• 제목/요약/키워드: $SrTiO_3$films

검색결과 475건 처리시간 0.036초

Ar 이온 밀링으로 손상된 단결정 SrTiO$_3$ 기판의 산소 열처리 효과 (Oxygen Annealing Effect of SrTiO$_3$ Single Crystal Substrate Damaged by Ar$^+$ Ion Milling)

  • 최희석;황윤석;김진태;이동훈;이순걸;박용기;박종철
    • 한국초전도학회:학술대회논문집
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    • 한국초전도학회 1999년도 High Temperature Superconductivity Vol.IX
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    • pp.87-90
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    • 1999
  • We have studied the annealing effects of 570 (SrTiO$_3$) single crystal substrate and the I-V properties of step-edge junctions after Ar ion milling. YBa$_2Cu_3O_7$ (YBCO) thin films are fabricated on the substrates by using pulsed laser deposition (PLD) and photolithography. The surface of Ar ion milled substrate was characterized with atomic force microscope (AFM) and scanning electron microscope (SEM) images. After the substrate was damaged by milling, the critical current density of YBCO thin films deposited on the substrate was lowered. The annealing of the damaged substrate at about 1000 $^{\circ}C$ recovered the critical current density to that before the milling. Futhermore the annealing helped junction formation due to high quality film and increased the yield rate for the fabrication of high quality step-edge junction.

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Structural and Dielectric Properties of Pb[(Zr,Sn)Ti]NbO3 Thin Films Deposited by Radio Frequency Magnetron Sputtering

  • Choi, Woo-Chang
    • Transactions on Electrical and Electronic Materials
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    • 제11권4호
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    • pp.182-185
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    • 2010
  • $Pb_{0.99}[(Zr_{0.6}Sn_{0.4})_{0.9}Ti_{0.1}]_{0.98}Nb_{0.02}O_3$ (PNZST) thin films were deposited by radio frequency magnetron sputtering on a $(La_{0.5}Sr_{0.5})CoO_3$ (LSCO)/Pt/Ti/$SiO_2$/Si substrate using a PNZST target with an excess PbO of 10 mole%. The thin films deposited at the substrate temperature of $500^{\circ}C$ crystallized to a perovskite phase after rapid thermal annealing (RTA). The thin films, which annealed at $650^{\circ}C$ for 10 seconds in air, exhibited good crystal structures and ferroelectric properties. The remanent polarization and coercive field of the fabricated PNZST capacitor were approximately $20uC/cm^2$ and 50 kV/cm, respectively. The reduction of the polarization after $2.2\;{\times}\;10^9$ switching cycles was less than 10%.

솔-젤 법을 이용한 Pb(Zr, Ti)$O_3$ 박막의 성장 및 전기적 특성에 관한 연구 (Growth and electrical properties of Pb(Zr, Ti)$O_3$ thin films by sol-gel method)

  • 김봉주;전성진;이재찬;유지범
    • 한국진공학회지
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    • 제8권4A호
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    • pp.425-431
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    • 1999
  • $Pb(Zr_{0.52}, Ti_{0.48})O_3$ (PZT) thick films as an actuating material with conducting oxides, $(La_{0.5}Sr_{0.5}) CoO_3$ (LSCO), have been fabricated by sol-gel method for Optical Micro-Electro-Mechanical System (MEMS) devices, in which PZT/LSCO/SiO2 structures were used. In order to improve the adhesion to LSCO solution in order to enhance the wetting behavior of a water-based LSCO precursor solution and further to improve the adhesion between LSCO and $SiO_2$ layers. PZT films were made using 1-3 propanediol based precursor solution which has a high viscosity and a boiling point appropriate for thick film fabrication. In the precursor solution, Ti-propoxied and Zr-propoxied are partially substituted with acetylacetone to achieve the solution stability while maintaining reactivity. Crack free PZT films (0.8~1$\mu\textrm{m}$) have been successfully fabricated at crystallization temperatures above $700^{\circ}C$. Dielectric constants and dielectric losses of the PZT films were 900~1200and 2~5%, respectively. Piezoelectric constant $d_{33}$ of the PZT films constrained by a substrate were 200pm/V at 100kV/cm.

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RF 스퍼터링법에 의한 $Sr_{0.7}Bi_{2.3}Nb_2O_9$ 박막의 특성 (Properties of $Sr_{0.7}Bi_{2.3}Nb_2O_9$ Thin film by RF Sputtering Method)

  • 김진사;최영일;김형곤;오용철;김기준;김상진
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2009년도 하계학술대회 논문집
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    • pp.186-187
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    • 2009
  • The $Sr_{0.7}Bi_{2.3}Nb_2O_9$(SBN) thin films are deposited on Pt-coated electrode(Pt/Ti/$SiO_2$/Si) using RF sputtering method at various deposition conditions. Thickness of SBN thin films was about 250[nm] in 70/30 of $Ar/O_2$ ratio. The thickness and deposition rate of SBN thin films were increased with increase of RF power. The capacitance of SBN thin films were increased with the increase of deposition temperature.

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씨앗층과 급속 열처리가 화학 기상 증착법에 의한(Ba, Sr)TiO3 박막의 특성에 미치는 영향 (Effects of Seed Layer and Rapid Thermal Annealing on the Properties of (Ba, Sr)TiO3 Films Prepared by Chemical vapor deposition)

  • 최영철
    • 마이크로전자및패키징학회지
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    • 제4권2호
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    • pp.47-54
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    • 1997
  • Pt/SiO2/Si을 기판으로 사용하고 RF 마그네트론 스퍼터링에 의한 (Ba, Sr)TiO3 (BST) 씨앗층을 약 10nm 정도의 두께로 입힌 다음 그 상부에 화학 기상증착법으로 BST를 증착하여 BST seed layer가 CVD BST 박막의 특성에 미치는 영향을 조사하였다. 또한 급 속열처리가 BST 박막과 커패시터의 특성에 미치는 영향도 조사하였다. Seed layer와 급속 열처리에 의해 박막의 결정성이 향상되었으며 이로인해 유전상수가 증가되었고 주파수에 대 한 유전특성도 개선되었다. Seed layer를 도입함으로써 BST 박막과 Pt 하부전극 사이의 계 면에 존재하고 있는 산소부족\ulcorner이 사라짐을 확인할수 있었으며 이로 인해 Pt/BST/Pt 커\ulcorner 시터의 누설전류가 감소하였다. 또한 급속 열처리에 의해 BST/Pt 계면에서 트랩된 전자의 농도가 감소함으로써 누설전류 특성이 개선됨을 알수 있었다. Seed layer 위에 증착된 CVD BST 박막의 유전상수는 증착온도가 증가함에 따라 증가하였으나 누설전류도 같이 증가하 였다.

사파이어 기판위에 올린 BST박막의 후 열처리 효과 (Covering Effects of post-deposition annealing for BST thin films on $Al_2O_3$)

  • 이동우;고중혁;노지형;문병무
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2007년도 추계학술대회 논문집
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    • pp.266-267
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    • 2007
  • $Ba_{0.5}Sr_{0.5}TiO_3$(BST) films with different deposition temperatures were deposited on $Al_2O_3$ substrate by Nd:YAG Pulsed Laser Deposition(PLD). The deposition conditions to achieve high crystal structures and dielectric properties were optimized for both techniques. The structural characterization on the BST thin films was performed by X-Ray Diffraction(XRD) and Atomic Force Microscopy (AFM). Effects of post-deposition annealing of BST films were investigated. The best dielectric properties were obtained on $800^{\circ}C$ deposited BST film with post-deposition annealing at $1100^{\circ}C$ in flowing $O_2$ atmosphere for 2hours.

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기판 조건에 따른 SBT 강유전체 커패시터의 특성 (Capacitor characteristics of SBT Ferroelectric Thin Films depending on substrate conditions)

  • 박상준;장건익
    • 한국전기전자재료학회논문지
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    • 제13권2호
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    • pp.143-150
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    • 2000
  • Ferroelectric SrxBi2+yTa2O9+$\alpha$ thin films with various compositions(x=0.7, 0.8, 1, y=0.3, 0.4) were prepared by sol-gel method. The film with moled ratio of 0.8:2.3:2.0 in Sr/Bi/Ta, which was deposited on Pt/SiO2/Si (100), showed better ferroelectric properties than other films. To investigate substrate effects, the same compositions were spin coated on Pt/Ti/SiO2/Si (100) substrates. At an applied voltage of 5V, the dielectric constant($\varepsilon$r), remanent polarization (2Pr) and coercive field (Ec) of the Sr0.8Bi2.3Ta2O9+$\alpha$ thin film prepared on Pt/Ti/SiO2/Si (100) were about 296, 24$\mu$C/$\textrm{cm}^2$ and Ec of 49kV/cm respectively. Both SBT films firred at 80$0^{\circ}C$ revealed no fatigue up to 1010 cycles. Retention characteristics of these capacitors showed no degradation up to 104 sec.

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Effect of oxygen pressure on properties of $NdBa_2Cu_3O_{7-{\delta}}$ films on $SrTiO_3$ (100) substrates grown by pulsed laser deposition

  • Wee, Sung-Hun;Moon, Seung-Hyun;Park, Chan;Yoo, Sang-Im
    • 한국초전도ㆍ저온공학회논문지
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    • 제6권4호
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    • pp.9-12
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    • 2004
  • We report a successful fabrication of high-$J_C$ $NdBa_2Cu_3O_{7-{\delta}}$ (NdBCO) films on (100) $SrTiO_3$ substrates by pulsed laser deposition (PLD) in high oxygen pressures ranging from 400 to 800 mTorr. Fabricated NdBCO films exhibited only c-axis orientation, good out-of-plane and in-plane textures, and also excellent superconducting properties, including critical temperature ($T_C$) and critical current density ($J_C$) of above 90 K and the highest of $3.1MA/cm^2$ at 77 K in self-field, implying that NdBCO is a perspective alternative to YBCO for coated conductor. In low oxygen pressures ranging from 100 to 200 mTorr, however, the films showed a-, c-mixed orientation and degraded $T_{C,zero}$ values due to the formation of $Nd_{1+x}Ba_{2-x}Cu_3O_{7-{\delta}}$-type solid solutions with an excessive substitution of $Nd^{3+}$ ions for the $Ba^{2+}$ sites.