• Proceedings of the Korean Vacuum Society Conference
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• 2012.02a
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• pp.334-334
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• 2012

Transparent oxide semiconductors have recently attracted much attention as channel layer materials due to advantageous electrical and optical characteristics such as high mobility, high stability, and good transparency. In addition, transparent oxide semiconductor can be fabricated at low temperature with a low production cost and it permits highly uniform devices such as large area displays. A variety of thin film transistors (TFTs) have been studied including ZnO, InZnO, and InGaZnO as the channel layer. Recently, there are many studies for substitution of Ga in InGaZnO TFTs due to their problem, such as stability of devices. In this work, new quaternary compound materials, tantalum-indium-tin oxide (TaInSnO) thin films were fabricated by using co-sputtering and used for the active channel layer in thin film transistors (TFTs). We deposited TaInSnO films in a mixed gas (O2+Ar) atmosphere by co-sputtering from Ta and ITO targets, respectively. The electric characteristics of TaInSnO TFTs and thin films were investigated according to the RF power applied to the $Ta_2O_5$ target. The addition of Ta elements could suppress the formation of oxygen vacancies because of the stronger oxidation tendency of Ta relative to that of In or Sn. Therefore the free carrier density decreased with increasing RF power of $Ta_2O_5$ in TaInSnO thin film. The optimized characteristics of TaInSnO TFT showed an on/off current ratio of $1.4{\times}108$, a threshold voltage of 2.91 V, a field-effect mobility of 2.37 cm2/Vs, and a subthreshold swing of 0.48 V/dec.

• Journal of the Korean Vacuum Society
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• v.6 no.1
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• pp.77-84
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• 1997

Super precision resistor was manufactured by controlling properly the thickness of $TaN_{0.1}$ (negative TCR) and Cr(positive TCR) deposited on cylindrical alumina substrate (diameter: 4 mm, length: 11 mm). Multilayer thin film resistor of $Ta_2O_5/TaN_{0.1}$/Cr/Alumina (substrate) was manufactured by depositing of $Ta_2N_5$ film on $TaN_{0.1}$ film to increase Rs to the level of 1;k{\Omega}/{\box}$ and to passivate the film. Super precision resistor with TCR of $20\pm5 ppm/^{\circ}C$ and Rs of $1\;k{\Omega}/{\box}$ was manufactured by depositing thin layers of about 10 nm $Ta_2O_5$, 100 nm $TaN_{0.1}$ and 50 nm Cr film under the properly controlled sputtering condition.

• Journal of the Korean institute of surface engineering
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• v.30 no.4
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• pp.231-238
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• 1997

Tantalum oxide thin filme has an amorphous structure and a high resistivity. Its stoichiometric structure was $Ta_2O_{5.3}$ and the transmission ratio was 80%. The high resistivity of $Ta_2O_{5.3}$ thin film electrolyte made an EC windows without electrical shottness, but the bleached/colored cur rent was very low because of the low ion conductivith. Upon adding moisture into the system, the $\Delta$T increased upto 25 %. proton concentration increase was the main cases to improve optical property. The influence of adding precious or transition metal film(~100 $\AA$ thickness) in $Ta_2O_5$layer on the color change performance was observed. The metal insertion layers had formed hydroxide and they behaved as a stable proton source. The transmission diffrnece and cycle life were greatly enhanced in the case of Ti inssertion.The $\Delta$T was 50% and the cycle life was 18, 000.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.26 no.12
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• pp.882-887
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• 2013

We investigated a SiC-based hydrogen gas sensor with metal-insulator-semiconductor (MIS) structure for high temperature process monitoring and leak detection applications. The sensor was fabricated by Pd/$Ta_2O_5$/SiC structure, and a thin tantalum oxide ($Ta_2O_5$) layer was exploited with the purpose of sensitivity improvement, because tantalum oxide has good stability at high temperature as well as high permeability for hydrogen gas. In the experiment, dependence of I-V characteristics and capacitance response properties on hydrogen gas concentrations from 0 to 2,000 ppm was analyzed at room temperature to $500^{\circ}C$. As the result, our sensor exploiting a $Ta_2O_5$ dielectric layer showed possibilities with regard to use in hydrogen gas sensors for high-temperature applications.

• Journal of the Korean Ceramic Society
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• v.31 no.11
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• pp.1299-1306
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• 1994

Effect of MgO content on microstructural evolution and microwave dielectric properties of Ba(Mg1/3Ta2/3)O3 system was investigated. MgO content was varied from 10 mol% deficiency to 10 mol% excess of stoichiometric composition, respectively. It was found that MgO-deficient specimen showed faster grain growth rate than stoichometric and MgO excess BMT system. Besides, sandwich type precipitates of Ba5Ta4O15 which was formed within the BMT grain, might lead to the anisotropic grain growth of BMT grain. On the contrary, in MgO excess specimen, BMT grain growth rate was retarded by precipitations of MgO phase in grain boundary. Besides, the Q values of MgO-deficient showed lower than MgO-excess due to precipitations of Ba5Ta4O15 within BMT grain.

• Korean Journal of Materials Research
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• v.8 no.10
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• pp.945-949
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• 1998

Ta(OC2H5)5와 NH3를 이용하여 Cycle-CVD법으로 산화탄탈륨 막을 증착하였다. Cycle-CVD법에서는 Ta(OC2H5)5와 NH3사이에 불활성 기체를 주입한다. 하나의 cycle은 Ta(OC2H5)5주입, Ar주입, NH3 주입, Ar 주입의 네 단계로 이루어진다. Cycle-CVD법으로 산화탄탈륨 막을 증착할 때, 온도 $250-280^{\circ}C$에서 박막의 증착 기구는 원자층 증착(Atomic Layer Deposition:ALD)이었다. $265^{\circ}C$에서 Ta(OC2H5)5:Ar:NH3:Ar:NH3:Ar의 한 cycle에서 각 단계의 주입 시간을 1-60초:5초:5초:5초로 Ta(OC2H5)5 주입 시간을 변화시키면서 산화탄탈륨 막을 Cycle-CVD법으로 증착하였다. Ta(OC2H5)5주입시간이 증가하여도 cycle 당 두께가 $1.5\AA$/cycle로 일정하였다. $265^{\circ}C$에서 증착된 박막의 누설 전류는 2MV/cm에서 2x10-2A/$\textrm{cm}^2$이었고 열처리후의 산화탄탈륨 막의 누설 전류값은 $10-4A\textrm{cm}^2$ 이하고 감소하였다. 증착한 산화탄탈륨 막의 성분을 Auger 전자 분광법으로 분석하였다. 2$65^{\circ}C$에서 증착한 막의 성분은 탄탈륨 33at%, 산소 50at%, 탄소 5at%, 질소 12at% 이었으며 90$0^{\circ}C$, O2300torr에서 10분 동안 열처리한 박막은 탄탈륨 33at%, 산소 60wt%, 탄소 4at%, 질소 3at%이었다. 박막의 열처리 온도가 높을수록 불순물인 탄소와 질소의 박막 내 잔류량이 감소하였다. 열처리 후의 박막은 O/Ta 화학정량비가 증가하였으며 Ta의 4f7/5와 4f 5/2의 결합 강도가 열처리 전 박막보다 증가하였다. 열처리 후 누설 전류가 감소하는 것은 불순물 감소와 화학정량비 개선 및 Ta-O 결합 강도의증가에 의한 것으로 생각된다.

• Journal of the Korean Ceramic Society
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• v.29 no.8
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• pp.630-638
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• 1992

Ta2O5 alloying into 3 mol% Y2O3-stabilized tetragonal ZrO2 polycrystals (3Y-TZP) increased the degradation during aging at 265℃ and the fracture toughness; both are determined by the amount of transformed m-ZrO2. It was proposed that the mechanism underlying the t→m transformation when aged at low temperatures is attributed to the reorientation of (Zzr'V ). complexes parallel to [111] lattice direction, which is accompanied by a relaxation of TZP lattice during annealing at low temperature. A small strain which results from the reorientation gives rise to a localized mechanical instability, thus lowering the nucleation barrier so that the t→m phase transformation (degradation) proceeds. The amount of transformed m-ZrO2 during aging becomes greater as the chemical free energy change related to the transformation, ΔGo, increases with increasing the Ta2O5 alloying content.

• Proceedings of the Korean Vacuum Society Conference
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• 2013.08a
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• pp.166-166
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• 2013

최근에 희토류 이온이 도핑된 형광체를 발광 소자, 레이저, 섬광재료, 광섬유, 촉매, 디스플레이와 같은 다양한 분야에 응용하기 위한 연구에 상당한 관심이 집중되고 있으며, 희토류 이온이 도핑된 발광 물질은 음극선관, 램프 조명, 플라즈마 디스플레이, X선 검출기, 전계 방출 디스플레이 소자를 포함한 다양한 영역에 응용되고 있다. 본 연구에서는 고상 반응법을 사용하여 발광 효율이 높은 적색과 주황색 형광체를 제조하고자 서로 다른 활성체 이온 Eu3+, Sm3+의 농도를 변화 시키면서 두 종류 Ca1-1.5xTa2O6:Eux3+와 Ca1-1.5xTa2 O6:Smx3+ 형광체 분말을 합성하였다. 특히, 활성제 이온의 농도비에 따른 형광체 분말의 결정 구조, 표면 형상, 입자의 크기, 흡광과 발광 특성을 측정하였다. 그림은 활성체 이온의 함량비를 달리하여 합성한 Ca1-1.5xTa2O6:Eux3+, Ca1-1.5xTa2O6:Smx3+ 형광체 분말에서 측정한 흡광(photoluminescence excition) 스펙트럼의 결과를 나타낸 것이다. 여기 파장 399 nm로 여기 시킨 Ca1-1.5xTa2O6:Eux3+ 형광체 분말의 경우에, 발광 세기가 가장 강한 617 nm의 주 피크가 관측되었다. 또한, 여기 파장 410 nm로 여기 시킨 Ca1-1.5xTa2O6:Smx3+ 형광체 분말의 경우에는 발광 세기가 가장 강한 주 피크는 609 nm에서 나타났다. 실험 결과로부터, Eu3+와 Sm3+ 이온이 각각 도핑된 CaTa2O6 형광체의 경우에는 색 순도가 높은 파장과 발광 세기는 Eu3+ 이온인 경우에 0.15 mol, Sm3+ 이온이 도핑되는 경우에는 0.05 mol이 최적의 합성 조건임을 알 수 있었다.

• Korean Journal of Optics and Photonics
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• v.11 no.3
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• pp.147-151
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• 2000

We deposited the ion assisted ${Ta_2}{O_5}$ films and conventional thermal evaporated ${Ta_2}{O_5}$ films by using electron beam gun, and measured the optical properties and mechanical properties of the fabricated films according to the evaporation conditions. In the case of the TazOs films by oxygen ion assisted deposition with the anode voltage of 120 V, and current density of $50~500\muA/cm^2$, the refractive index exhibited 2.15 which was higher than the conventionally deposited film index 1.94 and the tensile stress exhibited $5.0\times10^8 dyne/cm^2$ which was lower than $7.0\times10^8 dyne/cm^2$. This properties coincided with the optical and mechanical properties of the films deposited at the elevated substrate temperature of $230^{\circ}C$. In the case of the argon ion assisted films the tensile stress was decreased but the absorption existed at the short wavelength in the visible spectral region. And all the fabricated films were found to be amorphous by the X-ray diffraction analysis. lysis.

• Analytical Science and Technology
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• v.5 no.1
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• pp.115-120
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• 1992

The upper limit of solid solution of $Al_2O_3$ in $LiTaO_3$ was investigated using X-ray diffraction and Raman spectroscopy. By substituting cations in $LiTaO_3$ with $Al^{3+}$, the melting temperature was lowed and the ferroelectric properties can be improved. It is easier at lower temperature to fabricate the single crystal used for SAW filters and IR sensors. From the measured lattice constants and Raman band broadening, the solubility limit was X=0.25mol in $Li_{1-X}Al_{2X}Ta{1-X}O_3$, above which $Al_2O_3$ was obsered as a second phase. The Raman band of sintered $LiTaO_3$ was compared with that of the single crystal to see the effect of grain size on the band broadening.