• 한국재료학회지
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• 제11권7호
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• pp.580-584
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• 2001

Ti과 Si의 비가 서로 다른 종류의 타 을 $Ar/N_2$의 혼합기체를 사용하여 rf magnetron sputtering방법으로 증착된 Ti-Si-N박막의 증착특성에 대해 연구하였다. Ti-Si-N박막의 조성과 증착률은 각 타 Ti/Si의 비율과 증착시의 질소기체의 유량에 따라 크게 변하였다. 이것은 Ti과 Si의 nitriding 정도의 차이로 인한 서로 다른 sputter yield에 의한 것으로 나타났다. Si이 비교적 적게 포함된 Ti-Si-N박막은 증착시부터 박막내 TiN의 결정화가 일어났으며, 낮은 비저항을 나타내었다. N의 함량의 증가는 박막의 밀도와 압축응력을 증가시켜 Ti-Si-N박막의 확산방지 능력에 큰 영향을 미치는 인자로 나타났다. 본 연구에서 $N_2$의 유략과 타 의 Ti/Si비율을 조절함으로써 효율적인 확산방지막인 Ti-Si-N 박막의 공정조건을 확립할 수 있었다. 박막의 공정조건을 확립할 수 있었다.

• 한국안광학회지
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• 제14권1호
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• pp.57-62
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• 2009

목적: Magnetron의 세기를 비대칭으로 한 unbalanced magnetron sputtering 장치를 설계 제작하고 sus304시편 위에 TiN박막을 증착하여 색상과 경도에 관한 연구를 하고자 한다. 방법: 증착된 박막표면의 화학조성을 양적으로 분석하기 위하여 XPS high resolution scan과 curve fitting을 수행하였으며, 박막 표면의 경도를 측정하기 위해 nano indentation 장비를 이용하였다. 결과: 박막 두께가 두꺼워지면 박막의 색상은 처음에는 연한 금색, 시간이 지남에 따라 어두운 금색, 연보라, 남색으로 바뀌었다. 두께에 따른 박막의 색상변화는 박막에$TiO_{x}N_{y}$, $TiO_2$, TiN과 같은 세가지 화합물의 조성변화에 기인함을 알 수 있었으며,$ TiO_{x}N_{y}$의 조성변화가 두께에 따른 색상변화에 가장 큰 영향을 미치는 것을 여겨졌다. 결론: TiN박막의 비커스 경도가 TiN의 일반적인 경도보다 수치가 작은 것은 박막이 TiN, $TiO_2$,$TiO_{x}N_{y}$ 세가지 물질 섞여 있기 때문이라고 여겨지며, 두께에 따른 박막의 경도가 점점 커지다가 줄어드는 것은 두께에 따른 TiN 양과 밀접한 관계가 있음을 알 수 있었다.

• 대한전자공학회논문지
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• 제19권6호
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• pp.52-54
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• 1982

p·Si-전해질 접합을 전해질로 6N H2SO4, 6N H2SO4(Ti3+), 6N H2SO4(Ti4+), 6N H2SO4(Ti4+/Ti3+)을 사용하여 만들었다. 이들 전해질중 6N H2SO4(Ti4-/Ti3+)을 사용할 때 p·Si 광음극이 안정하게 동학하며 높은 광전 감도를 가지고 있었다. p·Si-electrolyte junction are prepared by using p·Si photocatode in four different electrolytes such as 6N H2SO4, 6N H2SO4(Ti3+), 6N H2SO4(Ti4+), 6N H2SO4(Ti4+/Ti3+) respectively. Among those electrolytes 6N H2SO4(Ti4-/Ti3+) shows very good results, in which p·Si photocathode is stable.

• 전자공학회논문지A
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• 제29A권4호
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• pp.49-57
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• 1992

Tungsten film was deposited on the TiN surface in a low pressure chemical vapor deposition reactor and chemical reaction mechanism between TiN surface and ($WF_{6}\;and\;SiH_{4}$ was studied. Interaction of ($WF_{6}\;or\;SiH_{4}$ with TiN surface and tungsten was deposited more easily. $WF_6$ reacted with TiN activated the TiN surface to form volatile TiF_4$ and tungsten nuclei were formed. ($SiH_{4}$ was dissociated on the TiN surface to form silicon nuclei. From RBS and AES analysis, we could not detect the impurities(such as Si or TiF$_x$)at the interface between tungsten and TiN. The adhesion at the W/TiN interface became poor when the deposition temperature was below 275$^{\circ}C$.

• 한국표면공학회:학술대회논문집
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• 한국표면공학회 2014년도 추계학술대회 논문집
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• pp.24-24
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• 2014

음극 아크 증착을 이용하여 제조한 AlTiN 박막의 공정 변화에 따른 물리적 특성 변화를 평가하였다. 또한 빗각 증착을 적용하여 제조한 AlTiN 박막의 특성을 평가하였다. Al-Ti 타겟(Al:Ti=75:25 at.%)을 음극 아크 소스에 장착하여 AlTiN 박막을 코팅하였다. 기판은 stainless steel(SUS304)과 초경(tungsten carbide; WC)을 사용하였다. 음극 아크 소스에 인가되는 전류가 낮을수록 AlTiN 박막 표면에 존재하는 거대입자의 밀도가 낮아졌으며, 공정 압력과 기판 전압이 높을수록 AlTiN 박막의 표면에 존재하는 거대입자의 밀도가 낮아지는 경향을 보였다. 코팅 공정 중 질소 유량을 변화했지만 AlTiN 박막의 특성은 변하지 았았다. AlTiN 박막 제조 시 빗각을 적용한 결과, $60^{\circ}$의 빗각을 적용한 다층 박막에서 약 33 GPa의 경도를 보였다. AlTiN 박막의 내산화성을 평가한 결과, $600^{\circ}C$이상에서 안정된 내산화성을 확인할 수 있었다.

• 전자공학회논문지A
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• 제29A권7호
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• pp.73-81
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• 1992

We have investigated the thermal reaction property and the oxygen behavior of TiN/Ti/Si structure after different hear treatments using x-ray photoelectron spectroscopy and cross-sectional transmission electron microscopy measurements. During the heat treatment in N$_2$ amibient, the considerable amount of oxygen atoms incorporates into TiN/Ti/Si Structures. It is found that oxygen atoms pile up at the top surface of TiN and TiN/Ti interface, forming a compound of TiO$_2$ above $600^{\circ}C$. Inside the TiN film, the oxygen content increases as the annealing temperature increases, mostly TiO and Ti$_2$O$_3$ rather than thermodynamically stable TiO$_2$. Above the annealing temperature of 55$0^{\circ}C$, the TiSi$_2$ formation has initiated. One thing to note is that a severe blistering is observed in the sample annealed at $600^{\circ}C$, due to (1) the difference of thermal expansion coefficient between TiN and Si` (2) the compressive stress induced by the volume reduction caused by the Ti-Silicide grain while elevating temperatures.

• 한국세라믹학회지
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• 제50권6호
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• pp.523-527
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• 2013

Ti-based coatings following laser ablation were studied to compare degradation behaviors by thermomechanical stress. TiN, TiCN, and TiAlN coatings were degraded by a Nd:YAG pulsed laser with an increase in the laser pulses. A decrease in the hardness was identified as the pulses increased, and the hardness levels were in the order of TiAlN > TiCN > TiN. The TiN showed cracks on the surface, and cracks with pores formed along the cracks were observed in the TiCN. The dominant degradation behavior of the TiAlN was surface pore formation. EDS results revealed that diffusion of substrate atoms to the coating surface occurred in the TiN. Delamination occurred in the TiN and TiCN, while the TiAlN which has higher thermal stability than the TiN and TiCN maintained adhesion to the substrate. It was considered that the decrease in the hardness of the Ti-based hard coatings is attributed to surface cracking and the diffusion of substrate atoms.

• 한국분말재료학회지
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• 제15권6호
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• pp.503-508
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• 2008

Ti(C,N) solid solutions in hot-pressed Ti($C_{x}N_{1-x}$) (x=0.0, 0.3, 0.5, 0.7, 1.0) and 40TiC-40TiN-20Ni (in wt.%) cermet were characterized in this study. For hot-pressed Ti(C,N)s, the lattice parameters and hardness values of Ti(C,N) were determined by using XRD (X-Ray Diffraction) and nanoindentation. The properties of hot-pressed Ti(C,N) samples changed linearly with their carbon or nitrogen contents. For the TiC-TiN-Ni cermet, the hardness of the hard phase and binder phase were determined by nanoindentation in conjunction with microstructural observation. The measured hardness values were ${\sim}8.7$ GPa for the binder phase and ${\sim}28.7$ GPa for the hard phase, which was close to the hardness of hot-pressed Ti($C_{0.7}N_{0.3}$).

• 한국소성가공학회:학술대회논문집
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• 한국소성가공학회 2005년도 추계학술대회 논문집
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• pp.178-181
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• 2005

Quaternary Ti-Si-C-N coatings were deposited on WC-Co substrates by a hybrid coating system of arc ion plating (AIP) and sputtering techniques using Ti and Si targets, in an $Ar/N_2/CH_4$ gaseous mixture. The crystallinity, bending status, and microstructure of the Ti-Si-C-N coatings were measured by X-ray diffractometer (XRD) and X-ray photoelectron spectroscope (XPS), The micro-hardness of Ti(C,N) and Ti-Si-N coatings were about 30 and 40 GPa, respectively. As the Si was incorporated into Ti(C,N) coatings, the Ti-Si-C-N coatings having Si content of $8.9\;at.\%$ showed the maximum hardness value of about 55 GPa. In this work, the microstructure and mechanical properties of Ti-Si-C-N coatings were systematically investigated.

• The Korean Journal of Ceramics
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• 제3권2호
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• pp.124-128
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• 1997

An attempt was made to understand the dissolution and reprecipitation behavior of the constituent phases such as TiC, TiN, and Ti(CN) in TiC-TiN-Ni system. During the liquid-phase sintering the TiC phase was found to dissolve preferentially in Ni binder. The solid-solution phase, Ti(CN), formed around the TiN phase, resulting in a core/rim structure. This result was reproduced when large TiC particles were used with fine TiN particles. The path for the microstructural change in TiC-TiN-Ni system was largely controlled by the difference in the interfacial energy of each phase with the liquid binder phase. The results were discussed with thermodynamic principles.