• Title/Summary/Keyword: $O_2$ partial pressure

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Nonstoichiometry of the Cerium Dioxide (이산화세륨의 비화학량론)

  • Chul Hyun Yo;Jeong Geun Kim;Kwang Sun Ryu;Eun Seok Lee;Joong Gill Choi
    • Journal of the Korean Chemical Society
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    • v.37 no.4
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    • pp.390-395
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    • 1993
  • The x values and electrical conductivities of the nonstoichiometric compounds$ CeO_{2-x} have been measured in a temperature range from 600 to 1200$^{\circ}C$ under oxygen partial pressure of $2{\times}10^{-1}{\sim}1{\times}10^{-4}$ atm. The enthalpy of the defect formation shows an endothermic process with the oxygen partial pressure dependence (1/n value) of -1/3.18 ∼ -1/3.69. The activation energy and 1/n value for the electrical conductivity are estimated as 1.75 eV and -1/4, respectively. According to the x values, the $\sigma$ values, and the thermodynamic data, the defect structure of the ceria seems to be the formation of singly charged negative oxygen vacancies. The n-type semiconducting behaviors could be explained by the presence of excess metals in the lattice as the conduction electron donor.

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Fabrication of a Zirconia Oxygen Sensor Added with $Al_{2}O_{3}$ and Its Characteristics ($Al_{2}O_{3}$가 첨가된 지르코니아 산소센서의 제조 및 그 특성)

  • Sohn, Jeong-Duk;Choi, Sie-Young
    • Journal of Sensor Science and Technology
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    • v.1 no.1
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    • pp.93-100
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    • 1992
  • Sinterability, mechanical and electrical properties of yttria-stabilized zirconia(92 mole% $ZrO_{2}$+8 mole% $Y_{2}O_{3}$) doped with 0.5 mole% $SiO_{2}$ and $0{\sim}2.0 mole%{\;}Al_{2}O_{3}$ were studied as a function of $Al_{2}O_{3}$ addition. Sintered density increased with increasing $Al_{2}O_{3}$ addition up to 0.5 mole % but leveled off with further addition. Victors hardness is proportional to sintered density. The specimen with 0.5 mole% $Al_{2}O_{3}$ and 0.5 mole% $SiO_{2}$ exhibited the maximum electrical conductivity and revealed a maximum electromotive force for a given oxygen partial pressure. Experimental voltage curve of this oxygen sensor take on a sharper, more steplike transition at the stoichiometric A/F ratio than those of other commercial oxygen sensors.

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The characteristics of Al-doped ZnO films deposited with RF magnetron sputtering system in various H2/(Ar+H2) gas ratios

  • Kim, Jwayeon;Han, Jungsu;Park, Kyeongsoon
    • Journal of Ceramic Processing Research
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    • v.13 no.spc2
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    • pp.407-410
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    • 2012
  • The properties of Al-doped ZnO (AZO) films were investigated as a function of H2/(Ar + H2) gas ratio using an AZO (2 wt% Al2O3) ceramic target in a radio frequency (RF) magnetron sputtering system. The deposition process was done at 200 ℃ and in 2 × 10-2Torr working pressure and with various ratios of H2/(Ar + H2) gas. During the AZO film deposition process, partial H2 gas affected the AZO film characteristics. The electron resistivity (~ 9.21 × 10-4 Ωcm) was lowest and mobility (~17.8 ㎠/Vs) was highest in AZO films when the H2/(Ar + H2) gas ratio was 2.5%. When the H2/(Ar + H2) gas ratio was increased above 2.5%, the electron resistivity increased and mobility decreased with increasing H2/(Ar + H2) gas ratio in AZO films. The carrier concentration increased with increasing H2/(Ar + H2) gas ratio from 0% to 7.5%. This phenomenon was explained by reaction of hydrogen and oxygen and additional formation of oxygen vacancy. The average optical transmission in the visible light wavelength region over 90% and an orientation of the deposition was [002] orientation for AZO films grown with all H2/(Ar + H2) gas ratios.

The characteristics of $(Ba_{0.5}Sr_{0.5})TiO_3$ thin films deposited on $RuO_2$ bottom electrodes ($RuO_2$하부전극상에 증착된 $(Ba_{0.5}Sr_{0.5})TiO_3$박막의 특성)

  • 백수현;박치선;마재평
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.8 no.3
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    • pp.407-410
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    • 1998
  • The characteristics of $(Ba,Sr)TiO_3$[BST] thin films with the variation of $O_2/Ar$ ratio in sputtering gas deposited on $RuO_2$ bottom electrode were investigated. Dielectric constant of BST film increases from 135 to 190 with increasing oxygen partial pressure from 10 to 50, which is mainly due to the improved crystallinity of BST film. The instability of $RuO_2$ surface in $BST/RuO_2$ interface and the increase in the surface roughness of BST thin films with higher $O_2/Ar$ ratio appeared to play an important roles on the degradation of the leakage current characteristics of $Al/BST/RuO_2$ capacitor with various $O_2/Ar$ ratio in sputtering gas. As a consequence, the leakage current of BST thin film showed the lowest value of $1.9{\times}10^{-7}\; A/{\textrm}{cm}^2$ at $O_2/Ar{\approx}1/9$.

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Distribution Behavior of Bi and Pb Between Molten PbO-SiO2 Slag and Bi (용융(熔融) PbO-SiO2계(系) 슬래그와 Bi 사이의 Bi와 Pb의 분배거동(分配擧動))

  • Kim, Se-Jong;Kim, Eung-Jin;Sohn, Ho-Sang
    • Resources Recycling
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    • v.21 no.5
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    • pp.65-71
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    • 2012
  • The equilibrium distribution of bismuth and lead between molten PbO-$SiO_2$ slag and bismuth phase was studied in the temperature range of $775^{\circ}C$ to $850^{\circ}C$ in a MgO crucible. The oxygen partial pressure of atmosphere was controlled by $P_{CO2}/P_{CO}$ ratio. The value of $(%PbO)_{slag}/[%Pb]_{metal}$ increased with increasing $SiO_2$ content of slag, and the value of $(%Bi_2O_3)_{slag}/[%Bi]_{metal}$ decreased with increasing $SiO_2$ content of slag. The concentration of Pb in metal increased with increasing temperature. These experimental results agreed well with the thermodynamic prediction.

In-situ Growth of Epitaxial PbVO3 Thin Films under Reduction Atmosphere

  • Oh, Seol Hee;Jin, Hye-Jin;Shin, Hye-Young;Shin, Ran Hee;Yoon, Seokhyun;Jo, William;Seo, Yu-Seong;Ahn, Jai-Seok
    • Proceedings of the Korean Vacuum Society Conference
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    • 2014.02a
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    • pp.361.1-361.1
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    • 2014
  • PbVO3 (PVO), a polar magnetic material considered as a candidate of multiferroic, has ferroelectricity along the c-axis and 2-dimensional antiferromagnetism lying in the in-plane through epitaxial growth [1,2]. PVO thin films were grown on LaAlO3 (001) substrates under reduction atmosphere from a stable Pb2V2O7 sintered target using pulsed laser deposition method. Epitaxial growth of the PVO films is possible only under Ar atmospheren with no oxygen partial pressure. X-ray diffraction was used to investigate the phase formation and texture of the films. We confirmed epitaxial growth of the PVO films with crystalline relationship of PbVO3[001]//LaAlO3[001] and PbVO3[100]//LaAlO3[100]. In addition, surface morphology of the films displays drastic changes in accordance with the growth conditions. Elongated PVO grains are related to the Pb2V2O7 pyrochlore structure. The relation between structural deformation and ferroelectricity in the PVO films was examined by local measurement of piezoresponse force microscopy.

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Characteristics of Solid Fuel Oxidation in a Molten Carbonate Fuel Cell

  • Lee, Choong-Gon;Kim, Yu-Jeong;Kim, Tae-Kyun;Lee, Sang-Woo
    • Journal of Electrochemical Science and Technology
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    • v.7 no.2
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    • pp.91-96
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    • 2016
  • Oxidation behaviours of ash free coal (AFC), carbon, and H2 fuels were investigated with a coin type molten carbonate fuel cell. Because AFC has no electrical conductivity, its oxidation occurs via gasification to H2 and CO. An interesting behaviour of mass transfer resistance reduction at higher current density was observed. Since the anode reaction has the positive reaction order of H2, CO2 and H2O, the lack of CO2 and H2O from AFC results in a significant mass transfer resistance. However, the anode products of CO2 and H2O at higher current densities raise their partial pressure and mitigate the resistance. The addition of CO2 to AFC reduced the resistance sufficiently, thus the resistance reduction at higher current densities did not appear. Electrochemical impedance results also indicate that the addition of CO2 reduces mass transfer resistance. Carbon and H2 fuels without CO2 and H2O also show similar behaviour to AFC: mass transfer resistance is diminished by raising current density and adding CO2.

Electrical Conductivity of $(ZrO_2)_x-(Tm_2O_3)_y$ System ($(ZrO_2)_x-(Tm_2O_3)_y$계의 전기전도도)

  • Eun Kyung Cho;Won Yang Chung;Keu Hong Kim;Seung Koo Cho;Jae Shi Choi
    • Journal of the Korean Chemical Society
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    • v.31 no.6
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    • pp.498-502
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    • 1987
  • Electrical conductivities of $(ZrO_2)_x-(Tm_2O_3)_y$ systems containing 1, 3 and 5mol% of $ZrO_2$ have been measured as a function of temperature and of oxygen partial pressure at temperatures from 600 to 1,100$^{\circ}$C and oxygen partial pressures from $10^{-5}$ to $2{\times}10^{-1}atm$. Plots of log conductivity vs. 1/T are found to be linear and average activation energy is 1.51 eV. The electrical conductivity dependences on PO$_2$ are different at two temperature regions, indicating ${\sigma}{\alpha}PO_2^{1/5.3}$ and ${\sigma}{\alpha}PO_2^{1/10.7}$ at high-and low-temperature regions, respectively. The defect of $(ZrO_2)_x-(Tm_2O_3)_y$ system is $V_{Tm}^{'''}$ and an electron hole is suggested as a carrier at high temperature region. At low temperature region, a mixed ionic and hole conduction is reasonable.

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Perpendicular Magnetic Anisotropy in Co/Pd Layer with TiO2 Seed Layer on the Various Substrates (TiO2 씨앗층을 이용한 다양한 기판에서의 Co/Pd 층의 수직 자기 이방성에 대한 연구)

  • Kang, Mool-Bit;Yoon, Jungbum;Lee, Jeong-Seop;You, Chun-Yeol
    • Journal of the Korean Magnetics Society
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    • v.23 no.1
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    • pp.7-11
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    • 2013
  • We investigate the perpendicular magnetic anisotropy in $TiO_2$/Co/Pd on GaAs(100), MgO(100), MgO(111), Si(100), and glass substrates. We find that the roughness of $TiO_2$ depends on the $O_2$ partial pressure in the magnetron sputtering process. The perpendicular magnetic anisotropies are found in all substrates with $TiO_2$ seed layer, and the perpendicular magnetic anisotropy of Co/Pd system is insensitive on the type of the substrate when the thickness of $TiO_2$ seed layer is thicker than 5 nm. However, MgO(111) substrate promotes $TiO_2$ rutile (111) structure, and it causes largest perpendicular magnetic anisotropy in $TiO_2$/Co/Pd(111) structures.

The Characteristics of the Dehydration Reaction and the Durability for the Thermal Decomposition in Na2B4O7·10H2O/Na2B4O7·5H2O System (Na2B4O7·10H2O/Na2B4O7·5H2O 계의 열분해 탈수반응 및 내구성 고찰)

  • Choi, Ho-Sang;Park, Young-Tae
    • Applied Chemistry for Engineering
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    • v.10 no.6
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    • pp.885-888
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    • 1999
  • This study was carried out to determine the reaction kinetic constant of the dehydration - thermal decomposition of $Na_2B_4O_7{\cdot}10H_2O/Na_2B_4O_7{\cdot}5H_2O$ and to investigate the durability during the repeated use of a chemical heat-storage material and the reproducibility of reaction system. The order of the dehydration reaction was 1st-order. The reaction rate was directly proportional to a partial pressure difference of water steam. The kinetic constant was 0.27 and the reproducibility of dehydration reaction for a kinetic constant and a reaction order was excellent. The activity variation in the durability test of a chemical heat-storage material was within range of ${\pm}5%$ during the repeatedly use in several times.

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