• Journal of environmental and Sanitary engineering
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• v.15 no.2
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• pp.58-64
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• 2000

The photocatalytic removal of Ag(I) in water by $TiO_2$ at a various conditions, which are initial Ag(I) concentration, circulation flow rate, $TiO_2$ dosage and methanol concentration, was studied. A continuous flow system with a circular type reactor of the TiO2 suspensions with UV light through an photoreactor column was applied. The major results of this study were as follows; 1. First order kinetics was observed from the result at different initial concentration of Ag(I). As the initial Ag(I) concentration was incereased, the reaction rate was decreased. 2. The removal efficiency of Ag(I) increased with increasing the circulation flow rate and $TiO_2$ dosage. However, over $4{\ell}/min$ of circulation flow rate and $1.5g/{\ell}$ of $TiO_2$ dosage, increasing of the efficiency reached a plateau. 3. The addition of methanol as hole scavenger enhanced the removal efficiency of Ag(I) but the removal efficiency reached a plateau over some level of methanol. 4. It was found that $TiO_2$ photocatalysis was effective method to remove of Ag(I) from aqueous solution.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.21 no.4
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• pp.354-361
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• 2008

The dielectric characteristics of low-k interlayer dielectric materials was fabricated by plasma enhanced chemical vapor deposition (PECVD). BTMSM precursor was evaporated and introduced with the flow rates from 16 sccm to 25 sccm by 1sccm step in the constant flow rate of 60 sccm $O_2$ in process chamber. Manufactured samples are analyzed components by measuring FT/IR absorption lines. Decomposition each Microscopic structures through two-dimensional correlation analysis about mechanisms for the formation of SiOCH in $SiOCH_3$, Si-O-Si and Si-$CH_3$ bonding group and analyzed correlation between the micro-structure of each group. It is a tendency that seems to be growing of Si-O-Ci(C) bonding group and narrowing of Si-O-$CH_3$ bonding group relative to the increasing flow-rate BTMSM. The order of changing sensitivity about changes of flow-rate in Si-O-Si(C) bonding group is cross link mode$(1050cm^{-1})$ $\rightarrow$ open link mode$(1100cm^{-1})\rightarrow$ cage link mode $(1140cm^{-1})$.

• Journal of the Korean institute of surface engineering
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• v.34 no.2
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• pp.89-96
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• 2001

N- or O-doped STS304 stainless films were synthesized by an unbalanced magnetron sputtering process with various argon and reactive gas ($N_2$, $O_2$) mixtures. These films were examined by scanning electron microscopy (SEM), X-ray diffraction (XRD), Auger electron spectroscopy (AES) and Knoop microhardness tester. The Results from X-ray diffraction (XRD) analysis showed that a STS304 stainless steel film synthesized without reactive gas using a bulk STS304 stainless steel target had a ferrite bcc structure ($\alpha$ phase), while the N-doped STS304 stainless film was consisted of a nitrogen supersaturated fcc structure, which hsa a strong ${\gamma}$(200) phase. In the O-doped films, oxide Phases ($Fe_2$$O_3$ and $Cr_2$$O_3$) were observed from the films synthesized under an excess $O_2$ flow rate of 9sccm. AES analysis showed that nitrogen content in N-doped films increased as the nitrogen flow rate increased. Approximately 43 at.%N in the N-doped film was measured using a nitrogen flow rate of 8sccm. In O-doped film, approximately 15 at.%O was detected using a $O_2$ flow rate of 12sccm. the Knoop microhardness value of N-doped film using a nitrogen flow rate of 8 sccm was measured to be approximately $H_{ k}$ 1200 and this high value could be attributed to the fine grain size and increased residual stress in the N-doped film.

• Korean Journal of Materials Research
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• v.9 no.6
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• pp.551-555
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• 1999

The deposition condition to obtain stoichiometric $Ta_2$O\ulcorner films, which is still controversial, using magnetron reactive sputtering was studied. The films were deposited by varying $O_2$gas flow rate with sputtering power and Ar gas flow rate of 200W and 60 sccm fixed. At the conditions of $O_2$ gas flow rate over 20 sccm, amorphous Tantalum oxide films with the refractive index of 2.1 and dielectric constant of 25 were deposited. Among those films, the capacitors dielectric properties of the film deposited at the condition of $O_2$ gas flow rate 50 sccm was best, the leakage current was 1$\times$10\ulcornerA/$\textrm{cm}^2$ at the electric field strength of 0.5 MC/cm and the breakdown field strength was over 2.0 MV/cm. This result could be explained from the analysis comparing with a standard sample using RBS because the composition of the film deposited at this condition was closest to the stoichiometric $Ta_2$O\ulcorner. The result of XPS analysis convinced that this film was stoichiometric $Ta_2$O\ulcorner film. A maximum cathode voltage was observed when $O_2$gas flow rate was 30 sccm. This shows that the Schiller's proposition that one can obtain stoichiometric films at the condition of maximum cathode voltage is not correct and more oxygen than that of the maximum voltage condition is necessary to deposit the stoichiometric Ta$_2$O\ulcorner films.

• Journal of the Korean Society of Manufacturing Process Engineers
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• v.20 no.6
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• pp.82-91
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• 2021

We compared the heat transfer characteristics of the parallel and the counterflow flow in the concentric double tube of the Al₂O₃/water nanofluids using numerical methods. The high- and low-temperature fluids flow through the inner circular tube and the annular tube, respectively. The heat transfer characteristics according to the flow direction were compared by changing the volume flow rate and the volume concentration of the nanoparticles. The results showed that the heat transfer rate and overall heat transfer coefficient improved compared to those of basic fluid with increasing the volume and flow rate of nanoparticles. When the inflow rate was small, the heat transfer performance of the counterflow was about 22% better than the parallel flow. As the inflow rate was increased, the parallel flow and the counterflow had similar heat transfer rates. In addition, the effectiveness of the counterflow increased from 10% to 22% rather than the parallel flow. However, we verified that the increment in the friction factor of the counterflow is not large compared to the increment in the heat transfer rate.

• Journal of Biomedical Engineering Research
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• v.26 no.4
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• pp.193-197
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• 2005

Shunt valves used to treat patients with hydrocephalus were tested to investigate influence of intracranial pressure pulsation on their flow control characteristics. Five commercial shunt valves were tested in the flow loop that simulates pulsed flow under pressure pulsation. As 20cc/hr of flow rate was adjusted at a constant pressure, application of $40mmH_2O$ of pressure pulse increased the flow rate by $67.9\%.$ As a 90cm length catheter was connected to the valve outlet, increase in the flow rate was substantially reduced to $17.5\%.$ As the flow rate was adjusted to 40cc/hr at a constant pressure, increase in the flow rate was $51.1\%$ with the same pressure pulsation of $40mmH_2O$. The results indicated that pressure-flow control characteristics of shunt valves implanted above human brain ventricle is quite different from those obtained by syringe pump test at constant pressures right after manufacture. The influence of pressure pulsation was observed to be more significant at low flow rate and the flexibility of the outlet silicone catheter was estimated to significantly reduce flow increase due to pressure pulsation.

• Korean Journal of Air-Conditioning and Refrigeration Engineering
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• v.16 no.1
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• pp.26-33
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• 2004

In general, an absorption chiller or heat pump is operated under the constant cooling water flow rate condition even though the system works with a partial load. The objective of this paper is to study the effect of the cooling water flow rates and the temperature of cooling water on the system performance to find the energy saving methode for the partial load operation of the double effect $H_2O$/LiBr absorption chiller. It is found that the performance of the system is sensitive to the temperature of cooling water than the cooling water flow rate, so the decrease of the performance due to reducing the cooling water flow rate can be overcome with the reduction of the cooling water temperature by 1$^{\circ}C$. The flow rate of the cooling water flow rate ranges from 50％ to 100％ of the flow rate at normal conditions with a partial load. It is also found that the operation cost of the cooling water pump and the cooling tower can be reduced by 23％.

• Journal of Nuclear Fuel Cycle and Waste Technology(JNFCWT)
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• v.18 no.3
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• pp.383-393
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• 2020

The corrosion behavior of Hastelloy C-276 was investigated to identify its applicability for carbon-anode-based oxide reduction (OR), in which Cl₂ and O₂ are simultaneously evolved at the anode. Under a 30 mL·min^-1 Cl₂ + 170 mL·min^-1 Ar flow, the corrosion rate was less than 1 g·m^-2·h^-1 up to 500℃, whereas the rate increased exponentially from 500 to 700℃. The effects of the Cl₂-O₂ composition on the corrosion rate at flow rates of 30 mL·min^-1 Cl₂, 20 mL·min^-1 Cl₂ + 10 mL·min^-1 O₂, and 10 mL·min^-1 Cl₂ + 20 mL·min^-1 O₂ with a constant 170 mL·min^-1 Ar flow rate at 600℃ was analyzed. Based on the data from an 8 h reaction, the fastest corrosion rate was observed for the 20 mL·min^-1 Cl₂ + 10 mL·min^-1 O₂ case, followed by 30 mL·min^-1 Cl₂ and 10 mL·min^-1 Cl₂ + 20 mL·min^-1 O₂. The effects of the chlorine flow rate on the corrosion rate were negligible within the 5-30 mL·min^-1 range. A surface morphology analysis revealed the formation of vertical scratches in specimens that reacted under the Cl₂-O₂ mixed gas condition.

• Proceedings of the Korean Society of Propulsion Engineers Conference
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• 2009.05a
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• pp.37-40
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• 2009

This study was performed to design of $H_2O_2$/Kerosene catalyst ignition injector and cold flow test to measure the mass flow rate and spray angle. Mass flow rate and spray angle were measured by designed injector through cold flow test. Result of test kerosene mass flow rate was measured 12.88 g/s and 40 deg of spray angle at pressure drop 3 bar as same as design point. And hydrogen peroxide was measured 94.39 g/s at pressure drop 1 bar smaller than design point.

• Journal of the Korean Ceramic Society
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• v.36 no.9
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• pp.901-908
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• 1999

Effects of LPMOCVD process parameters on the properties of TiO2 thin film were investigated. Depositions were made in the range of temperature 300-67$0^{\circ}C$ with various TTIP(Titanium Tetraisopropoxide) concentrations by contrlling bubbler temperature(40-8$0^{\circ}C$) and/or flow rate(30-90 sccm). Post annealing treatments were carried out at 500-80$0^{\circ}C$ range in the air. Films deposited at 40$0^{\circ}C$ have denser morphology than those of films deposited at 50$0^{\circ}C$ and $600^{\circ}C$ due to slower deposition rate. Bubbler temperature can affect on the deposition rate in mass transfer controlled regime such as 50$0^{\circ}C$ or higher but not below 50$0^{\circ}C$ where surface reaction rate becomes important. On the contrary for films deposited above 50$0^{\circ}C$ flow rate can raise deposition rate but eventually saturate it at the 50 sccm and above due to retarded adhesion of decomposed species. But for films deposited at 40$0^{\circ}C$ deposition rate increases stadily with flow rate. As the film becomes more porous A(200) texture can not be developed and AnataselongrightarrowRutile transition kinetics increases.