• Bulletin of the Korean Chemical Society
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• 제32권11호
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• pp.3991-3995
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• 2011

$TiO_2-SiO_2-In_2O_3$ nanocomposite thin film was deposited on the glass substrates using a dip coating technique. The morphology, surface composition, surface hydroxyl groups, photocatalytic activity and hydrophilic properties of the thin film were investigated by AFM, XPS, methyl orange decoloring rate and water contact angle measurements. The hydroxyl content for $TiO_2$, $TiO_2-SiO_2$ and $TiO_2-SiO_2-In_2O_3$ nanocomposite films was calculated to be 11.6, 17.1 and 20.7%, respectively. $TiO_2-SiO_2-In_2O_3$ film turned superhydrophilic after 180-min irradiation with respect to pure $TiO_2$ and $TiO_2-SiO_2$ thin films. The photocatalytic decomposition of methyl orange for $TiO_2$, $TiO_2-SiO_2$ and $TiO_2-SiO_2-In_2O_3$ thin films was measured as 38.19, 58.71 and 68.02%, respectively. The results indicated that $SiO_2$ and $In_2O_3$ had a significant effect on the hydrophilic, photocatalytic and self-cleaning properties of $TiO_2$ thin film.

• 한국세라믹학회지
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• 제38권5호
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• pp.412-417
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• 2001

본 연구는 습식법으로 수산화 알루미늄과 티타니아를 출발물질로 하여 $Al_2$O$_3$-TiO$_2$복합분체를 제조하였으며, 2 mol의 Al(OH)$_3$분말에 대하여 TiO$_2$분말량을 1, 3, 5, 7, 9, 11 wt%로 첨가하여 $Al_2$O$_3$-TiO$_2$복합분체의 특성을 조사하였다. 제조된 $Al_2$O$_3$-TiO$_2$계 복합분체는 $700^{\circ}C$~140$0^{\circ}C$까지 하소하여 XRD 분석을 한 결과 100$0^{\circ}C$까지는 TiO$_2$(rutile)상과 η-Al$_2$O$_3$상이 공존하다가 110$0^{\circ}C$부터 130$0^{\circ}C$까지는 η-Al$_2$O$_3$에서 $\alpha$-Al$_2$O$_3$로의 상전이가 일어나서 $\alpha$-Al$_2$O$_3$상과 TiO$_2$(rutile)상이 나타났으며 하소온도 140$0^{\circ}C$, TiO$_2$첨가량이 5 wt%일 때부터 $Al_2$TiO$_{5}$가 생성되기 시작하였다. TiO$_2$첨가량에 따른 비표면적값은 첨가량이 7 wt%까지는 감소하였으나 그 이상 첨가시 증가하였다. 입도분석 결과 평균입경은 15.74~23.21$mu extrm{m}$로서 TiO$_2$첨가량이 3 wt%일 때 가장 작은 값을 가졌으며 TiO$_2$첨가량은 5 wt% 이상부터 점차 감소하였다.

• 한국진공학회지
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• 제5권2호
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• pp.147-155
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• 1996

Optical properties of $TiO_2/M/Ag/M/TiO_2$ films have been changed with the diffusion barrier metal M. Optimum opticla properties of $TiO_2/M/Ag/M/TiO_2$ as the transparent heat mirror film, could be obtained with Ti among diffusion barrier metals of Ti, Cu, Zr and Al. $TiO_2/M/Ag/M/TiO_2$ film, which was fabricated by sputtering of 18 nm-thick $TiO_2$ and Ag, and 4nm-thick Ti, showed maximum transimittance of 89% at visible wavelength and infrared reflectance of 97% at wavelength of 3000 nm. Optical properties of this film was not degraded by Xenon-sunshine weather test for 240 hours. For specimens with barrier layers of Cu, Zr, and Al, degradation of optical properties by weather test was increased in a sequence of films with Cu, Zr, and Al barrier layers.

• Journal of Korean Society for Atmospheric Environment
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• 제22권E1호
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• pp.19-26
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• 2006

The decomposition of gaseous $CH_3CHO$ was investigated by metal loaded $TiO_2$ (pure $TiO_2,\;Pt/TiO_2,\;Pd/TiO_2,\;Mn/TiO_2\;and\;Ag/TiO_2$) with $UV/TiO_2$ process and $UV/TiO_2/O_3$ process at room temperature and atmospheric pressure. Metal loaded $TiO_2$ was prepared by photodeposition. Decomposition of $CH_3CHO$ was carried out in a flow-type photochemical reaction system using three 10W black light lamps ($300{\sim}400nm$) as a light source. The experimental results showed that the degradation rate of $CH_3CHO$ was increased with Pt and Ag on $TiO_2$ compared to pure $TiO_2$, but decreased with depositing Pd and Mn on pure $TiO_2$. The considerable increase in the degradation efficiency of the $CH_3CHO$ was found by a combination of photocatalysis and ozonation as compared to only by ozonation or photocatalysis. Loading of Pt on $TiO_2$ promoted conversion of gaseous ozone. The degradation rate of gaseous $CH_3CHO$ decreased with an increase of water vapor in the feed stream for the both $UV/TiO_2\;and\;UV/TiO_2/O_3$ processes. The pure $TiO_2$ was more affected by the water vapor than Pt loaded $TiO_2$.

• 한국세라믹학회지
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• 제41권6호
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• pp.481-484
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• 2004

본 연구에서는 촉매적 활성이 높은 물질로 예상되는 TiO$_2$와 TiO$_2$-CdS계 분말을 초임계 유체법으로 제조하였다. 제조된 TiO$_2$ 광촉매 분말들은 결정질 아나타제로서 비표면적이 넓은 초미립의 구형이었다. 초임계 유체법으로 제조된 TiO$_2$ 광촉매는 유해 유기물인 DCA(Dichloroactic Acid)의 광분해반응의 실험 결과 기존 광촉매 보다 우수한 물성을 보였다.

• Journal of Welding and Joining
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• 제27권2호
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• pp.38-43
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• 2009

In this study, we investigated photocatalytic ability of plasma sprayed $TiO_2$ and Ag sputtering $TiO_2$(Ag-$TiO_2$) coatings. A sputtering processes were adopted to coat the surface of $TiO_2$ with Ag(99.99%). Ag was sputtered at 10mA, 450V for $1{\sim}11$ seconds. $TiO_2$ and Ag-$TiO_2$ coatings were heat-treated at 250, 300, 350, $400^{\circ}C$ for $0{\sim}240$seconds. Photoelectrical conductivity was measured by four-point probe, and photodegradation was calculated by UV-V is spectrometer. Microstructure observation of $TiO_2$ and Ag-$TiO_2$ coatings were investigated by SEM. Crystal structure of $TiO_2$ and Ag-$TiO_2$ coatings were investigated by XRD. Qualitative analyses of $TiO_2$ and Ag-$TiO_2$ coatings were conducted by EDX. When $TiO_2$ coatings were heat-treated at $350^{\circ}C$ for 30 sec, photoelectrical conductivity and photodegradation were best. And in XRD analysis result, (101)/(110) relative intensity ratio of $TiO_2$(rutile) was comparably changed with photoelectrical conductivity. When Ag-$TiO_2$ coatings were heat-treated at $350^{\circ}C$ for 30 [sec] after sputtering Ag for 7 sec, Photoelectrical conductivity and photodegradation are best. Surface of coatings in such condition has very small and uniform Ag particles.

• 한국결정성장학회지
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• 제11권6호
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• pp.269-273
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• 2001

MgO를 기질로 한 세라믹스 시편에 $TiO_2$를 소량 첨가하고 $1450^{\circ}C$에서 열처리한 후 $TiO_2$를 첨가한 MgO 세라믹스의 수분에 대한 수화 반응에 미치는 영향을 조사하였다. $TiO_2$를 첨가하지 않은 MgO 세라믹스는 수분에 대한 수화반응에 의한 $Mg(OH)_2$의 생성으로 인한 질량변화가 관찰되었으나, $TiO_2$를 첨가함 MgO 세라믹스는 수분첩촉시간에 따른 질량변화가 관찰되지 않았다. $TiO_2$를 첨가한 MgO 세라믹스를 $1450^{\circ}C$에서 열처리했을 때, $Mg_2TiO_4$ 상이 관찰되었으며 특히 TiO$_2$를 첨가함에 따라 부피비중은 첨가량에 비례하며 증가한 반면에 가공율과 흡수율은 감소하는 경향을 나타내었다. 따라서 MgO 를 기질로 한 세라믹스에 $TiO_2$를 소량 첨가한 경우 표면에서 발생하는 수화 반응에 대하여 높은 저항성을 가짐을 확인하였다.

• 청정기술
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• 제26권4호
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• pp.304-310
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• 2020

다양한 건축재료에 광촉매(TiO2)를 적용하기 위하여 TiO2-mayenite를 제조하였다. TiO2는 졸-겔법을 사용하여 titanium isopropoxide (TTIP)와 urea를 1:1의 비율로 고정하여 합성하였다. 그 후 온도범위 400 - 700 ℃로 소성하여 온도에 따른 특성을 분석하였다. TiO2의 물리 및 화학적 특성은 BET, TGA 그리고 XRD를 통해 분석되었다. 질소산화물 제거 실험은 KS L ISO 22197-1에 의거하여 1 시간 동안의 NO의 농도변화를 측정하여 확인하였다. 제조된 입자들은 600 ℃ 이하에서 아나타제 결정구조를 나타내었고, TiO2 (urea)-400에서 2.35 µmol h-1의 가장 높은 질소산화물 제거율을 나타내었다. TiO2-mayenite는 TiO2 분산 용액을 스프레이하는 방법(s/s)과 졸-겔 상태의 용액을 스프레이 하는 방법(g/s)으로 제조하였다. BET와 XRD 분석을 통하여, 제조된 TiO2-mayenite는 졸-겔 상태의 용액을 스프레이 하여 제조한 5-TiO2 (g/s) 입자가 열처리에도 결정구조를 유지하는 것을 확인하였다. 또한 질소산화물 제거 실험에서도 5-TiO2 (g/s)-500 입자에서 0.55 µmol h-1의 가장 높은 제거율을 나타내었다. 결론적으로 TiO2-mayenite를 제조하기 위하여 TiO2는 졸-겔 상태에서 mayenite에 결합시켜야 결정구조를 유지하며, 높은 질소산화물 제거 능력을 나타내는 것을 확인하였다.

• E2M - 전기 전자와 첨단 소재
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• 제10권8호
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• pp.819-829
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• 1997

The microwave dielectric materials of the BaO-Nd$_2$O$_3$-TiO$_2$and BaO-(Sm, Nd)$_2$O$_3$-TiO$_2$system were synthesized by conventional ceramic processing and sintered 1220 to 140$0^{\circ}C$ for 2 hours respectively. Their crystallization and dielectric properties were examined. In the BaO-Nd$_2$O$_3$-TiO$_2$ and BaO-(Sm, Nd)$_2$O$_3$-TiO$_2$system. Nd$_2$Ti$_2$O$_{7}$ and (Sm, Nd)$_2$Ti$_2$O$_{7}$ were observed as a second phase respectively. The maximum relative dielectric constant were 79,99 for the BaO-Nd$_2$O$_3$-TiO$_2$system and 105.07 for the BaO-(Sm,Nd)$_2$O$_3$-TiO$_2$system and their Q-value were over 2000 at 3GHz.GHz.

• 한국표면공학회지
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• 제35권6호
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• pp.383-390
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• 2002

To investigate behaviors of Ti and O elements and microstructures of anodic titanium oxide films, the films were prepared by anodizing pure titanium in $H_2$S $O_4$, $H_3$P $O_4$, and $H_2O$$_2$ mixed solution at 180V. The microstructures and chemical states of the elements were analyzed using SEM, X-ray mapping, AFM, XRD, XPS (depth profile). The films formed on a titanium substrate showed porous layers which were composed of pore and wall, And with increasing anodizing time a hexagonal shape of cell structures were dominant and solace roughness increased. From the XRD result the structure of the Ti $O_2$ layer was anatase type of crystal on the whole. In the XPS spectra it was found that Ti and O were chemically binded in forms of Ti $O_2$, TiOH, $Ti_2$ $O_3$ at Ti 2p, and Ti $O_2$, $Ti_2$ $O_3$, $P_2$ $O_{5}$, S $O_4^{2-}$ at O ls respectively. Concentration of Ti $O_2$ decreased as the depth increased from the surface of the oxide film towards the substrate, but to the contrary concentrations of TiOH and $Ti_2$ $O_3$ increased.d.