• 제목/요약/키워드: $TiO_2$thin film

검색결과 1,090건 처리시간 0.097초

동시 스퍼터링법에 이용하여 제작한 TiO2와 Ag/TiO2 광학 박막의 특성 (Characteristics of TiO2 and Ag/TiO2 optical thin film by Co-sputtering method)

  • 김상철;한성홍;김의정;이충우;주종현;김구철
    • 한국광학회지
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    • 제16권2호
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    • pp.168-173
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    • 2005
  • 고주파 마그네트론 동시 스퍼터링법을 이용하여 $TiO_2$ 박막에 Ag를 도핑한 $Ag/TiO_2$ 박막을 제작하고, 열처리 온도에 따른 박막의 물리적, 화학적 특성을 조사하였다. XRD 측정 결과로부터 금속을 도핑한 박막이 순수 $TiO_2$ 박막보다 결정크기가 더 작은 것을 확인하였으며, SEM 측정 결과로부터 $Ag/TiO_2$ 박막은 순수 $TiO_2$ 박막보다 골자의 크기가 작고 균일하다는 것을 알 수 있었다. 제작된 박막은 가시광선 영역에서 높은 투과율을 나타내었다. $600^{\circ}C$에서 열처리한 박막은 아나타제 결정상이 나타났으며, $900^{\circ}C$에서 열처리한 박막은 아나타제와 루타일상이 혼합되어 나타났다 특히, $900^{\circ}C$에서 열처리한 경우 아나타제에서 루타일로의 상전이에 따른 밴드갭 에너지의 변화에 의해 박막의 흡수단이 장파장 영역으로 이동하였다. 또한 박막 내의 흡수와 산란효과에 의해 투과율이 감소하였다. $Ag/TiO_2$ 박막의 광활성은 순수 $TiO_2$ 박막보다 우수함을 알 수 있었다.

DC와 RF Magnetron Sputtering 공법을 이용한 다층 TiO2/Al, Cr/TiO2 진주안료 개발 (Development of Multi-layered TiO2/Al, Cr/TiO2 Pearl Pigment Processed by DC and RF Magnetron Sputtering Process)

  • 정재일;이정훈;장건익
    • 한국전기전자재료학회논문지
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    • 제19권8호
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    • pp.764-768
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    • 2006
  • For the possible application of pearl pigment, multi-layered $TiO_2/Al,\;Cr/TiO_2$ thin film were deposited on $SiO_2$ substrate by using sputtering method, $TiO_2$ and Al or Cr was selected as a possible high and low refraction material at the film interface respectively. Optical properties including color effect were systematically studied in terms of different film thickness and film layers by using spectrometer. In order to expect the experimental results, the simulation program, the Essential Macleod Program(EMP) was adopted and compared with the experimental data. The film consisting of $TiO_2/Al,\;Cr/TiO_2$ layers shows a wavelength range of $430{\sim}760nm$, typically color ranges between bluish purple and red. It was confirmed that this experimental result was quite well consistent with the experimental one.

나노 다층 TiAlSiN 박막의 고온 산화 (High-temperature Oxidation of Nano-multilayered TiAlSiN Filems)

  • 이동복;김민정
    • 한국표면공학회:학술대회논문집
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    • 한국표면공학회 2016년도 추계학술대회 논문집
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    • pp.189-189
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    • 2016
  • In this study, the Al-rich AlTiSiN thin films that consisted of TiN/AlSiN nano-multilayers were deposited on the steel substrate by magnetron sputtering, and their high-temperature oxidation behavior was investigated, which has not yet been adequately studied to date. Since the oxidation behavior of the films depends sensitively on the deposition method and deposition parameters which affect their crystallinity, composition, stoichiometry, thickness, surface roughness, grain size and orientation, the oxidation studies under various conditions are imperative. AlTiSiN nano-multilayer thin films were deposited on a tool steel substrate, and their oxidation behavior of was investigated between 600 and $1000^{\circ}C$ in air. Since the amount of Al which had a high affinity for oxygen was the largest in the film, an ${\alpha}-Al_2O_3-rich$ scale formed, which provided good oxidation resistance. The outer surface scale consisted of ${\alpha}-Al_2O_3$ incoporated with a small amount of Ti, Si, and Fe. Below this outer surface scale, a thin ($Al_2O_3$, $TiO_2$, $SiO_2$)-intermixed scale formed by the inwardly diffusing oxygen. The film oxidized slower than the $TiO_2-forming$ kinetics and TiN films, but faster than ${\alpha}-Al_2O_3-forming$ kinetics. During oxidation, oxygen from the atmosphere diffused inwardly toward the reaction front, whereas nitrogen and the substrate element of iron diffused outwardly to a certain extent.

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열처리온도에 따른 $(Sr_{0.85}Ca_{0.15})TiO_3$박막의 구조 및 특성 (Microstructure and Properties of $(Sr_{0.85}Ca_{0.15})TiO_3$ Thin Film with Annealing Temperature)

  • 김진사;조춘남;신철기;최운식;김충혁;이준웅
    • 한국전기전자재료학회논문지
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    • 제14권10호
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    • pp.802-807
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    • 2001
  • The (S $r_{0.85}$C $a_{0.15}$)Ti $O_{3}$(SCT) thin films are deposited on Pt-coated electrode (Pt/TiN/ $SiO_2$/Si) using RF sputtering method. The composition of SCT thin films deposited on Si substrate at woom temperature is close to stoichiometry(1.102 in A/B ratio). The maximum dielectric constant of SCT thin films is obtained by annealing at 600[$^{\circ}C$]. The capacitance characteristics had a stable value within $\pm$4[%]. The drastic decrease of dielectric constant and increase of dielectric loss in SCT thin films is observed above 200[kHz]. SCT thin films used in this study show the phenomena of dielectric relaxation with the increase of frequencey.cey.

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염료감응 태양전지에서 전면전극/FTO 사이에 완충층으로서의 PLD로 증착한 $TiO_2$ 박막에 관한 연구 (A Study on $TiO_2$ Thin Film by PLD for Buffer Layer between Front Electrode and FTO of Dye-sensitized Solar Cell)

  • 송상우;노지형;이경주;지민우;문병무
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2009년도 하계학술대회 논문집
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    • pp.465-466
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    • 2009
  • Dye-sensitized Solar Cell (DSC) is a new type of solar cell by using photocatalytic properties of $TiO_2$. The electric potential distribution in DSCs has played a major role in the operation of such cells. $TiO_2$ thin films were deposited on the ITO substrate by Nd:YAG Pulsed Laser Deposition(PLD) at room temperature and post-deposition annealing at $500^{\circ}C$ in flowing $O_2$ atmosphere for 1hour. The structural properties of $TiO_2$ thin films have investigated by X-ray diffraction(XRD). We manufactured DSC unit cells then I-V and efficiency were tested by solar simulator.

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화학증착법에 의해 제조된 $PbTiO_3$ 박막의 전기적 특성에 관한 연구 (Electrical Properties of $PbTiO_3$ Thin Films Fabricated by CVD)

  • 윤순길;김호기
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1989년도 하계종합학술대회 논문집
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    • pp.329-332
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    • 1989
  • Lead titanate thin films were deposited on titanium substrates by a chemical vapour deposition(CVD) process involving the application of vapour mixtures of Pb, ethyl titanate( Ti($C_2H_5O_4$)), and oxygen. The lead titanate having a stoichiometric composition has a dc conductivity of $3.2{\times}10^{-12}{\Omega}^{-1}{\cdot}cm^{-1}$ at room temperature. The nonsaturating loops observed in present investigation may be attributed to the $TiO_2$ and TiO layers between the conductive substrate and the $PbTiO_3$ ferroelectric film. The ferroelectric properties of the stoichiometric $PbTiO_3$ film included a remanent polarization of 14.1 ${\mu}C/cm^2$ and a coercive field of 20.16 kV/cm.

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수용성 $TiO_2$졸의 안정성과 박막 특성에 미치는 용매의 영향 (Effect of Solvent on the Stability of Aqueous $TiO_2$Sol and Characteristics of Its Thin Film)

  • 조경식;김성도;김성진
    • 한국세라믹학회지
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    • 제38권7호
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    • pp.660-666
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    • 2001
  • 수용계를 이용하여 졸겔법으로 중성 TiO$_2$졸을 제조하였다. 용매로 에탄올을 사용한 경우 메탄올에 비해 졸의 안정성이 우수하였다. 졸 제조시 에탄올을 사용하면, 메탄올을 용매로 사용할 경우보다 중심 금속에 부착되는 알콕시족의 크기가 작아져서 티타늄알콕사이드의 가수분해 속도가 빨라지기 때문이다. TTIP : AcAc : EtOH : $H_2O$ : PEG : HCl의 몰비가 1 : 1 : 8 : 50 : 0.5 : 0.15의 조성을 갖는 에탄올 용매 졸은 30일까지도 안정한 상태를 유지하였고 코팅성이 양호하였다. 10회 반복 침지, 건조 및 50$0^{\circ}C$에서 열처리된 두께 약 $1.5mu extrm{m}$의 TiO$_2$박막은 표면이 균질하고 치밀한 미세구조를 보였다. 제조한 TiO$_2$박막은 가시광선 영역에서 약 70%의 투과도를 나타내었다.

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Quantitative Comparison of the Photocatalytic Efficiency of TiO2 Nanotube Film and TiO2 Powder

  • Jang, Jun-Won;Park, Sung Jik;Park, Jae-Woo
    • 한국지하수토양환경학회지:지하수토양환경
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    • 제21권2호
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    • pp.8-14
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    • 2016
  • We compared the plausible reaction mechanism and quantitative efficiency of highly self-organized TiO2 nanotube (ntTiO2) film with TiO2 powder. Film was fabricated by electrochemical potentiostatic anodization of titanium thin film in an ethylene-glycol electrolyte solution containing 0.3 wt% NH4F and 2 vol% deionized water. Nanotubes with a pore size of 80-100 nm were formed by anodization at 60 V for 3 h. Humic acid (HA) was degraded through photocatalytic degradation using the ntTiO2 film. Pseudo first-order rate constants for 0.3 g of ntTiO2, 0.3 g TiO2 powder, and 1 g TiO2 powder were 0.081 min−1, 0.003 min−1, and 0.044 min−1, respectively. HA adsorption on the ntTiO2 film was minimal while adsorption on the TiO2 powder was about 20% based on thermogravimetric analysis. Approximately five-fold more normalized OH radicals were generated by the ntTiO2 film than the TiO2 powder. These quantitative findings explain why ntTiO2 film showed superior photocatalytic performance to TiO2 powder.

Mo(100) 표면에 $TiO_2$초박막의 성장과 특성 (Growth and Characterization of Ultra-Thin $TiO_2$Film on Mo(100) Surface)

  • 김대영
    • 대한화학회지
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    • 제41권5호
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    • pp.223-233
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    • 1997
  • 초고진공조에서 산소 분압, $1{\times}10^{-6}$ Torr, 하에서 Ti 금속을 Mo(100)에 증발시킴으로써 $TiO_2$ 초박막을 성장시켰다. Ti 금속을 Mo(100) 표면에 증착시킨 시간에 따른 오재(Auger) 봉우리의 크기 변화율을 조사함으로써 Ti 금속의 증발 속도를 알아내고, 그것을 이용하여 $TiO_2$ 박막 성장시 박막의 두께를 조절하였다. 30 ML, 5 ML, 1.6 ML 두께의 $TiO_2$ 박막을 만들어 박막의 성장메카니즘, 박막의 화학적 조성, 박막의 표면 구조를 연구하였다. 박막의 성장 메커니즘은 층별 성장에 가까운 성장 방식인 것으로 설명할 수 있다. 박막의 화학적 조성은 본체 $TiO_2$ 와 동일하였다. 박막의 표면은 (001) 평면이며, 고온 1200 K에서 비가역적으로 부면화(faceging)한다. 박막으로부터 관찰된 저에너지 전자회절 무늬는 $TiO_2$ (001) 표면이 {011} 평면을 가진 부면을 형성하고 각 부면이 다시 $TiO_2$ (001) 평면에 대하여 $(2\sqrt2{\times}\sqrt2)R45^{\circ}$로 재건축한다는 것으로 설명될 수 있다. 박막은 1300 K의 고온에서 얼마간 열적 불안정성을 보인다. $Ar^+$ 이온으로 스퍼터링한 $TiO_2$ 박막에 대하여 XPS를 이용하여 역시 알아보았다.

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RF Sputtering법으로 제조된 TiO2 박막의 광촉매 특성 (Photocatalytic Properties of TiO2 Thin Films Prepared by RF Sputtering)

  • 정민호;진덕용;;최대규
    • 한국재료학회지
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    • 제13권3호
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    • pp.185-190
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    • 2003
  • Titanium dioxide films were prepared by RF sputtering method on glass for various oxygen partial pressures at power 270 W. The crystal structure, photocatalytic property and the hydrophilicity of $TiO_2$thin film the deposition conditions were investigated. Crystallized anatase phase was observed in $TiO_2$film deposited at the ratio of oxygen partial pressure 10% and 20% for 2 hrs. As the increase of deposition time, the grain size and void size of $TiO_2$film have increased and also $V_2$films have been good crystallinity. The ultraviolet-visible light absorption of $TiO_2$films was increased with increasing of deposition time and occured chiefly at the wavelength between 280 and 340 nm. The absorption band was shifted to a longer wave length as deposition time increased. Water contact angle on the X$TiO_2$film of anatase structure was decreased with increasing ultraviolet illumination time and became lower than $11^{\circ}$ from $83^{\circ}$. When hydrophilic $TiO_2$film changed by enough ultraviolet illumination was stored in the dark, the film surface gradually turned to hydrophobic state.