• Title/Summary/Keyword: $Li_2PtO_3$

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Fabrication and Characterization of Thin Film Supercapacitor using $WO_3$ ($WO_3$를 이용한 박막형 슈퍼캐패시터의 제작 및 특성 평가)

  • 신호철;신영화;임재홍;윤영수
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2000.11a
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    • pp.575-578
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    • 2000
  • In this work, all solid-state thin film supercapacitor(TFSC) was fabricated using tungsten trioxide (WO$_3$) with a structure WO$_3$/LiPON/WO$_3$/Pt/TiO$_2$/Si (substrate). After TiO$_2$ was deposited on Si(100) wafer by d.c. reactive sputtering, the Pt current collector films were grown on TiO$_2$glue layer without breaking vacuum by d.c. sputtering. Fabrication conditions of WO$_3$ thin film were such that substrate temperature, working pressure, gas ratio of $O_2$/Ar and r.f. power were room temperature, 5 mTorr, 20% (O$_2$(8sccm)/Ar(32sccm)) and 200W, respectively. LiPON electrolyte film were grown on the WO$_3$ film using r.f. magnetron sputtering at room temperature. The XRD pattern of the as-deposited WO$_3$ thin film were shown no crystalline peak (amorphous). The SEM image of as-deposited WO$_3$ thin film showed that the surface is smooth and uniform. The capacitiy of as-fabricated TFSC was 0$\times$10$^{-2}$ F/$\textrm{cm}^2$-${\mu}{\textrm}{m}$.

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Fabrications and Properties of MFIS Structures using high Dielectric AIN Insulating Layers for Nonvolatile Ferroelectric Memory (고유전율 AIN 절연층을 사용한 비휘발성 강유전체 메모리용 MFIS 구조의 제작 및 특성)

  • Jeong, Sun-Won;Kim, Gwang-Hui;Gu, Gyeong-Wan
    • Journal of the Institute of Electronics Engineers of Korea SD
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    • v.38 no.11
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    • pp.765-770
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    • 2001
  • Metal-ferroelectric-insulator- semiconductor(MFTS) devices by using rapid thermal annealed (RTA) LiNbO$_3$/AIN/Si(100) structures were successfully fabricated and demonstrated nonvolatile memory operations. Metal-insulator-semiconductor(MIS) C-V properties with high dielectric AIN thin films showed no hysteresis and good interface properties. The dielectric constant of the AIN film calculated from the capacitance at the accumulation region in the capacitance-voltage(C-V) characteristics was about 8. The C-V characteristics of MFIS capacitor showed a hysteresis loop due to the ferroelectric nature of the LiNbO$_3$ thin films. Typical dielectric constant value of LiNbO$_3$ film of MFIS device was about 23. The memory window width was about 1.2 V at the gate voltage of $\pm$5 V ranges. Typical gate leakage current density of the MFIS structure was the order of 10$^{-9}$ A/$\textrm{cm}^2$ at the range of within $\pm$500 kV/cm. The ferroelectric capacitors showed no polarization degradation up to about 10$^{11}$ switching cycles when subjected to symmetric bipolar voltage pulse(peak-to-peak 8 V, 50 % duty cycle) in the 500 kHz.

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Fabrications and properties of MFIS capacitor using $LiNbO_3$/AIN structure ($LiNbO_3$/AIN 구조를 이용한 MFIS 커패시터의 제작 및 특성)

  • 이남열;정순원;김용성;김진규;정상현;김광호;유병곤;이원재;유인규
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2000.07a
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    • pp.743-746
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    • 2000
  • Metal-ferroelectric-insulator-semiconductor(MFIS) devices using Pt/$LiNbO_3$/Si structure were successfully fabricated. The dielectric constant of the AIN film calculated from the capacitance in the accumulation region in the capacitance-voltage(C-V) curve was about 8.2. The gate leakage current density of MIS devices using a aluminum electrode showed the least value of 1$\times$$1O^{-8}$A/$cm^2$ order at the electric field of 500kV/cm. The dielectric constant of $LiNbO_3$film on AIN/Si structure was about 23 derived from 1MHz capacitance-voltage (C-V) measurement and the resistivity of the film at the field of 500kV/cm was about 5.6$\times$ $1O^{13}$ $\Omega$.cm.

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Single Crystal Growth of Synthetic Emerald by Reflux Method of Temperature Gradient used Natural Beryl (천연베릴을 이용한 온도구배 환류법에 의한 합성 Emerald 단결정 육성)

  • 최의석;김무경;이종민;안영필;서청교;안찬준
    • Proceedings of the Korea Association of Crystal Growth Conference
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    • 1996.06a
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    • pp.519-521
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    • 1996
  • Emerald (3BeO.Al2O3.6SiO2 : Cr3+) single crystals were crystals were grown by reflux method of temperature gradient in the flux solution of Li2O-MoO3-V2O5 system. The composition of flux materials were 3 mole ratio of MoO3-V2O5/Li2O, subtituted 0.2 mole% of K2O, Na2O, Nb2O5 etc to Li2O content, solved 10-15% of beryl to flux quantity and doped 1% of Cr2O3 to emerald amount. Those of mixing were melted at 110$0^{\circ}C$ in Pt containers of the 3 zone furnace of melt-growth-return to circulate continniously, specially it has been grown large emerald single crystal when thermal fluctuation was treated for 2hrs of once time a day at 1050-95$0^{\circ}C$ in growth zone, substitutional solid solution effect of Cr+3 ion for Al+3 to the growth of emerald single crystal was good. Emerald single crystals were c(0001) hexagonal crystal face of preferencial growth direction and m(1010) post side. When it had been durated for 5 months emerald single crystals of the firet size of 0.6mm thickness of seed crystal were grown 32$\times$65mm(c x m) of maximum size and 6.2mm thickness.

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Growth and photoluminescence properties of Er : Mg : LiNbO$_3$single crystal fibers by $\mu$-PD method ($\mu$-PD법에 의한 Er : Mg : LiNbO$_3$fiber 결정 성장 및 형광특성)

  • 양우석;윤대호
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.10 no.6
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    • pp.389-393
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    • 2000
  • High-quality $Er^{3+}$ doped Mg : $LiNbO_3$single crystal fibers were grown by a micro-pulling down ($\mu$-PD) method. Single crystal fibers were pulled down through the nozzle, at a pulling down rate of 0.5 mm/min and using a Pt crucible with a nozzle 1 mm in diameter in air atmosphere. Defects such as bubbles, cracks and inclusions were not detected in any of the grown crystals. The optical transmission of Er : Mg : $LiNbO_3$crystal was measured and the energy levels of $Er_2O_3$ ion could be calculated. The photoluminescence spectrum of crystal fibers showed an energy band emission with the strongest line corresponding to the $^4I_{3/2}{\to}^4I_{15/2}$transition. The concentration dependence of the entire wavelength region emission intensity upon excitation intensity measured emission intensity for the 3 mol% MgO doped fibers was larger than that for the 1, 5 mol% MgO doped fibers.

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Electro-chemical properties of $Li_{2}O=P_{2}O_{5}-V_{2}O_{5}$ Glass-ceramics for Cathode Materials (정극재료용 $Li_{2}O=P_{2}O_{5}-V_{2}O_{5}$ 계 결정화 유리의 전기화학적 특성)

  • 손명모;이헌수;구할본;김윤선
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2000.11a
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    • pp.295-298
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    • 2000
  • Vanadate glasses in the Li$_2$O-P$_2$O$_{5}$-V$_2$O$_{5}$ system containing 10~20mo1% glass former, P$_2$O$_{5}$ were prepared by melting the batch in pt. crucible followed by quenching on the copper plate. We found that Li$_2$O-P$_2$O$_{5}$-V$_2$O$_{5}$ g1ass-ceramics obtained from crystallization of glass showed significantly higher capacity and longer cycle life than Li$_2$O-P$_2$O$_{5}$-V$_2$O$_{5}$ g1ass. In the present paper, we describe electro-chemical properties during crystallization process and find the best crystallization condition of Li$_2$O-P$_2$O$_{5}$-V$_2$O$_{5}$ g1ass as cathod material. Li$_2$O-P$_2$O$_{5}$-V$_2$O$_{5}$ glass-ceramics shows superior rechargeable capacity of 220 mAh/g in the cycling between 2.0 and 3.9V. between 2.0 and 3.9V.

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Fabrication and Electrochemical Characterization of All Solid State Thin Film Micro-Battery by in-situ sputtering (In-situ 스퍼터링을 이용한 마이크로 박막 전지의 제작 및 전지 특성 평가)

  • 전은정;신영화;남상철;조원일;손봉희;윤영수
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1999.11a
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    • pp.159-162
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    • 1999
  • All solid state thin film micro-batteries consisting of lithium metal anode, an amorphous LiPON electrolyte and cathode of vanadium oxide have been fabricated and characterized, which were fabricated with cell structure of Li/LiPON/V$_2$O$\sub$5/Pt. The vanadium oxide thin films were formed by d.c. reactive sputtering on Pt current collector. After deposition of vanadium oxide films, in-situ growths of lithium phosphorus oxynitride film were conducted by r.f. sputtering of Li$_3$PO$_4$ target in mixture gas of N$_2$ and O$_2$. The pure metal lithium film was deposited by thermal evaporation on thin film LiPON electrolyte. The cell capacity was about 45${\mu}$Ah/$\textrm{cm}^2$ $\mu\textrm{m}$ after 200 cycle. No appreciable degradation of the cell capacity could be observed after 50 cycles .

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Synthesis of Li-doped NiO and its application of thermoelectric gas sensor (Li 도핑된 NiO 합성 및 열전식 수소센서에의 적용)

  • Han, Chi-Hwan;Han, Sang-Do;Kim, Byung-Kwon
    • Journal of Hydrogen and New Energy
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    • v.16 no.2
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    • pp.136-141
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    • 2005
  • Li-doped NiO was synthesized by molten salt method. $LiNO_3$-LiOH flux was used as a source for Li doping. $NiCl_2$ was added to the molten Li flux and then processed to make the Li-doped NiO material. Li:Ni ratios were maintained from 5:1 to 30:1 during the synthetic procedure and the Li doping amount of synthesized materials were found between 0.086-0.190 as a Li ion to Ni ion ratio. Li doping did not change the basic cubic structural characteristics of NiO as evidenced by XRD studies, however the lattice parameter decreased from 0.41769nm in pure NiO to 0.41271nm as Li doping amount increased. Hydrogen gas sensors were fabricated using these materials as thick films on alumina substrates. The half surface of each sensor was coated with the Pt catalyst. The sensor when exposed to the hydrogen gas blended in air, heated up the catalytic surface leaving rest half surface (without catalyst) cold. The thermoelectric voltage thus built up along the hot and cold surface of the Li-doped NiO made the basis for detecting hydrogen gas. The linearity of the voltage signal vs $H_2$ concentration was checked up to 4% of $H_2$ in air (as higher concentrations above 4.65% are explosive in air) using Li doped NiO of Li ion/Ni ion=0.111 as the sensor material. The response time T90 and the recovery time RT90 were less than 25 sec. There was minimum interference of other gases and hence $H_2$ gas can easily be detected.

Single crystal growth of synthetic emerald by flux method of Vandadium - Molybdenum - Lithium oxide system (산화 바나디움, 몰리브데늄, 리티움계 융제법에 의한 합성 Emerald 단결정 육성)

  • 최의석;김무경;이종민;안영필;서청교;안찬준
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.6 no.1
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    • pp.44-55
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    • 1996
  • Emerald (3BeO{\cdot}Al$_{2}$O_{3}{\cdot}6SiO_2 : Cr^{3+}$) single crystals were grown by flux method of $Li_2O-MoO_3 - V_2O_5$ system. The composition of starting materials were 1, 3, 5 mole ratio of $MoO_3 - V_2O_5/$Li_2O$, 20 - 15% of emerald content to flux composition and 1% of $Cr_2O_3$ colordopant to emerald composition. After mixing those were melted at $1100^{\circ}C$ in Pt crucible of electric furnace. Single crystal growth was cooled down slowly rate of $3^{\circ}C$/hr from $1100^{\circ}C$ to $650^{\circ}C$, for the cooling period it was controlled and prevented the nucleation of microcrystallite from variation of each thermal fluctuation range. Specially it has been obtained plenty of large emerald single crystal when thermal fluctuation was treated for cooling period at $1050 ~ 950^{\circ}C$, in 3 mole ratio of $V_2O_5 - MoO_3/Li_2O$ flux. Emerald single crystal growing effect and $Cr_{+3}$ ion of substitutional solid solution effect for $Al_{+3}$ ion was good than mole ratio of 5. Emerald single crystals were c (0001) hexagonal rystal face of preferencial direction and m (1010) post side. Emerald was hexagonal columnar greenish transparent and 2.65 ~ 2.66 of specific gravity.

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Improving Efficiencies of DSC by Down-conversion of LiGdF4:Eu (Eu이 도핑된 LiGdF4의 Down-conversion을 이용한 염료감응형 태양전지의 효율 향상)

  • 김현주;송재성;김상수
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.17 no.3
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    • pp.323-328
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    • 2004
  • Down-conversion of Eu$^{3+}$ doped LiGdF$_4$ (LGF) for increasing the cell efficiency on dye-sensitized Ti $O_2$ solar cells has been studied. The dye sensitized solar cell (DSC) consisting of mesoporous Ti $O_2$ electrode deposited on transparent substrate, an electrolyte containing I$^{[-10]}$ /I$_3$$^{[-10]}$ redox couple, and Pt counter electrode is a promising alternative to the inorganic solar cell. The structure of DSC is basically a sandwich type, viz., FTO glass/Ru-red dye-absorbed Ti $O_2$/iodine electrolyte/sputtered Pt/FTO glass. The cell without down converter had open circuit potential of approximately 0.66 Volt, the short circuit photocurrent density of 1.632 mA/$\textrm{cm}^2$, and fill factor of about 50 % at the excitation wavelength of 550 nm. In addition, 5.6 mW/$\textrm{cm}^2$ incident light intensity beam was used as a light source. From this result, the calculated monochromatic efficiency at the wavelength of 550 nm of this cell was about 9.62 %. The incident photon to current conversion efficiency (IPCE) of N3 used as a dye in this work is about 80 % at around 590 nm and 610 nm, which is the emission spectrum of Eu$^{3+}$ doped LGF, results in efficiency increasing of DSC.C.