Film Properties of MOCVD TiN prepared by TDMAT and TDMAT/$NH_3$
(TDMAT와 TDMAT/$NH_3$ 로 형성한 MOCVD(Metal Organic Chemical Vapor Deposition) Titanium Nitride 박막의 특성)
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- Korean Journal of Materials Research
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- v.5 no.7
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- pp.775-780
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- 1995