• Applied Chemistry for Engineering
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• v.18 no.1
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• pp.24-28
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• 2007

The etching of zinc oxide (ZnO) thin films has been studied using a high density plasma in a $Cl_2/Ar$ gas. The etch characteristics of ZnO thin films were systematically investigated on varying $Cl_2$ concentration, coil rf power, dc-bias voltage, and gas pressure. With increasing $Cl_2$ concentration, the etch rate of ZnO thin film increased, the redeposition around the etched patterns decreased but the sidewall slope of the etched patterns slanted. As the coil rf power and dc-bias voltage increased, the etch rates of ZnO thin films increased and etch profiles of ZnO thin films were improved. With increasing gas pressure, the etch rate of ZnO thin films slightly increased but little change in etch profile was observed. Based on these results, the optimal etching conditions of ZnO thin film were selected. Finally, the etching of ZnO thin films with a high degree of anisotropy of approximately $75^{\circ}{\sim}80^{\circ}$ without the redepositions and residues was successfully achieved at the etching conditions of 20% $Cl_2$ concentration, coil rf power of 1000 W, dc-bias voltage of 400 V, and gas pressure of 5 mTorr.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2009.10a
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• pp.223-224
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• 2009

본 연구에서는 $Cl_2$/Ar 기반의 플라즈마 식각에 $N_2$가스를 첨가하여 ZnO 박막을 식각 하였을 때 관찰된 ZnO 박막의 식각 특성에 관하여 연구 하였다. ZnO 박막 식각 실험은 RF 800 W, bias power 400 W, 공정 압력 15 mTorr를 기준으로 하였으며 가스 혼합 비율로는 최적의 식각률을 보여주는 $Cl_2$/Ar=8:2 비율에서 실행하였다. 연구의 목적인 첨가 가스 $N_2$를 $Cl_2$ (80%)/Ar (20)%에 5 sccm 씩 첨가하여 20 sccm 까지 증가 시켜 실험 하였다. $N_2$ 가스가 15 sccm 첨가되었을 때 식각률 95.9 nm/min로 기존 $Cl_2$/Ar 기반의 플라즈마 식각보다 높은 식각률을 보여 주었으며 $N_2$ 가스 흐름 조절 외에도 공정 압력, RF power, bias power를 변경하며 실험하였다. 식각된 ZnO 박막의 표면은 최대 식각률을 보이는 공정 조건을 찾기 위해 surface profiler ($\alpha$-step)을 이용하여 식각률을 측정하였으며 ZnO 박막 표면의 화학적인 변화를 조사하기 위해 x-ray photoelectron spectroscopy (XPS)를 사용하였다. XPS 분석 결과 Zn $2p_{3/2}$ peak 가낮은 binding energy 쪽으로 이동한 것을 관찰 할 수 있었다. 또한 O 1s 의 스펙트럼을 분석한 결과 N-O bond와 O-H bond가 존재함이 밝혀졌다.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.23 no.10
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• pp.747-751
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• 2010

In the study, the characteristics of the etched Zinc oxide (ZnO) thin films surface, the etch rate of ZnO thin film in $Cl_2/BCl_3/Ar$ plasma was investigated. The maximum ZnO etch rate of 53 nm/min was obtained for $Cl_2/BCl_3/Ar$=3:16:4 sccm gas mixture. According to the x-ray diffraction (XRD) and atomic force microscopy (AFM), the etched ZnO thin film was investigated to the chemical reaction of the ZnO surface in $Cl_2/BCl_3/Ar$ plasma. The field emission auger electron spectroscopy (FE-AES) analysis showed an elemental analysis from the etched surfaces. According to the etching time, the ZnO thin film of etched was obtained to The AES depth-profile analysis. We used to atomic force microscopy to determine the roughness of the surface. So, the root mean square of ZnO thin film was 17.02 in $Cl_2/BCl_3/Ar$ plasma. Based on these data, the ion-assisted chemical reaction was proposed as the main etch mechanism for the plasmas.

• Journal of the Korean Ceramic Society
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• v.37 no.1
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• pp.1-5
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• 2000

Cathodoluminescence(CL) properties of ZnO:Zn green phosphor were investigated. ZnO:Zn phosphor was synthesized by varying reducing agents and firing temperatures. ZnS, charcoal and 5% H2 gas mixed with 95% N2 gas(5H2-95N2) were used as the reducing agent and atmosphere. The highest CL intensity of ZnO:Zn phosphor was observed under the condition of 5H2-95N2 atmosphere and firing temperature of 90$0^{\circ}C$ for 1h. Charocal and ZnO as reducing agents in the syntehsis of ZnO:Zn phosphor exhibited about 60% and 40%, respectively, of the CL intensity obtained with 5H2-95N2 atmosphere.

• Transactions on Electrical and Electronic Materials
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• v.11 no.3
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• pp.116-119
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• 2010

The etching characteristics of zinc oxide (ZnO) were investigated, including the etch rate and the selectivity of ZnO in a $Cl_2/BCl_3$/Ar plasma. It was found that the ZnO etch rate, the RF power, and the gas pressure showed non-monotonic behaviors with an increasing Cl2 fraction in the $Cl_2/BCl_3$/Ar plasma, a gas mixture of $Cl_2$(3 sccm)/$BCl_3$(16 sccm)/Ar (4 sccm) resulted in a maximum ZnO etch rate of 53 nm/min and a maximum etch selectivity of 0.89 for ZnO/$SiO_2$. We used atomic force microscopy to determine the roughness of the surface. Based on these data, the ion-assisted chemical reaction was proposed as the main etch mechanism for the plasmas. Due to the relatively low volatility of the by-products formed during etching with $Cl_2/BCl_3$/Ar plasma, ion bombardment and physical sputtering were required to obtain the high ZnO etch rate. The chemical states of the etched surfaces were investigated using X-ray photoelectron spectroscopy (XPS). This data suggested that the ZnO etch mechanism was due to ion enhanced chemical etching.

• Journal of Oral Medicine and Pain
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• v.25 no.1
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• pp.1-7
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• 2000

The purpose of this study is to investigate effects of several zinc solutions including Artemisia asiatica-containing zinc solution on concentration of oral volatile sulfur compounds(VSCs). We determined the VSCs concentration of breath of human subjects before and after use of zinc solutions(O.25% $ZnF_2$ Artemisia asiatica-containing 0.25% $ZnCl_2$ and Artemisia asiatica-containing 0.25% $ZnCl_2$ solutions) The results were as follows : 1. 0.25% $ZnCl_2$ solution was more effective than 0.25% $ZnF_2$ solution in reducing the concentration of oral VSCs and the maintenance duration of effectiveness. 2. Artemisia asiatica-containing 0.25% $ZnCl_2$ solution was more effective than Artemisia asiatica-containing 0.25% $ZnF_2$ solution in reducing the concentration of oral VSCs and the maintenance duration of effectiveness. 3. Artemisia asiatica-containing 0.25% $ZnF_2$ solution and 0.25% $ZnF_2$ solution showed no significant difference in reducing the concentration of oral VSCs and the maintenance duration of effectiveness but, Artemisia asiatica-containing 0.25% $ZnF_2$ solution was slightly more effective. 4. Artemisia asiatica-containing 0.25% $ZnCl_2$ solution and 0.25% $ZnCl_2$ solution showed no significant difference in reducing the concentration of oral VSCs and the maintenance duration of effectiveness but, Artemisia asiatica-containing 0.25% $ZnF_2$ solution was slightly more effective.

• Korean Journal of Materials Research
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• v.31 no.12
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• pp.704-709
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• 2021

In the flux used in the batch galvanizing process, the effect of the component ratio of NH₄Cl to ZnCl₂ on the microstructure, coating adhesion, and corrosion resistance of Zn-Mg-Al ternary alloy-coated steel is evaluated. Many defects such as cracks and bare spots are formed inside the Zn-Mg-Al coating layer during treatment with the flux composition generally used for Zn coating. Deterioration of the coating property is due to the formation of AlCl_x mixture generated by the reaction of Al element and chloride in the flux. The coatability of the Zn-Mg-Al alloy coating is improved by increasing the content of ZnCl₂ in the flux to reduce the amount of chlorine reacting with Al while maintaining the flux effect and the coating adhesion is improved as the component ratio of NH₄Cl to ZnCl₂ decreases. Zn-Mg-Al alloy-coated steel products treated with the optimized flux composition of NH₄Cl·3ZnCl₂ show superior corrosion resistance compared to Zn-coated steel products, even with a coating weight of 60 %.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.7 no.2
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• pp.271-275
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• 1997

We have successfully grown Cl-doped ZnSe epitaxial layers on GaAs(100) sub-strates by HWE using $ZnCl_2$ as a doping source. The Cl-doped ZnSe layers showed mirrorlike morphology and good crystallinity. It has been found that the layer exhibited an n-type conduction with low resistivity. The carrier concentration is, obtained about $10^{16}\textrm {cm}^{-3}$, where a resistivity reached 10 $\Omega \textrm {cm}$. The layer with an appropriate doping level exhibited blue photoluminescence at room temperature. The strong blue PL was obtained at the hall mobility of $100^2\textrm {cm}$/Vㆍsec.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2000.04b
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• pp.22-25
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• 2000

ZnS:Cu,Cl 형광체의 여기 및 발광 스펙트럼 측정 결과 주게인 $Cl^-$ 이온과 받게인 $Cu^+$ 이온 사이의 흡수와 발광에 기인하는 peak과 국소화된 발광 중심인 $(CU_2)^{2+}$ 이온의 흡수와 발광에 기인하는 peak이 관측되었다. CuCl의 첨가량이 증가함에 따라 $Cu^+$ 이온의 농도가 증가하게 되어 $(Cu_2)^{2+}$ 이온에 기안하는 발광으로부터 공명 에너지 전달 (Resonant Energy Transfer)의 확률이 높아지기 때문에 513 nm를 중심으로 하는 발광의 세기가 증가하게 된다. 자체 제작한 ZnS:Cu,Cl 형광체를 이용하여 제작한 소자의 휘도 측정결과 400 Hz, 100 V 에서 CuCl 의 첨가량이 0.2 mole% 일 때 휘도가 최대였고, 진동수가 증가함에 따라 휘도가 포화되는 현상이 나타났다. CuCl의 첨가량이 증가함에 따라 513 nm를 중심으로 하는 발광이 강해지고 CIE 좌표값이 녹색영역으로 이동하게 된다. 진동수가 증가하면 인가된 전압의 유지 시간이 짧아지게 되어 발광의 감쇄시간이 긴 513 nm를 중심으로 하는 발광보다 감쇄시간이 짧은 458 nm를 중심으로 하는 발광이 강해지게 되고, CIE 좌표값이 청색영역으로 이동하게 된다.

• Journal of the Korea Academia-Industrial cooperation Society
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• v.7 no.4
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• pp.733-737
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• 2006

In this paper, we report the coordination state and structure of $Zn(cyclam)Cl_{2})$ complex that was studied by the Raman spectrum and conductivity method. The complex of zinc(II) ion with 1,4,8,11-tetraazacyclotetradecane(cyclam) ligand is formed in aqueous solution. According to the Raman spectrum of $Zn(cyclam)Cl_{2})$ complex, $H_{2}O$ molecule and $Cl^{-}$ ion compete for the trans coordination site of zinc(II) ion. We also have investigated the competition effect of $H_{2}O$ molecule and $Cl^{-}$ ion by the conductivity method. On addition of 1,4,8,11-tetraazacyclotetradecane(cyclam) ligand to the aqueous $ZnCl_{2}$ solution, 2: 1 electrolyte is changed to 1:1 electrolyte. We suggest the possibility of elimination of heavy metal because of the affinity effect of macrocyclic polyamine(1,4,8.11-tetraazacyclotetradecane) for the heavy metal,.