanoparticles (자성을 가진 ZnFe2O4@SnO2@TiO2 Core-Shell Nanoparticles의 합성과 특성에 관한 연구)

  • Yoo, Jeong-yeol;Park, Seon-A;Jung, Woon-Ho;Park, Seong-Min;Tae, Gun-Sik;Kim, Jong-Gyu
    • Applied Chemistry for Engineering
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    • v.29 no.6
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    • pp.710-715
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    • 2018
  • In this study, $ZnFe_2O_4@SnO_2@TiO_2$ core-shell nanoparticles (NPs), a photocatalytic material with magnetic properties, were synthesized through a three-step process. Structural properties were investigated using X-ray diffraction (XRD) analysis. It was confirmed that $ZnFe_2O_4$ of the spinel, $SnO_2$ of the tetragonal and $TiO_2$ of the anatase structure were synthesized. The magnetic properties of synthesized materials were studied by a vibrating sample magnetometer (VSM). The saturation magnetization value of $ZnFe_2O_4$, a core material, was confirmed at 33.084 emu/g. As a result of the formation of $SnO_2$ and $TiO_2$ layers, the magnetism due to the increase in thickness was reduced by 33% and 40%, respectively, but sufficient magnetic properties were reserved. The photocatalytic efficiency of synthesized materials was measured using methylene blue (MB). The efficiency of the core material was about 4.2%, and as a result of the formation of $SnO_2$ and $TiO_2$ shell, it increased to 73% and 96%, respectively while maintaining a high photocatalytic efficiency. In addition, the antibacterial activity was validated via the inhibition zone by using E. Coli and S. Aureus. The formation of shells resulted in a wider inhibition zone, which is in good agreement with photocatalytic efficiency measurements.

The Effect of Annealing Temperature and Zn contents on Transparent Conducting Indium Zinc Tin Oxide Thin Films

  • Lee, Seon-Yeong;Denny, Yus Rama;Park, Su-Jeong;Gang, Hui-Jae;Heo, Seong;Jeong, Jae-Gwan;Lee, Jae-Cheol
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.08a
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    • pp.227-227
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    • 2012
  • 본 연구에서는 RF스퍼터링법에 의하여 glass substrate에 In-Zn-Sn-O (IZTO)를 Zn 성분에 변화를 주면서 $350{\AA}$ 만큼 증착시키고, 1시간 동안 $350^{\circ}C$로 열처리 하였다. In:Zn:Sn의 성분 비율은 20:48:32 (IZTO1), 13:60:27 (IZTO2)이다. 박막의 전자적, 광학적 특성은 XPS (X-ray Photoelectron Spectroscopy), REELS(Reflection Electron Energy Loss Spectroscopy), UV-Spectrometer를 이용하여 연구하였고, 박막의 전기적 특성은 van der Pauw 법을 이용하여 측정하였다. XPS측정결과, IZTO박막은 In-O, Sn-O and Zn-O의 결합을 가진다. REELS를 이용해 Ep=1,500 eV에서의 밴드갭을 얻어보면, $350^{\circ}C$로 열처리 한 박막은 열처리를 하지 않은 것에 비해 밴드갭이 IZTO1는 3.36 eV에서 3.54 eV로, IZTO2는 3.15 eV에서 3.31 eV로 증가하였다. 반면에 Zn 함량이 증가할수록 밴드갭이 감소하는 것을 확인할 수 있었다. 이 값은 UV-Spectrometer를 이용한 광학적 밴드갭과 일치하였다. 또한 van der Pauw method를 이용한 전기적 특성 분석 결과, 열처리를 하기 전에 비하여 carrier concentration이 IZTO1는 $-4.4822{\times}10^{18}cm^{-3}$에서 $-2.714{\times}10^{19}cm^{-3}$로, IZTO2는 $-3.6931{\times}10^{17}cm^{-3}$에서 $-1.7679{\times}10^{19}cm^{-3}$로 증가하였다. 반면에 Resistivity는 IZTO1의 경우 $1.7122{\times}10^{-1}{\Omega}{\cdot}cm$에서 $5.5496{\times}10^{-3}{\Omega}{\cdot}cm$로, IZTO2는 $1.3290 {\Omega}{\cdot}cm$에서 $1.3395{\times}10^{-2}{\Omega}{\cdot}cm$로 감소하였다. 그리고 UV-Spectrometer를 이용한 광학적 특성을 측정해본 결과, 가시광선영역인 380~780 nm에서의 투과율이 83%이상으로 투명전자소자로의 응용이 가능하다는 것을 보여주었다.

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Varistor Properties of Sn2O3- Doped ZnO-Pr6O11-CoO-Doped -Based Ceramics (Sn2O3가 첨가된 ZnO-Pr6O11-CoO계 세라믹스의 바리스터 특성)

  • 남춘우
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.16 no.1
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    • pp.39-45
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    • 2003
  • The varistor properties of ZnO-Pr$_{6}$O$_{11}$-CoO-based ceramics doped with Sm$_2$O$_3$were investigated in the addition range of 0.0~2.0 mol% Sm$_2$O$_3$at sintering temperature of 130$0^{\circ}C$ and 135$0^{\circ}C$. As Sm$_2$O$_3$ content is increased, the breakdown voltage was increased in the range of 348.9~521.8 V/mm for ceramics sintered at 130$0^{\circ}C$ and 8.5~381.3 V/mm for ceramics sintered at 135$0^{\circ}C$. On the whole, the increase of sintering temperature led to the low nonlinearity regardless of Sm$_2$O$_3$content. ZnO-Pr$_{6}$O$_{11}$-CoO-based ceramics doped with 1.0 mol% at each sintering temperature exhibited the most superior varistor properties, with the nonlinear exponent of 42.1 at 130$0^{\circ}C$, 36.8 at 135$0^{\circ}C$ and the leakage current of 9.2 $\mu$A at 130$0^{\circ}C$, 11.7 $\mu$A at 135$0^{\circ}C$.EX>.EX>.

Al 도핑 및 열처리 온도에 따른 용액 공정 기반 AlZnSnO TFT의 특성 향상 연구

  • Kim, Hyeon-U;Choe, Byeong-Deok
    • Proceedings of the Korean Vacuum Society Conference
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    • 2015.08a
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    • pp.216.1-216.1
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    • 2015
  • 본 연구에서는 용액 공정 기반 AZTO (Aluminum-Zinc-Tin Oxide, AlZnSnO) 박막 트랜지스터를 제작하여 Al (Aluminum) 도핑과 열처리 온도의 가변을 통한 특성 향상을 확인하였다. ZTO 용액의 Zn:Sn 비율(4:7)을 고정하고 Al 도핑(0~8.3%)과 열처리 온도($350{\sim}550^{\circ}C$)를 가변하였다. 실험 결과 Al 도핑이 증가할수록 드레인 전류는 감소하고 문턱 전압이 양의 방향으로 이동하면서 포화 이동도와 아문턱 기울기가 감소하였다. 열처리 온도가 증가할 때는 드레인 전류가 증가하고 문턱 전압은 음의 방향으로 이동하며 이동도와 아문턱 기울기가 증가하였다. Al 도핑은 강한 금속-산소 결합에 의해 oxygen vacancy와 전자 농도가 감소하게 하여 드레인 전류, 이동도, 아문턱 기울기의 감소와 양의 방향 문턱 전압 이동을 야기한다. 열처리 온도가 높아지면 반도체 층의 분자 구조가 더 밀집되고 oxygen vacancy 가 증가하며, 이는 전자 농도의 증가로 이어져 Al 도핑의 효과와 반대의 경향을 보인다. 실험 결과를 통해 Al:Zn:Sn=0.5:4:7의 비율과 $350^{\circ}C$ 열처리 조건에서 문턱 전압과 이동도, 아문턱 기울기, 전류 온오프 비($I_{on}/I_{off}$)가 각각 3.54V, $0.16cm^2/Vs$, 0.43 V/dec, $8.1{\times}10^5$으로 우수한 특성을 확인하였다.

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The Properties of the Several Metal Oxides in the Water-splitting for H2 Production (물 분해 수소제조를 위한 금속산화물들의 반응특성)

  • Son, Hyun-Myung;Park, Chu-Sik;Lee, Sang-Ho;Hwang, Gab-Jin;Kim, Jong-Won;Lee, Jin-Bae
    • Journal of Hydrogen and New Energy
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    • v.14 no.3
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    • pp.268-275
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    • 2003
  • The water-splitting process by the metal oxides using solar heat is one of the hydrogen production method. The hydrogen production process using the metal oxides (NiFe2O4/NiAl2O4,CoFe2O4/CoAl2O4, CoMnNiFerrite, CoMnSnFerrite, CoMnZnFerrite, CoSnZnFerrite) was carried out by two steps. The first step was carried out by the CH4-reduction to increase activation of metal oxides at operation temperature. And then, it was carried out the water-splitting reaction using the water at operation temperature for the second step. Hydrogen was produced in this step. The production rates of H2 were 110, 160, 72, 29, 17, $21m{\ell}/hr{\cdot}g-_{Metal\;Oxide}$ for NiFe2O4/NiAl2O4, CoFe2O4/CoAl2O4, CoMnNiFerrite, CoMnSnFerrite, CoMnZnFerrite, CoSnZnFerrite respectively in the second step. CoFe2O4/CoAl2O4 had higher H2 production rate than the other metal oxides.

The Effect of Zn/Sn Different Raito of InZnSnO Thin Films Prepared by RF Magnetron Sputtering (RF 마그네트론 스퍼터를 사용하여 증착한 IZTO 박막의 Zn/Sn 비율에 따른 효과)

  • Kim, Ki Hwan;Putri, Maryane;Koo, Chang Young;Lee, Jung-A;Kim, Jeong-Joo;Lee, Hee Young
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.26 no.8
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    • pp.591-596
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    • 2013
  • Indium Zinc Tin Oxide (IZTO) thin films were developed as an alternative to Indium Tin Oxide (ITO) thin films. ITO material which has been acknowledged with its low resistivity and optical transparency of 85-90% has been used as major transparent conducting oxide (TCO) materials. However, due to the limited source, high price, and instability problems at high temperature of indium, many researches has been focused on indium-saving TCO materials. Mason Group of Northwestern University was reported to expand the solubility limit up to 40% by co-doping with 1:1 ratio of $Zn^{+2}$ and $Sn^{+4}$ ions. In this study, the properties of IZTO thin films corresponding to Zn/Sn different ratio were investigated. In addition, the effect of substrate temperature variable to the structural, optical and electrical properties of IZTO thin films was investigated.