• Korean Journal of Optics and Photonics
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• v.16 no.2
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• pp.168-173
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• 2005

Ag-doped $TiO_2$ thin films were prepared by RF magnetron co-sputtering method, and their physical and chemical properties were examined as a function of calcination temperature. XRD results showed that the crystallite size of Ag-doped films was smaller than that of the $TiO_2$ thin films. SEM results showed that the particle size of $Ag/TiO_2$ film was smaller and more uniform than pure $TiO_2$ film. The films had high transparency in the visible range. The films calcined at $600^{\circ}C$ were the anatase phase, and the films calcined at $900^{\circ}C$ were a mixture of anatase and rutile phases. The absorption edge of films calcined at $900^{\circ}C$ was red-shifted. This is due to the augmented absorption resulting from the phase transformation from anatase to rutile phase. And the transmittance of films decreased by the light scattering and absorption in the films. Photocatalytic activity of $Ag/TiO_2$ thin films was higher than that of the pure $TiO_2$ thin films.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.19 no.8
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• pp.764-768
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• 2006

For the possible application of pearl pigment, multi-layered $TiO_2/Al,\;Cr/TiO_2$ thin film were deposited on $SiO_2$ substrate by using sputtering method, $TiO_2$ and Al or Cr was selected as a possible high and low refraction material at the film interface respectively. Optical properties including color effect were systematically studied in terms of different film thickness and film layers by using spectrometer. In order to expect the experimental results, the simulation program, the Essential Macleod Program(EMP) was adopted and compared with the experimental data. The film consisting of $TiO_2/Al,\;Cr/TiO_2$ layers shows a wavelength range of $430{\sim}760nm$, typically color ranges between bluish purple and red. It was confirmed that this experimental result was quite well consistent with the experimental one.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2016.11a
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• pp.189-189
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• 2016

In this study, the Al-rich AlTiSiN thin films that consisted of TiN/AlSiN nano-multilayers were deposited on the steel substrate by magnetron sputtering, and their high-temperature oxidation behavior was investigated, which has not yet been adequately studied to date. Since the oxidation behavior of the films depends sensitively on the deposition method and deposition parameters which affect their crystallinity, composition, stoichiometry, thickness, surface roughness, grain size and orientation, the oxidation studies under various conditions are imperative. AlTiSiN nano-multilayer thin films were deposited on a tool steel substrate, and their oxidation behavior of was investigated between 600 and $1000^{\circ}C$ in air. Since the amount of Al which had a high affinity for oxygen was the largest in the film, an ${\alpha}-Al_2O_3-rich$ scale formed, which provided good oxidation resistance. The outer surface scale consisted of ${\alpha}-Al_2O_3$ incoporated with a small amount of Ti, Si, and Fe. Below this outer surface scale, a thin ($Al_2O_3$, $TiO_2$, $SiO_2$)-intermixed scale formed by the inwardly diffusing oxygen. The film oxidized slower than the $TiO_2-forming$ kinetics and TiN films, but faster than ${\alpha}-Al_2O_3-forming$ kinetics. During oxidation, oxygen from the atmosphere diffused inwardly toward the reaction front, whereas nitrogen and the substrate element of iron diffused outwardly to a certain extent.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.14 no.10
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• pp.802-807
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• 2001

The (S $r_{0.85}$C $a_{0.15}$)Ti $O_{3}$(SCT) thin films are deposited on Pt-coated electrode (Pt/TiN/ $SiO_2$/Si) using RF sputtering method. The composition of SCT thin films deposited on Si substrate at woom temperature is close to stoichiometry(1.102 in A/B ratio). The maximum dielectric constant of SCT thin films is obtained by annealing at 600[$^{\circ}C$]. The capacitance characteristics had a stable value within $\pm$4[%]. The drastic decrease of dielectric constant and increase of dielectric loss in SCT thin films is observed above 200[kHz]. SCT thin films used in this study show the phenomena of dielectric relaxation with the increase of frequencey.cey.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2009.06a
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• pp.465-466
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• 2009

Dye-sensitized Solar Cell (DSC) is a new type of solar cell by using photocatalytic properties of $TiO_2$. The electric potential distribution in DSCs has played a major role in the operation of such cells. $TiO_2$ thin films were deposited on the ITO substrate by Nd:YAG Pulsed Laser Deposition(PLD) at room temperature and post-deposition annealing at $500^{\circ}C$ in flowing $O_2$ atmosphere for 1hour. The structural properties of $TiO_2$ thin films have investigated by X-ray diffraction(XRD). We manufactured DSC unit cells then I-V and efficiency were tested by solar simulator.

• Proceedings of the KIEE Conference
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• 1989.07a
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• pp.329-332
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• 1989

Lead titanate thin films were deposited on titanium substrates by a chemical vapour deposition(CVD) process involving the application of vapour mixtures of Pb, ethyl titanate( Ti($C_2H_5O_4$)), and oxygen. The lead titanate having a stoichiometric composition has a dc conductivity of $3.2{\times}10^{-12}{\Omega}^{-1}{\cdot}cm^{-1}$ at room temperature. The nonsaturating loops observed in present investigation may be attributed to the $TiO_2$ and TiO layers between the conductive substrate and the $PbTiO_3$ ferroelectric film. The ferroelectric properties of the stoichiometric $PbTiO_3$ film included a remanent polarization of 14.1 ${\mu}C/cm^2$ and a coercive field of 20.16 kV/cm.

• Journal of the Korean Ceramic Society
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• v.38 no.7
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• pp.660-666
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• 2001

수용계를 이용하여 졸겔법으로 중성 TiO$_2$졸을 제조하였다. 용매로 에탄올을 사용한 경우 메탄올에 비해 졸의 안정성이 우수하였다. 졸 제조시 에탄올을 사용하면, 메탄올을 용매로 사용할 경우보다 중심 금속에 부착되는 알콕시족의 크기가 작아져서 티타늄알콕사이드의 가수분해 속도가 빨라지기 때문이다. TTIP : AcAc : EtOH : $H_2O$ : PEG : HCl의 몰비가 1 : 1 : 8 : 50 : 0.5 : 0.15의 조성을 갖는 에탄올 용매 졸은 30일까지도 안정한 상태를 유지하였고 코팅성이 양호하였다. 10회 반복 침지, 건조 및 50$0^{\circ}C$에서 열처리된 두께 약 $1.5mu extrm{m}$의 TiO$_2$박막은 표면이 균질하고 치밀한 미세구조를 보였다. 제조한 TiO$_2$박막은 가시광선 영역에서 약 70%의 투과도를 나타내었다.

• Journal of Soil and Groundwater Environment
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• v.21 no.2
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• pp.8-14
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• 2016

We compared the plausible reaction mechanism and quantitative efficiency of highly self-organized TiO₂ nanotube (ntTiO₂) film with TiO₂ powder. Film was fabricated by electrochemical potentiostatic anodization of titanium thin film in an ethylene-glycol electrolyte solution containing 0.3 wt% NH₄F and 2 vol% deionized water. Nanotubes with a pore size of 80-100 nm were formed by anodization at 60 V for 3 h. Humic acid (HA) was degraded through photocatalytic degradation using the ntTiO₂ film. Pseudo first-order rate constants for 0.3 g of ntTiO₂, 0.3 g TiO₂ powder, and 1 g TiO₂ powder were 0.081 min⁻¹, 0.003 min⁻¹, and 0.044 min⁻¹, respectively. HA adsorption on the ntTiO₂ film was minimal while adsorption on the TiO₂ powder was about 20% based on thermogravimetric analysis. Approximately five-fold more normalized OH radicals were generated by the ntTiO₂ film than the TiO₂ powder. These quantitative findings explain why ntTiO₂ film showed superior photocatalytic performance to TiO₂ powder.

• Journal of the Korean Chemical Society
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• v.41 no.5
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• pp.223-233
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• 1997

Ultra-thin $TiO_2$ films are grown on the Mo(100) surface using evaporated Ti metal under ambient $O_2$ pressure. The thickness of the $TiO_2$ film is controlled by the dosing rate of Ti metal over Mo(100) which is determined from the Auger signal changes with dosing time. 30 ML, 5 ML, and 1.6 ML thick films are prepared and used to determine the growth mechanism, the chemical composition, and the surface structure of the films. The growth mechanism of the $TiO_2$ film on Mo(100) is observed to follow the layer-by-layer growth mechanism. The chemical composition of the film is found to be that of bulk $TiO_2$. The surface plane of the film is (001), which facets irreversibly at 1200 K. The LEED pattern obtained from the film can be explained with the faceted surface with {011} planes reconstructed to $(2\sqrt2{\times}\sqrt2)R45^{\circ}$ with respect to the $TiO_2$ (001) surface. The film is somewhat thermally unstable when annealed to 1300 K. The film sputtered with $Ar^+$ ion is also studied by XPS.

• Korean Journal of Materials Research
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• v.13 no.3
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• pp.185-190
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• 2003

Titanium dioxide films were prepared by RF sputtering method on glass for various oxygen partial pressures at power 270 W. The crystal structure, photocatalytic property and the hydrophilicity of $TiO_2$thin film the deposition conditions were investigated. Crystallized anatase phase was observed in $TiO_2$film deposited at the ratio of oxygen partial pressure 10% and 20% for 2 hrs. As the increase of deposition time, the grain size and void size of $TiO_2$film have increased and also $V_2$films have been good crystallinity. The ultraviolet-visible light absorption of $TiO_2$films was increased with increasing of deposition time and occured chiefly at the wavelength between 280 and 340 nm. The absorption band was shifted to a longer wave length as deposition time increased. Water contact angle on the X$TiO_2$film of anatase structure was decreased with increasing ultraviolet illumination time and became lower than $11^{\circ}$ from $83^{\circ}$. When hydrophilic $TiO_2$film changed by enough ultraviolet illumination was stored in the dark, the film surface gradually turned to hydrophobic state.