• Bulletin of the Korean Chemical Society
• /
• v.32 no.11
• /
• pp.3991-3995
• /
• 2011

$TiO_2-SiO_2-In_2O_3$ nanocomposite thin film was deposited on the glass substrates using a dip coating technique. The morphology, surface composition, surface hydroxyl groups, photocatalytic activity and hydrophilic properties of the thin film were investigated by AFM, XPS, methyl orange decoloring rate and water contact angle measurements. The hydroxyl content for $TiO_2$, $TiO_2-SiO_2$ and $TiO_2-SiO_2-In_2O_3$ nanocomposite films was calculated to be 11.6, 17.1 and 20.7%, respectively. $TiO_2-SiO_2-In_2O_3$ film turned superhydrophilic after 180-min irradiation with respect to pure $TiO_2$ and $TiO_2-SiO_2$ thin films. The photocatalytic decomposition of methyl orange for $TiO_2$, $TiO_2-SiO_2$ and $TiO_2-SiO_2-In_2O_3$ thin films was measured as 38.19, 58.71 and 68.02%, respectively. The results indicated that $SiO_2$ and $In_2O_3$ had a significant effect on the hydrophilic, photocatalytic and self-cleaning properties of $TiO_2$ thin film.

• Journal of the Korean Ceramic Society
• /
• v.31 no.3
• /
• pp.265-274
• /
• 1994

Intermetallic Ti-Si system ceramics were synthesized from stochiometric mixtures of titanium and silicone powders in vacuum by Self-propagating High-temperature Synthesis(SHS). In each cases of Ti5Si3, Ti5Si4 and TiSi, and TiSi2 synthesis, 20wt% product dilution, direct ignition and SHS chemical furnace method were employed. The combustion modes, which were observed during the synthesis process by using the high speed camera, of Ti5Si3, Ti5Si4, TiSi, and TiSi2 exhibit spin, osciallatory, steady-state, and spin combustion, respectively. With increasing Ti/Si molar ratio an decrease of combustion velocities was found. From the results on the measurement of the flexural strength, the specimen hot pressed at 135$0^{\circ}C$ for 30 min using synthesized Ti5Si4 powders showed the highest flexural strength at 215 MPa.

• Proceedings of the Korean Vacuum Society Conference
• /
• 2013.02a
• /
• pp.310-310
• /
• 2013

본 연구에서는 Titanium (Ti) source/drain 전극 접합이 차세대 비정질 InGaZnO (IGZO) 기반 박막형 트랜지스터에 미치는 영향을 화학적, 구조적, 전기적 특성 분석을 통하여 관찰하고 Ti/IGZO 접합 특성을 설명할 수 있는 메커니즘을 제시하였다. IGZO 기반 박막형 트랜지스터 소자의 구동 특성은 transmission line method (TLM) 패턴 공정을 이용하여 정량적으로 분석되었다. 비정질 IGZO 기반의 박막형 트랜지스터에서 Ti source/drain 전극 접합에 의한 구동 특성 변화 및 영향을 확인하기 위하여 금속/산화물 계면 반응성이 낮은 silver (Ag) source/drain 전극이 reference로 비교되었으며, 그 결과 Ti source/drain 전극 접합이 적용된 비정질 IGZO 트랜지스터의 경우 Ti 금속과 IGZO 산화물 계면에 형성되는 열역학적으로 안정한 $TiO_x$ 층의 형성에 의해 VT ($-{\Delta}0.52V$) shift 및 saturation mobility ($8.48cm^2$/Vs) 상승됨을 확인하였다. 뿐만 아니라 TLM 패턴을 이용한 IGZO 트랜지스터의 전기적 변수 도출 및 수치적 해석으로부터 $TiO_x$ 계면층 형성이 Ti 금속과 비정질 InGaZnO 계면에서의 effective contact resistivity를 효과적으로 낮출 수 있음을 확인하였다. Ti source/drain 전극 접합에 의해 발생되는 $TiO_x$ 계면층의 화학적, 구조적 특성과 $TiO_x$ 계면층 생성에 의한 소자 특성 변화를 연관시켜 해석함으로써, IGZO 기반 박막형 트랜지스터에서의 Ti source/drain 전극 접합이 비정질 IGZO 기반 박막형 트랜지스터에 미치는 영향을 설명하였다.

• The Transactions of the Korean Institute of Electrical Engineers C
• /
• v.50 no.8
• /
• pp.376-381
• /
• 2001

The(1-x) MgTiO$_3$-xSrTiO$_3$(x=0.03~0.04) ceramics were fabricated by the conventional mixed oxide method. The structural and microwave dielectric properties were investigated by XRD, SEM, EDS and network analyzer. The sintering temperature and time were 1275$^{\circ}C$~135$0^{\circ}C$ and 2hours, respectively. In the XRD results of 0.96MgTiO$_3$-0.04SrTiO$_3$ceramics, the perovskite structure of SrTiO$_3$and ilmenite structure of MgTiO$_3$phase were coexisted. The dielectric constant($\varepsilon$(sub)${\gamma}$) and temperature coefficient of resonant frequency($\tau$(sub)f) were increased with addition of SrTiO$_3$. In thie case of 0.96MgTiO$_3$-0.04SrTiO$_3$ ceramics sintered at 13$25^{\circ}C$, the dielectric constant, quality factor(Q) and temperature coefficient of resonant frequency($\tau$(sub)f) were 20.13, 7956(at 7.27GHz), and +1.76ppm/$^{\circ}C$, respectively.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
• /
• 1997.04a
• /
• pp.8-11
• /
• 1997

This study makes SrTiO$_{3}$ with nonpolarity among ferroelectrics by RF sputtering as dielectric layer, produces thin film of Si/SrTiO$_{3}$ and Si/Ti/SrTiO$_{3}$ of MOS structure using Ti as buffer layer, measures and examines the electrical features with optical refractive index, absorption rate, permittivity, photon energy and as a result, ferroelectrics oscillation occurrs by the interaction within a film by light temperature and the absorption of thin film with Ti as buffer layer is increased. It is found that the pea\ulcorner of permittivity value of Ti/SrTiO$_{3}$ thin film has low values and is appeared late and as dipole which is found in dielectric is shown, the experiment satisfies the theory In the nature of permittivity by photon energy, imaginary value is higher and current variation slope of thin film of thickness SrTiO$_{3}$ has lower values in reverse bias.

• Transactions on Electrical and Electronic Materials
• /
• v.6 no.5
• /
• pp.210-213
• /
• 2005

The $BaTiO_3/SrTiO_3$ heterolayered thick films were fabricated by the screen printing method on alumina substrates. The effect of the sintering temperature on the microstructure and dielectric properties of the $BaTiO_3/SrTiO_3$ thick films has been investigated. The relative dielectric constant and dielectric loss at 1 MHz of the $BaTiO_3/SrTiO_3$ heterolayered thick films with sintering temperature of $1350^{\circ}C$ were about 751 and 1.74, respectively. The remanent polarization $(P_r)$ of the pure $(Ba_{0.5}Sr_{0.5})TiO_3$ and $BaTiO_3/SrTiO_3$ heterolayered films are approximately $5.1\;{\mu}C/cm^2$ and $10\;{\mu}C/cm^2$. This study suggests that the design of the $BaTiO_3/SrTiO_3$ heterolayered thick films capacitor with different phase should be an effective method to enhance the dielectric and ferroelectric performance in devices.

• Journal of the Korean Ceramic Society
• /
• v.55 no.2
• /
• pp.140-144
• /
• 2018

$ZnO/TiO_2$ nanocomposites were synthesized via a modified sol-gel technique by incorporating 30 and 70 wt% $TiO_2$ nanopowder into a ZnO sol-gel matrix. Zinc acetate dihydrate was used as the ZnO precursor and de-ionized water as the solvent, while titanium oxysulfate was employed for the synthesis of $TiO_2$ nanopowder. The synthesized $ZnO/TiO_2$ nanocomposites were characterized by x-ray diffraction, UV-vis spectroscopy, scanning electron microscopy, and transmission electron microscopy. The $ZnO/TiO_2$ nanocomposites showed both the ZnO (wurtzite) and $TiO_2$ (anatase) phases. The average ZnO crystallite size of the $ZnO/TiO_2$ nanocomposites was found to be about 26.3 nm. The TEM results confirmed that spherical $TiO_2$ particles were embedded in the ZnO matrix. $TiO_2$ particles attached onto the rod-like ZnO particles were also observed. The $ZnO/TiO_2$ nanocomposites exhibited optical absorption properties superior to those of pure ZnO and $TiO_2$.

• The Korean Journal of Ceramics
• /
• v.5 no.1
• /
• pp.44-49
• /
• 1999

In order to improve the oxidation resistance of $Ti_3Al$, Ti-25at.%Al composites containing dispersed particles of 15wt.%SiC were prepared by a tubular mixing-spark plasma sintering method. The sintered composites had $Ti_3Al$, SiC, $Ti_5Si_3$ and TiC. The presence of $Ti_5Si_3$ and TiC indicates that some of SiC particles reacted with Ti to from more stable phases. From oxidation tests at 800, 900 and $1000^{\circ}C$ under 1 atm of pure oxygen, it was found that the oxidation rate of Ti3Al was effectively reduced by the addition of SiC. The scale was primarily composed of an outer $TiO_2$ layer having some $Al_2O_3 $islands, an intermediate relatively thick $Al_2O_3 $ layer, and an inner $TiO_2+Al_2O_3+SiO_2$ mixed layer. Beneath the scale, Kirkendall voids were seen.

• Journal of the Korean Ceramic Society
• /
• v.45 no.10
• /
• pp.638-643
• /
• 2008

Biomimetic apatite formation and deposition behaviors of Ti-6Al-7Nb and Ti-6Al-4V plates in simulated body fluids(SBF) under various conditions were examined. In case of regular samples without collagen treatments the weight gain due to apatite precipitation on the surface in Ti-6Al-4V was found to be higher than in Ti-6Al-7Nb. In case of collagen-coated samples, the weight gain in Ti-6Al-4V continued to be higher than in Ti-6Al-7Nb, but the difference between the two became smaller. Both Ti-6Al-7Nb and Ti-6Al-4V samples with collagen coating exhibited an appreciable increase of weight gain, which may be caused by the interaction between collagen and $Ca^{+2}$ ions. The weight gain was found to be not much affected by the addition of collagen to SBF. The ill-defined granular structure in the presence of collagen can be associated with the increasing volume fraction of amorphous calcium phosphate.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
• /
• v.25 no.9
• /
• pp.681-685
• /
• 2012

We investigated the dry etching characteristics of TiN in $TiN/Al_2O_3$ gate stack using a inductively coupled plasma system. TiN thin film is etched by BCl3/He plasma. The etching parameters are the gas mixing ratio, the RF power, the DC-bias voltages and process pressures. The highest etch rate is in $BCl_3/He$ (25%:75%) plasma. The selectivity of TiN thin film to $Al_2O_3$ is pretty similar with $BCl_3/He$ plasma. The chemical reactions of the etched TiN thin films are investigated by X-ray photoelectron spectroscopy. The intensities of the Ti 2p and the N 1s peaks are modified by $BCl_3$ plasma. Intensity and binding energy of Ti and N could be changed due to a chemical reaction on the surface of TiN thin films. Also we investigated that the non-volatile byproducts such as $TiCl_x$ formed by chemical reaction with Cl radicals on the surface of TiN thin films.