• 한국전기전자재료학회논문지
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• 제35권3호
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• pp.275-280
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• 2022

An all-solid-state electrochromic film was fabricated by laminating tungsten oxide (WO₃) and nickel oxide (NiO) thin films deposited by a reactive DC magnetron sputtering on flexible ITO films. The influence of oxygen partial pressure on the crystal structure, microstructure, optical properties, and electrochromic properties of WO₃ and NiO thin films were investigated. WO₃ and NiO films showed the best electrochromic properties under the flow of Ar:O₂=80:20 and Ar:O₂=90:10, respectively. The EC film fabricated with an optimized WO₃ and NiO films showed a high coloration efficiency, a fast response time, and a stable optical modulation. It is expected that flexible EC window films will pave the way for the next-generation energy-saving windows.

• 한국진공학회지
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• 제8권2호
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• pp.136-140
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• 1999

The stability and response time of $WO_3$ thin films for EC device are critical problems being solved. Those are affected by the species of electrolyte, preparation conditions and fabricating methods of specimen. In this paper, we compared the stabilities of three kinds of tungsten oxide film in electrolyte. Each of three films was prepared by different manufacturing conditions, that is, one is a thermal oxidation film of tungsten metal deposited on pure glass substrate, another is a $WO_3$ film made on ITO glass directly, the other is a thermally oxidized film on tungsten plate. It was observed that thermally oxidized $WO_3$ films has a remarkable stability (the lifetime was above $10^6$ cycle). From these results, we found that the stability was closely related to the stoichiometric bonding between tungsten and oxygen atoms in addition to crystallinity and density of film.

• Bulletin of the Korean Chemical Society
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• 제32권6호
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• pp.1865-1872
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• 2011

This study investigates the sensitivity of a gas sensor to volatile organic compounds (VOCs) at various operating temperatures and catalysts. Nano-sized powdered $WO_3$ prepared by sol-gel and chemical precipitation methods was mixed with various metal oxides. Next, transition metals (Pt, Ru, Pd, and In) were doped on the surface of the mixture. Metal-$WO_3$ thick films were prepared using the screen-printing method. The physical and chemical properties of the films were studied by SEM/EDS, XRD, and BET techniques. The measured sensitivity to VOCs is defined as the ratio ($R_a/R_g$) of resistance ($R_{air}$) of $WO_3$ film in the air to resistance ($R_{gas}$) of $WO_3$ film in a VOCs test gas. The sensitivity and selectivity of the films were tested with various VOCs such as acetaldehyde, formaldehyde, methyl alcohol, and BTEX. The thick $WO_3$ film containing 1 wt % of Ru and 5 wt % of $SnO_2$ showed the best sensitivity and selectivity to acetaldehyde gas at an operating temperature of 300 $^{\circ}C$.

• 한국재료학회지
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• 제11권4호
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• pp.272-277
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• 2001

WO$_3$에 NiO를 첨가하여 제조한 후막형 시편의 미세구조와 전기적 성질에 대해 연구하였다. NiO 첨가에 따른 WO$_3$의 결정립 성장이 억제되었고, 입도 분포도 균일하였으나 첨가량에 따른 결정립 크기 변화정도는 작았다. 산소 분압 감소로 WO$_3$의 전도성은 증가하였고, NiO 첨가에 의해 고용한계 이하에서는 전도성이 증가하였고, 이상에서는 전도성이 감소하였다. 온도 증가에 따라 외인성 (extrinsic) 구간에서는 전도성 변화가 적었고, 고온의 진성 (intrinsic) 구간에서는 전도도가 급격히 증가하였으며, 이들의 중간 온도에서는 산소흡착에 따라 전도도가 감소하였다.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 1997년도 추계학술대회 논문집
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• pp.339-342
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• 1997

The optical properties of WO$_3$thin films deposited by RF magnetron reactive sputtering were studied. The substrate was an ITO(indium-tin-oxide) glass(100$\Omega$/ ). The optical properties are examined by different deposition conditions. RF power, substrate temperature, $O_2$concentraction. Ar flow rate, working pressure and thickness are 40~60W, 25~30$0^{\circ}C$, 10%, 54~72sccm, 5~20m7orr and 1200~2400$\AA$, respectively. All these films were colorless, light yellow and found to be amorphous in structure by X-ray diffraction analysis. When RF power, substrate temperature, $O_2$concentraction, Ar flow rate, working pressure and thickness are 40W, $25^{\circ}C$, 10%, 72sccm, 20mTorr and 2400$\AA$, respectively the values of transmittance of the WO$_3$thin films in visible region are about 80%.

• 태양에너지
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• 제12권2호
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• pp.18-27
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• 1992

졸-겔 기술에 의해 $WO_3$ 다충박막이 유리와 ITO coated glass 위에 증착되었다. 특성은 XRD, 분광광도계, DTA/TGA, SEM/EDAX 그리고 RBS에 의해서 분석되었다. 균질한 $WO_3$막은 유리기판위에 dipping속도 5mm/s에서 증착 되었으며 이 시료는 희석된 HCI 전해액을 사용하여 착색시킨 결과 낮은 근적외선 투과율을 나타내었다. DTA 결과 $380^{\circ}C{\sim}500^{\circ}C$ 범위의 gel data는 $WO_3$의 결정화 온도 형성을 결정하였으며 이 측정치는 졸-겔 박막의 결정화 온도와 일치하였다. RBS에 의해 착색되지 않은 $WO_3$ 졸-겔 막의 화학조성은 $WO_3$였다.

• 한국세라믹학회지
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• 제32권12호
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• pp.1369-1376
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• 1995

The WO3 thin-film NOx sensor which is of practical use and includes the heater and the temperature sensor was fabricated. The WO3 thin films as a gas-sensing layer was deposited at ambient temperature in a high-vacuum resistance heated evaporator. The highest sensitivity of the WO3 thin-film sensor to NOx was obtained under the condition of the annealing temperature of 50$0^{\circ}C$ and the operating temperature of 30$0^{\circ}C$. The gas sensing characteristics of this sensor was excellent, i.e. high sensitivity (Rgas/Rair in 3 ppm NO2=53) and fast response time (4 seconds).

• 대한전자공학회:학술대회논문집
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• 대한전자공학회 1998년도 추계종합학술대회 논문집
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• pp.601-604
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• 1998

NOX detecting gas sensors using TiO2 doped tungsten oxide semiconductor were prepared and their electrical and sensing characteristics have been investigated. In normal air condition, the sensors of WO3, TiO2 doped WO3 show grain boundary heights of 0.34 eV, 0.25 eV, respectively. The grain boundary barrier energy variation was increased by doping TiO2 into large variation of resistance to NOX gases. And doping the TiO2 4 wt.%, the particle size of WO3 polycrystal films showed higher sensitivity and better sorption characteristics to NOX gas than the pure WO3 films material in air at operating temperature of $350^{\circ}C.$ The TiO2 doped WO3 semiconductor gas sensor shows nano-sized particle size and good sensitivity to sub-ppm concentration of NOX.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2000년도 하계학술대회 논문집
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• pp.536-539
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• 2000

The effects of annealing on the electrical and structural characteristics for the rf sputter deposited WO$_3$thin film. The sputtered thin films are annealed at 773K for 1 hour in air atmosphere. Oxygen flow rate were changed from 0 to 70% during sputtering. It is observed from the results of the AFM measurement that the average roughness for the rf sputter deposited WO$_3$thin film would be increased from 2.45 angstrom to 152 angstrom by annealing. The sheet resistance of the sputtered WO$_3$film is changed from insulting to MOhm after annealing. According to the results of the XRD, the as-deposited films revealed the amorphous state whereas the peaks of X-ray diffraction at 2 theta= 28 degrees and 2 theta = 25 degrees corresponding to the (111) and (200) plane of the WO$_3$film respectively are observed after annealing.

• 한국재료학회:학술대회논문집
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• 한국재료학회 2005년도 춘계학술발표대회 및 제8회 신소재 심포지엄 논문개요집
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• pp.145-145
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• 2005