• 제목/요약/키워드: $N_2$ ion implant

검색결과 20건 처리시간 0.022초

생불활성 질화물 이온도금된 티타늄 임프란트의 표면특성 및 생체적합성 (Surface characteristics and biocompatibility of bioinert nitrides ion plated titanium implant)

  • 장갑성;김흥중;박주철;김병옥;한경윤
    • Journal of Periodontal and Implant Science
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    • 제29권1호
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    • pp.209-231
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    • 1999
  • Even though titanium(Ti) and its alloys are the most used dental implant materials, there are some problems that Ti wears easily and interferes normal osteogenesis due to the metal ions. Ti coated with bioactive ceramics such as hydroxyapatite has also such problems as the exfoliation or resorption of the coated layer, Recent studies on implant materials have been proceeding to improve physical properties of the implant substrate and biocompatibility of the implant surfaces. The purpose of the present study was to examine the physical property and bone tissue compatibility of bioinert nitrides ion plated Ti, Button type specimens(14mm in diameter, 2.32rrun in height) for the abrasion test and cytotoxicity test and thread type implants(3.75mm in diameter, 6mm in length) for the animal experiments were made from Ti(grade 2) and 316LVM stainless steel. Ti specimens were ion plated with TiN, ZrN by the low temperature arc vapor deposition, and the depth profile of the TiN/Ti, ZrN/Ti ion plated surface was examined by Auger Electron Spectroscopy. Three kind of button type specimens .of TiN/Ti, ZrN/Ti and Ti were used for abrasion test, and HEPAlClC7 cells and CCD cells were cultivated for 4 days with the specimens for cytotoxicity test. Thread type implants of TiN/Ti, ZrN/Ti, Ti, 316LVM were implanted on the femur of 6 adult dogs weighing 10kg-13kg. Two dogs were sacrified for histological examination after 45 days and 90 days, and four dogs were sacrified for the removal torque test of the implant') after 90 days. The removal torque force was measured by Autograph (Shimadzu Co., AGS-1000D series, Japan). Abrasion resistance of TiN/Ti was the highest, and that of ZrN/Ti and Ti were followed. The bioinert nitride ion plated Ti had much better abrasion resistance, compared with Ti, In the cytotoxicity test, the number of both cells were increased in all specimens, and there were no significant difference in cytotoxic reaction among all groups (p>0.1), In histological examination, 316LVM showed the soft tissue engagement in interface between the implant and bone, but the other materials after 45 days noted immature new bone formation in the medullary portion along the implant surface, and those after 90 days showed implant support by new bone formation in both the cortical and the medullary portion, The removal torque force of Tilv/Ti showed significantly higher than that of Ti(p(O,05). The difference in removal torque force between TiN/Ti and ZrN/Ti was not significant(p>0.05), and that of 316LVM was lowest among all groups(p<0.05). These results suggest that bioinert nitrides ion plated Ti can resolve the existing problems of Ti and bioactive ceramics, and it may be clinically applicable to human.

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치과용 임플란트 나사의 풀림에 미치는 표면코팅 효과 (EFFECTS OF SURFACE COATING ON THE SCREW RELEASE OF DENTAL IMPLANT SCREW)

  • 구철인;정재헌;최한철
    • 대한치과보철학회지
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    • 제42권2호
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    • pp.210-225
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    • 2004
  • Statement of problem: Implant screw loosening has been remained problem in restorative practices. Surface treatment of screw plays a role of preventing screw from loosening in implant screw mechanism. Purpose : The purpose of this study was to investigate surface characteristics of TiN and ZrN film ion plated screw with titanium and gold alloy screw and to evaluate wear resistance, surface roughness, and film adhesion on screw surface using various instruments. Material and methods : GoldTite screws and titanium screws provided by 3i (Implant Innovation, USA) and TorqTite screws or titanium screws by Steri-Oss (Nobel Biocare, USA) and gold screws and titanium screws by AVANA (Osstem Implant, korea) were selected. Ion plating which is much superior to other surface modification techniques was carried out for gold screws and titanium screws using Ti and Zr coating materials with nitrogen gas. Ion nitrided surface of each abutment screw was observed with field emission scanning electron microscopy (FE-SEM, micro-diamond scratch tester, vickers hardness tester, and surface roughness tester. Results : 1) The surface of gold screw and GoldTite is more smooth than ones of other kinds of non coated screw. 2) The ZrN and TiN coated surface is the more smooth than ones of other kinds of screw. 3) The hardness of TiN and ZrN coated surface showed higher than that of non coated surface. 4) The TiN coated titanium screw and ZrN coated gold screw have a good wear resistance and adhesion on the surface. 5) The surface of ZrN coated screw showed low surface roughness compared with the surface of TiN coated screw. Conclusion : It is considered that the TiN and ZrN coated screw which would prevent a screw from loosening can be applicable to implant system and confirmed that TiN and ZrN film act as lubricant on surface of screw due to decrease of friction for recycled tightening and loosening.

플라즈마 이온주입 후 RTP 열처리 온도와 시간에 따른 접촉저항 특성 (Characteristics of Contact resistivity on RTP annealing temperature and time after Plasma ion implant)

  • 최장훈;도승우;이용현
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2009년도 하계학술대회 논문집
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    • pp.5-6
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    • 2009
  • In this paper, plasma ion implant is performed with $PH_3$ gas diluted by helium gas on P-type Si wafer (100). Spike Rapid Thermal Processing(RTP) annealing performed for 30~60 sec from $800\;^{\circ}C$ to $1000\;^{\circ}C$ in $N_2+O_2$ ambient. Crystalline defect is analyzed by Transmission Electron Microscope(TEM) and Double crystal X-ray Diffraction(DXRD). Contact resistivity($\rho c$), contact resistance(Rc) and sheet resistance(Rs) are analyzed by measuring Transfer Length Method(TLM) using 4155C analysis. As annealing temperature increase, Rs decrease and ${\rho}c$ and Rc increase at temperature higher than $850\;^{\circ}C$. We achieve low Rs, ${\rho}c$ and Rc with Plasma ion implant and spike RTP.

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Influence of Ion Isolation on the Resistivity of Different Types of GaN

  • Johra, Fatima Tuz;Jung, Woo-Gwang
    • 한국재료학회:학술대회논문집
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    • 한국재료학회 2011년도 춘계학술발표대회
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    • pp.237.1-237.1
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    • 2011
  • Resistivity of GaN has been investigated under the influence of ion implantation. n-type, p-type and also undoped GaN has been used here. A ring shape pattern of Au was fabricated on GaN film by the photolithography technique. H, He and Ar were used for implantation. The ion implantation energy, fluence and post-implant annealing temperature varied in this research. Because of the making barrier in some selected area using ions, the resistivity changed in all the samples with the change of both fluence and energy. At room temperature, the resistivity of n-type GaN has been increased from $1.9{\times}10-2$ to $17.7{\times}10-2\;{\Omega}-cm$. This is high for He ion. But undoped and p-type GaN showed some anomalous character.

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질소 이온 주입시킨 7050Al합금의 표면 미세구조 변화와 저주기 피로거동 (The Surface Modification and Low Cycle Fatigue Behavior of N+ion Implantated 7050Al Alloy)

  • 이창우;권숙인
    • 열처리공학회지
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    • 제7권4호
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    • pp.307-317
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    • 1994
  • The surf ace microstructure modification by $N^+$ ion implantation into 7050Al alloy and its low cycle fatigue behavior were investigated. Ion implantation method is to physically implant accelerated ions to the surface of a substrate. High dose of nitrogen($5{\times}10^{17}ions/cm^2$) were implanted into 7050Al alloy using current density of accellerating voltage of 100KeV. The implanted layers were characterized by Electron Probe-Micro Analysis(EPMA), Auger Elecron Spectroscopy(AES), X-Ray Diffraction(XRD), X-Ray Photoelectron Spectroscopy(XPS), and Transmission Electron Microscopy(TEM). The experimental results were compared with computer simulation data. It was shown that AlN was formed to 4500 ${\AA}$ deep. The low cycle fatigue life of the $N^4$ion modified material was prolonged by about three times the unimplanted one. The improved low cycle fatigue life was attributed to the formation of AlN and the damaged region on the surface by $N^+$ ion implantation.

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치과 임플란트 스크루 풀림토크 개선용 DLC 박막 코팅에 관한 연구 (A Study on the DLC Film Coating for Improving Loosening Torque of Dental Implant Screw)

  • 정운조;조재철
    • 전기학회논문지
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    • 제67권10호
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    • pp.1375-1381
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    • 2018
  • In this paper, we studied coatings of the DLC thin film for improving loosening torque of dental implant screw. We used a filtered arc ion plating process which can realize the most dense DLC layer by coating the DLC thin film on the surface of the dental abutment screw. It showed both hardness comparable to diamond and low friction coefficient similar to graphite, and to improve the loosening phenomenon by increasing the screw tightening force Cr/CrN, Ti/TiN or Ti/TiN/Cr/CrN buffer layers were deposited for 5 to 10 minutes to improve the adhesion of the DLC thin film to the surface of the Ti (Gr.5), and then the DLC thin film was coated for about 15 minutes. As a result, the Cr/CrN buffer layer exhibited the highest hardness of 29.7 GPa, the adhesion of 18.62N on average, and a very low coefficient of friction of less than 0.2 as a whole. And we measured loosening torque after one million times with masticatory movement simulator. As a result, the values of the coated screw loosening torque were clearly higher than those of the uncoated screw. From this, it was found that the DLC coating was effective methods improving the loosening torque. In addition, it was confirmed that the cytotoxicity test and cell adhesion test showed high biocompatibility.

질소이온 주입시킨 7050A1 합금의 표면 미세구조 변화의 분석 (Analyzing Surface Microstructure of 7050A1 Alloy Modified by $N^+ion$ Implantation)

  • 이창우;권숙인;한전건
    • 분석과학
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    • 제7권4호
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    • pp.527-540
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    • 1994
  • 본 연구는 질소이온 주입시킨 7050A1 합금의 표면 미세구조 변화에 대하여 살펴보았다. 이온 주입은 이온을 가속시켜서 물리적으로 모재의 표면에 주입시키는 표면처리의 한 방법으로서, 본 연구에서는 가속 에너지를 100KeV로 하고 전류밀도는 $23.1{\mu}A/cm^2$, 주입량은 $5{\times}10^{15}ions/cm^2$, $5{\times}10^{17}ions/cm^2$과, $8{\times}10^{17}ions/cm^2$로 질소이온을 주입하였다. 이온 주입층은 EPMA, AES, XPS, TEM 등으로 분석하였으며, 그 결과를 computer simulation을 통하여 비교하여 보았다. 질소이온 주입시킨 7050A1 합금은 극 표면에서부터 약 $4000{\AA}$ 사이에서 AlN이 Gaussian 분포를 지니고 있었으며, 일정 깊이에서 이온의 주입에 의해 충격을 받은 영역을 관찰할 수 있었고 이러한 표면의 변화들은 미소경도에 영향을 미치게 되어 저하중에서 경도값의 상승을 야기했다.

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Effects of CF4 Plasma Treatment on Characteristics of Enhancement Mode AlGaN/GaN High Electron Mobility Transistors

  • Horng, Ray-Hua;Yeh, Chih-Tung
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2015년도 제49회 하계 정기학술대회 초록집
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    • pp.62-62
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    • 2015
  • In this study, we study the effects of CF4 plasma treatment on the characteristics of enhancement mode (E-mode) AlGaN/GaN high electron mobility transistors (HEMTs). The CF4 plasma is generated by inductively coupled plasma reactive ion etching (ICP-RIE) system. The CF4 gas is decomposed into fluorine ions by ICP-RIE and then fluorine ions will effect the AlGaN/GaN interface to inhibit the electron transport of two dimension electron gas (2DEG) and increase channel resistance. The CF4 plasma method neither like the recessed type which have to utilize Cl2/BCl3 to etch semiconductor layer nor ion implantation needed high power to implant ions into semiconductor. Both of techniques will cause semiconductor damage. In the experiment, the CF4 treatment time are 0, 50, 100, 150, 200 and 250 seconds. It was found that the devices treated 100 seconds showed best electric performance. In order to prove fluorine ions existing and CF4 plasma treatment not etch epitaxial layer, the secondary ion mass spectrometer confirmed fluorine ions truly existing in the sample which treatment time 100 seconds. Moreover, transmission electron microscopy showed that the sample treated time 100 seconds did not have etch phenomena. Atomic layer deposition is used to grow Al2O3 with thickness 10, 20, 30 and 40 nm. In electrical measurement, the device that deposited 20-nm-thickness Al2O3 showed excellent current ability, the forward saturation current of 210 mA/mm, transconductance (gm) of 44.1 mS/mm and threshold voltage of 2.28 V, ION/IOFF reach to 108. As IV concerning the breakdown voltage measurement, all kinds of samples can reach to 1450 V.

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플라즈마 이온주입 기술을 이용한 SOI 웨이퍼 제조 (Silicon On Insulator (SOI) Wafer Development using Plasma Source Ion Implantation (PSII) Technology)

  • 정승진;이성배;한승희;임상호
    • 대한금속재료학회지
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    • 제46권1호
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    • pp.39-43
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    • 2008
  • PSII (Plasma Source Ion Implantation) using high density pulsed ICP source was employed to implant oxygen ions in Si wafer. The PSII technique can achieve a nominal oxygen dose of $3 {\times}10^{17}atoms/cm^2$ in implantation time of about 20min. In order to prevent oxidation of SOI layer during high temperature annealing, the wafer was capped with $2,000{\AA}$ $Si_3N_4 $ by PECVD. Cross-sectional TEM showed that continuous $500{\AA}$ thick buried oxide layer was formed with $300{\AA}$ thick top silicon layer in the sample. This study showed the possibility of SOI fabrication using the plasma source ion implantation with pulsed ICP source.

금속 임플란트 소재의 내마모성 향상을 위하여 적용되는 질소 이온주입 및 이온도금법의 한계 (Limitation of Nitrogen ion Implantation and Ionplating Techniques Applied for Improvement of Wear Resistance of Metallic Implant Materials)

  • 김철생
    • 대한의용생체공학회:의공학회지
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    • 제25권2호
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    • pp.157-163
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    • 2004
  • 금속 임플란트 재료들의 마모저항을 향상시키기 위하여 질소 이온주입 및 이온도금 기술을 적용하였다. 질소 이온주입 된 초내식성 스테인리스강(S.S.S)의 마모이온용출 특성을 S.S.S, 316L SS, TiN코팅된 316S SS와 비교 평가하기 위하여 탄소로 원자흡수분광분석기를 이용하여 시편들로부터 마모용출된 Cr과 Ni 이온량을 측정하였다. 또한, 저온아크증착법을 이용하여 TiN, ZrN, TiCN코팅된 Ti(Grade 2)원반의 마모저항을 비교하였고, 질소이온주입 및 질화물 코팅된 표면충의 화학적 조성은 SAES(scanning Auger electron spectroscopy)를 이용하여 분석하였다. 질소 이온주입된 S.S.S 표면으로부터 마모에 의하여 용출된 Cr과 Ni 이온량은 표면처리하지 않은 스테인리스강들에 비하여 크게 감소하였다 그러나 인공고관절에 걸리는 하중조건 하에서 실행된 마모이온용출실험에서 이온에너지 100 KeV로 질소이온 주입된 표면층은 20만회 내에서 쉽게 제거되었다. 질화물 코팅된 Ti 시편들의 마모저항도 크게 향상되었고, 그 마모특성은 코팅층의 화학적 조성에 따라 크게 차이가 났다. 코팅두께 3Um의 코팅시편들 중 TiCN 코팅된 티타늄이 가장 높은 내마모 특성을 보였으나 같은 하중조건 하에서 disk(Ti)-on-disk 마모실험에서 그 질화물 코팅면들의 마모 무게감 소비는 1만회 아래에서 모두 Ti의 마모비와 유사하게 전환되었다. 본 실험으로부터 얻어진 연구결과에 의하면, 100 KeV 질소이온주입 및 두께 3$\mu\textrm{m}$의 길화코팅된 표면층의 경우 표면 경화충의 깊이가 충분치 않아 높은 하중을 받는 임플란트의 마찰부위에 사용하기에는 한계가 있음을 보였다.