• 제목/요약/키워드: $H_2$ plasma treatment

검색결과 493건 처리시간 0.023초

코어금형용강 SKD11의 플라즈마 전해산화에 의한 피막 형성 (Formation of Coatings on SKD11 Core Mold Steel by Plasma Electrolytic Oxidation)

  • 김상무;이태행;강석조;조영희;구자명
    • 열처리공학회지
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    • 제24권4호
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    • pp.209-216
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    • 2011
  • Surface coatings were prepared on SKD11 core mold steel by plasma electrolytic oxidation (PEO). The coatings were investigated about the formation condition of core mold steel. SKD11 were coated by PEO in a mix solution of Sodium Aluminate $NaAlO_2$ (10 g/l), Sodium Silicate powder $Na_2SiO_3$ (0.5 g/l), Sodium tungstate dihydrate $Na_2WO_42H_2O$ (0.5 g/l) at less than $30^{\circ}C$. The electrical condition were voltage : 500~600 V; Pulse : 600~1800 Hz; current density 15~20 $A/dm^2$ various time : 3 min~40 min. The coatings surface morphology, cross-section, friction coefficient, hardness were investigated. The PEO coatings on SKD11 core mold steel showed the extended service life.

An Intravenous Replenishment of Salivary Components and Dry Forage Intake in Freely Drinking Large-type Goats

  • Sunagawa, K.;Hashimoto, T.;Izuno, M.;Hashizume, N.;Okano, M.;Nagamine, I.;Hirata, T.
    • Asian-Australasian Journal of Animal Sciences
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    • 제21권4호
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    • pp.538-546
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    • 2008
  • Large-type goats eating dry forage secreted large volumes of saliva which resulted in the loss of $NaHCO_3$ from the blood and decreased plasma volume (hypovolemia). This research investigated whether or not the loss of $NaHCO_3$ from the blood and hypovolemia brought about by dry forage feeding actually depresses feed intake in large-type goats under free drinking conditions. The present experiment consisted of three treatments (NI, ASI, MI). All treatments in this experiment were carried out under free drinking conditions. In the NI control (NI), a solution was not infused. In the ASI treatment, i.v. infusion of artificial saliva was initiated 2 h before feeding and was continued for a total of 3 h concluding 1 h after the commencement of the feeding perod. In the MI treatment, mannitol solution was infused to replenish only water lost from the blood in the form of saliva. The hematocrit and plasma total protein concentrations during feeding in the NI control were observed to be higher than pre-feeding levels. This indicated that dry forage feeding-induced hypovolemia was caused by the accelerated secretion of saliva during the initial stages of feeding in freely drinking large-type goats. Increases in hematocrit and plasma total protein concentrations due to dry forage feeding were significantly suppressed by the ASI treatment. While hematocrit during feeding in the MI treatment was significantly lower than the NI control, plasma total protein concentrations were not different. From these results, it is clear that the MI treatment was less effective than the ASI treatment in mitigating the decreases in plasma volume brought about by dry forage feeding. This indicates that plasma volume increased during dry forage feeding in the ASI treatment which inhibited production of angiotensin II in the blood. The ASI treatment lessened the levels of suppression on dry forage feeding, but the MI treatment had no effect on it under free drinking conditions. The results indicate that despite the free drinking conditions, increases in saliva secretion during the initial stages of dry forage feeding in large-type goats caused $NaHCO_3$ to be lost from the blood into the rumen which in turn caused a decrease in circulating plasma volume and resulted in activation of the renin-angiotensin system and thus feeding was suppressed.

Enhancement of Surface Hardness and Corrosion Resistance of AISI 310 Austenitic Stainless Steel by Low Temperature Plasma Carburizing Treatment

  • Lee, Insup
    • 한국표면공학회지
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    • 제50권4호
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    • pp.272-276
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    • 2017
  • The response of AISI 310 type austenitic stainless steel to the novel low temperature plasma carburizing process has been investigated in this work. This grade of stainless steel shows better corrosion resistance and high temperature oxidation resistance due to its high chromium and nickel content. In this experiment, plasma carburizing was performed on AISI 310 stainless steel in a D.C. pulsed plasma ion nitriding system at different temperatures in $H_2-Ar-CH_4$ gas mixtures. The working pressure was 4 Torr (533Pa approx.) and the applied voltage was 600 V during the plasma carburizing treatment. The hardness of the samples was measured by using a Vickers micro hardness tester with the load of 100 g. The phase of carburized layer formed on the surface was confirmed by X-ray diffraction. The resultant carburized layer was found to be precipitation free and resulted in significantly improved hardness and corrosion resistance.

The Effects of CF4 Partial Pressure on the Hydrophobic Thin Film Formation on Carbon Steel by Surface Treatment and Coating Method with Linear Microwave Ar/CH4/CF4 Plasma

  • Han, Moon-Ki;Cha, Ju-Hong;Lee, Ho-Jun;Chang, Cheol Jong;Jeon, Chang Yeop
    • Journal of Electrical Engineering and Technology
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    • 제12권5호
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    • pp.2007-2013
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    • 2017
  • In order to give hydrophobic surface properties on carbon steel, the fluorinated amorphous carbon films were prepared by using linear 2.45GHz microwave PECVD device. Two different process approaches have been tested. One is direct deposition of a-C:H:F films using admixture of $Ar/CH_4/CF_4$ working gases and the other is surface treatment using $CF_4$ plasma after deposition of a-C:H film with $Ar/CH_4$ binary gas system. $Ar/CF_4$ plasma treated surface with high $CF_4$ gas ratio shows best hydrophobicity and durability of hydrophobicity. Nanometer scale surface roughness seems one of the most important factors for hydrophobicity within our experimental conditions. The properties of a-C:H:F films and $CF_4$ plasma treated a-C:H films were investigated in terms of surface roughness, hardness, microstructure, chemical bonding, atomic bonding structure between carbon and fluorine, adhesion and water contact angle by using atomic force microscopy (AFM), nano-indentation, Raman analysis and X-ray photoelectron spectroscopy (XPS).

Electroless Ni Plating on PC to Improve Adhesion by DBD Plasma Treatment

  • Song, T.H.;Lee, J.K.;Park, S.Y.
    • Corrosion Science and Technology
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    • 제4권6호
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    • pp.222-225
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    • 2005
  • The adhesion strength of metal plating on PC was studied. In this study, surface was treated by chemical agents or DBD(dielectric barrier discharge) plasma to imporve the adhesion. The surface roughness, contact angle, gloss of plating and adhesive strength were measured. Adhesion strengths of Ni plating on prepared PC by NaOH and KOH solution were $12.3kgf/cm^2$ and $7.5kgf/cm^2$, respectively. The highest adhesion strength was obtained in the plasma treated one, $27.8kgf/cm^2$.

MoS2 layer etching using CF4 plasma and H2S plasma treatment

  • 양경채;박성우;김경남;염근영
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2016년도 제50회 동계 정기학술대회 초록집
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    • pp.222.2-222.2
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    • 2016
  • 트랜지스터 응용 등에 관한 연구가 활발해 지면서 에너지 밴드갭이 0 eV에 가까운 그래핀 이외의 밴드 갭 조절이 가능한 MoS2 (molybdenum disulfide), BN (boron nitride), Bi2Te3 (bismuth telluride), WS2 (tungsten disulfide) 등과 같은 이차원 Transition Metal DiChalcogenides (TMDC) 물질이 반도체 물질로 각광받고 있다. 특히 MoS2의 경우 단결정 덩어리 상태에서는 약 1.3 eV의 밴드갭을 가지나 두께가 줄어들어 두 층일 경우에는 약 1.65 eV, 단일층이 되면 약 1.9 eV의 밴드갭을 가져 박막 층수에 따라 에너지 밴드갭 조절이 가능한 것으로 알려져있다. 하지만 두께 조절이 가능하면서 대면적, 고품질을 가지는 MoS2 박막 합성은 아직 제한적이라 할 수 있으며 새로운 방법 및 물질에 대한 연구가 지속적으로 이루어 지고 있다. 따라서 본 연구에서는 다양한 층수를 지니는 MoS2 합성을 위해 나노 두께의 MoS2 박막을 CF4 plasma 를 이용하여 layer etching 진행하고 CF4 plasma 100초 etching 진행한 2 layer 두께의 MoS2를 기준으로 H2S plasma를 이용하여 treatment 진행하였다. 물리적, 화학적 분석은 Raman spectroscopy, XPS(X-ray Photoelectron Spectroscopy), AFM (Atomic Force Microscopy) 등을 이용해 진행하였고 이를 통해 MoS2 layer 감소 및 damage recovery 등을 확인하였다.

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플라즈마 에칭으로 손상된 4H-실리콘 카바이드 기판위에 제작된 MOS 커패시터의 전기적 특성 (Electrical Characterization of MOS (metal-oxide-semiconductor) Capacitors on Plasma Etch-damaged 4H-Silicon Carbide)

  • 조남규;구상모;우용득;이상권
    • 한국전기전자재료학회논문지
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    • 제17권4호
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    • pp.373-377
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    • 2004
  • We have investigated the electrical characterization of metal-oxide-semiconductor (MOS) capacitors formed on the inductively coupled plasma (ICP) etch-damaged both n- and p-type 4H-SiC. We found that there was an effect of a sacrificial oxidation treatment on the etch-damaged surfaces. Current-voltage and capacitance-voltage measurements of these MOS capacitors were used and referenced to those of prepared control samples without etch damage. It has been found that a sacrificial oxidation treatment can improve the electrical characteristics of MOS capacitors on etch-damaged 4H-SiC since the effective interface density and fixed oxide charges of etch-damaged samples have been found to increase while the breakdown field strength of the oxide decreased and the barrier height at the SiC-SiO$_2$ interface decreased for MOS capacitors on etch-damaged surfaces.

furnace 열처리와 질소 플라즈마 처리에 의한 유기화학증착법을 이용한 선택적 구리 증착 (Selective Cu-MOCVD by Furnace Annealing and N$_{2}$ Plasma Pretreatment)

  • 곽성관;정관수
    • 대한전자공학회논문지SD
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    • 제37권3호
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    • pp.27-33
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    • 2000
  • 선택성을 향상시키기 위해서 BPSG(Borophosphosilicate glass) 위에 형성한 TiN 패턴을 로(furnace) 열처리와 질소 플라즈마 처리를 한 후 유기 화학 기상 증착법(MOCVD; Metal Organic Chemical Vapor Deposition)으로 구리 박막을 증착하였다. 먼저 650℃∼750℃에서 열처리한 후 150℃에서 구리 박막을 증착시켰을 때 750℃에서 열처리한 경우 TiN 표면 위에만 선택적으로 구리 증착이 일어났다. 질소 플라즈마 처리를 한 경우도 마찬가지로 BPSG 위에 구리 핵 형성이 억제됨을 알 수 있었다. 플라즈마 처리 온도를 증가시킬수록 BPSG 위의 구리 핵 형성이 더 효과적으로 억제되었다. 열처리와 플라즈마 처리 후 증착된 기판 표면을 TOF-SIMS(Time-of-Flight Secondary Ion Mass Spectrometry)로 분석하였을 때 플라즈마 처리가 BPSG 표면의 구리 증착 작용기인 0-H(hydroxyl)기를 제거하여 구리의 선택성이 향상되었다고 해석하였다.

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플라즈마 용사코팅강재의 피로균열성장에 미치는 감화열처리의 영향 (Effect of Heat Treatment of Fatigue Crack Growth of Plasma-Sprayed Coating Steels)

  • 김귀식;현창해;김영식
    • 동력기계공학회지
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    • 제7권4호
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    • pp.55-60
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    • 2003
  • This paper is to investigate the fatigue crack growth of plasma-sprayed coating steels according to heat treatments. The experimental materials are carbon steels(substrate: S45C) with plasma-sprayed coating layers of Ni-4.5%Al and $TiO_2$. The fatigue test is conducted on compact tension specimen by a servo-hydraulic fatigue testing machine. The specimens are heat-treated at $400^{\circ}C\;and\;800^{\circ}C$, respectively. Loading condition is a constant amplitude sinusoidal wave with a frequency of 10Hz and a load ratio of 0.1. The fatigue crack growth length is automatically measured by a compliance method. In the case of non-heat treated specimens, the fatigue crack growth rates of both substrate and coating specimen are almost same. The crack growth rates of substrates and coating steels by heat treatment are larger than those of the non-heat treated one, because the ductile property increase by heat treatment. In ${\Delta}K<18MPa{\cdot}m^{1/2}$, the crack growth rates of the heat-treated specimens are slightly taster than non-heat treated one. But the both heated and non-heated one are almost same in ${\Delta}K>18MPa{\cdot}m^{1/2}$.

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정상 간세포와 간암세포의 플라즈마 특성에 관한 비교연구 (Comparative study of plasma effects on human liver normal and cancer cells)

  • 김대연;권보미;김단비;최원호;신현정
    • 대한기계학회:학술대회논문집
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    • 대한기계학회 2008년도 추계학술대회A
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    • pp.1539-1542
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    • 2008
  • Plasma is 4th state of matters, which consists of electrons, neutral, and ionized particles. In biomedical research, cold plasma, which is generated in atmospheric condition, has been applied to disinfect microorganisms such as bacteria and yeast cells. Because of its low temperature condition, the heat-sensitive medical device can be easily sterilized by the cold plasma treatment. In recent years, the effects of plasma on mammalian cells have arisen as a new issue. Generally, plasma induces intensity dependent necrotic cell death. In this research, we investigate the feasibility of cold plasma treatment for cancer therapy by conducting comparative study of plasma effects on normal and cancer cells. We use THLE-2 (human liver normal cell) and SK-Hep1 (human liver metathetic cancer cell) as our target cells. The needle type of cold plasma is generated by the Helium plasma device. Two types of cells have different onset plasma conditions for the necrosis, which may be explained by difference in electrical properties of these two cell types.

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