• Title/Summary/Keyword: $CeO_2/ZrO_2$

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Autothermal Reforming Reaction of Methane using Ni-Ru/$Al_2O_3$-MgO Metallic Monolith Catalysts (Ni-Ru/$Al_2O_3$-MgO 금속 모노리스 촉매체를 이용한 메탄의 자열 개질반응)

  • Lee, Chang-Ho;Lee, Tae-Jun;Shin, Jang-Sik;Lee, Jong-Dae
    • Journal of the Korean Applied Science and Technology
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    • v.28 no.3
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    • pp.321-328
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    • 2011
  • The autothermal reforming reaction of methane was investigated to produce hyd rogen with Ni/$CeO_2-ZrO_2$, Ni/$Al_2O_3$-MgO and Ni-Ru/$Al_2O_3$-MgO catalysts. Honeycomb metalli c monolith was applied in order to obtain high catalytic activity and stability in autothermal r eforming. The catalysts were characterized by XRD, BET and SEM. The influence of various catalysts on hydrogen production was studied for the feed ratio($O_2/CH_4$, $H_2O/CH_4$). The $O_2/CH_4$ and $H_2O/CH_4$ ratio governed the methane conversion and temperature profile of reactor. Th e reactor temperature increased as the reaction shifted from endothermic to exothermic reactio n with increasing $O_2/CH_4$ ratio. Among the catalysts used in the experiment, the Ni-Ru/$Al_2O_3$-MgO catalyst showed the highest activity. The 60% of $CH_4$ conversion was obtained, and th e reactor temperature was maintained $600^{\circ}C$ at the condition of GHSV=$10000h^{-1}$ and feed ratio S/C/O=0.5/1/0.5.

Comparative Study on Geochemical Characteristics of Stream Sediments and Mylonitic Granites in the Unbong Area (운봉지역 하상퇴적물과 압쇄상화강암류의 지구화학적 특성 비교연구)

  • Park, Young-Seog;Park, Dae-Woo;Kim, Jong-Kyun;Kim, Sung-Won
    • Economic and Environmental Geology
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    • v.40 no.6
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    • pp.727-738
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    • 2007
  • The present study investigation the geochemical characteristics of the stream sediments in the Unbong area was conducted to enable a understanding the natural background and a prediction the prospects of geochemical disaster as a result of that bed rocks(mylonitic granites, Kim et al., 1992). We systematically collected seventy three stream sediments samples by wet sieving along the primary channels. Major, trace and rare earth element(REE) concentrations, combined with mineralogical characteristics, were determined by XRD, XRF, ICP-AES and NAA analysis methods. Major element concentrations for the stream sediments in the Unbong area were $SiO_2\;36.94{\sim}65.39wt.%,\;Al_2O_3\;10.15{\sim}21.77wt.%,\;Fe_2O_3\;3.17{\sim}10.90wt.%,\;CaO\;0.55{\sim}5.27wt.%,\;MgO\;0.52{\sim}4.94wt.%,\;K_2O\;1.38{\sim}4.54wt.%,\;Na_2O\;0.49{\sim}3.36wt.%,\;TiO_2\;0.39{\sim}1.27wt.%,\;MnO\;0.04{\sim}0.22wt.%,\;P_2O_5\;0.08{\sim}0.54wt.%$. Trace and REE concentrations for the stream sediments were $Cu\;4.8{\sim}134ppm,\;Pb\;24.2{\sim}82.5ppm,\;Sr\;95.9{\sim}739ppm,\;V\;19.9{\sim}124ppm,\;Zr\;52.9{\sim}145ppm,\;Li\;25.2{\sim}3.3ppm,\;Co\;3.87{\sim}50.0ppm,\;Cr\;17.4{\sim}234ppm,\;Hf\;3.93{\sim}25.2ppm,\;Sc\;4.60{\sim}20.6ppm,\;Th\;3.82{\sim}36.9ppm,\;Ce\;45.7{\sim}243ppm,\;Eu\;0.89{\sim}2.69ppm,\;Yb\;1.42{\sim}5.18ppm$. According to the comparison of average major element concentrations, CaO, $Na_2O\;and\;K_2O$ contents are higher in stream sediments than in bed rocks(mylonitic granites, Kim et al., 1992) $Al_2O_3\;and\;SiO_2$ contents show good correlation both stream sediments and bed rocks(mylonitic granites, Kim et al., 1992). Yb and Eu in the stream sediments show a positive correlation with $SiO_2$. In contrast, the stream sediments display a negative correlation.

A Study on the Oxide CMP Characteristics of using Mixed Abrasive Slurry(MAS) (혼합 연마제 슬러리를 이용한 Oxide CMP 특성에 관한 연구)

  • Lee, Sung-Il;Park, Sung-Woo;Lee, Woo-Sun;Seo, Yong-Jin
    • Proceedings of the KIEE Conference
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    • 2006.07a
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    • pp.601-602
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    • 2006
  • Chemical mechanical polishing (CMP) technology has been widely used for global planarization of multi-level interconnection for ULSI applications. However, the cost of ownership and cost of consumables are relatively high because of expensive slurry. In this paper, we studied the mixed abrasive slurry(MAS). In order to save the costs of slurry, the original silica slurry was diluted by de-ionized water (DIW). And then, $ZrO_2$,$CeO_2$, and $MnO_2$ abrasives were added in the diluted slurry in order to promote the mechanical force of diluted slurry. We have also investigate the possibility of mixed abrasive slurry for the oxide CMP application.

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Effects of Silica Slurry Dispersion and pH on the Oxide CMP (슬러리 분산 및 pH가 Oxide CMP에 미치는 영향)

  • Han, Sung-Min;Park, Sung-Woo;Lee, Woo-Sun;Seo, Yong-Jin
    • Proceedings of the KIEE Conference
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    • 2006.07a
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    • pp.605-606
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    • 2006
  • CMP(chemical mechanical polishing) process has been attracted as an essential technology of multi-level interconnection. However, the COO(cost of ownership) is very high, because of high consumable cost. Especially, among the consumables, slurry dominates more than 40 %. So, we focused how to reduce the consumption of raw slurry. In this paper, $ZrO_2$,$CeO_2$, and $MnO_2$ abrasives were added de-ionized water (DIW) and pH control as a function of KOH contents. We have investigate the possibility of new abrasive for the oxide CMP application.

  • PDF

A Study on the Oxide CMP Characteristics of using Mixed Abrasive Slurry(MAS) (혼합 연마제 슬러리를 이용한 Oxide CMP 특성에 관한 연구)

  • Lee, Sung-Il;Park, Sung-Woo;Lee, Woo-Sun;Seo, Yong-Jin
    • Proceedings of the KIEE Conference
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    • 2006.07d
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    • pp.2233-2234
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    • 2006
  • Chemical mechanical polishing (CMP) technology has been widely used for global planarization of multi-level interconnection for ULSI applications. However, the cost of ownership and cost of consumables are relatively high because of expensive slurry. In this paper, we studied the mixed abrasive slurry(MAS). In order to save the costs of slurry, the original silica slurry was diluted by de-ionized water (DIW). And then, $ZrO_2$, $CeO_2$,and $MnO_2$ abrasives were added in the diluted slurry in order to promote the mechanical force of diluted slurry. We have also investigate the possibility of mixed abrasive slurry for the oxide CMP application.

  • PDF

A Study on the Oxide CMP Characteristics of using Mixed Abrasive Slurry(MAS) (혼합 연마제 슬러리를 이용한 Oxide CMP 특성에 관한 연구)

  • Lee, Sung-Il;Park, Sung-Woo;Lee, Woo-Sun;Seo, Yong-Jin
    • Proceedings of the KIEE Conference
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    • 2006.07d
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    • pp.2235-2236
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    • 2006
  • Chemical mechanical polishing (CMP) technology has been widely used for global planarization of multi-level interconnection for ULSI applications. However, the cost of ownership and cost of consumables are relatively high because of expensive slurry. In this paper, we studied the mixed abrasive slurry(MAS). In order to save the costs of slurry, the original silica slurry was diluted by de-ionized water (DIW). And then, $ZrO_2$, $CeO_2$,and $MnO_2$ abrasives were added in the diluted slurry in order to promote the mechanical force of diluted slurry. We have also investigate the possibility of mixed abrasive slurry for the oxide CMP application.

  • PDF

Effects of Silica Slurry Dispersion and pH on the Oxide CMP (슬러리 분산 및 pH가 Oxide CMP에 미치는 영향)

  • Han, Sung-Min;Park, Sung-Woo;Lee, Woo-Sun;Seo, Yong-Jin
    • Proceedings of the KIEE Conference
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    • 2006.07d
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    • pp.2237-2238
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    • 2006
  • CMP(chemical mechanical polishing) process has been attracted as an essential technology of multi-level interconnection. However, the COO(cost of ownership) is very high, because of high consumable cost. Especially, among the consumables, slurry dominates more than 40 %. So, we focused how to reduce the consumption of raw slurry. In this paper, $ZrO_2$, $CeO_2$, and $MnO_2$ abrasives were added de-ionized water (DIW) and pH control as a function of KOH contents. We have investigate the possibility of new abrasive for the oxide CMP application.

  • PDF

A study on the Oxide CMP Characteristics using New Abrasive (새로운 연마제를 이용한 Oxide CMP 특성에 관한 연구)

  • Han, Sung-Min;Han, Sang-Jun;Park, Sung-Woo;Lee, Woo-Sun;Seo, Yong-Jin
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2006.11a
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    • pp.378-379
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    • 2006
  • CMP(chemical mechanical polishing) process has been attracted as an essential technology of multi-level interconnection. However, the COO(cost of ownership) is very high, because of high consumable cost. Especially, among the consumables, slurry dominates more than 40 %. So, we focused how to reduce the consumption of raw slurry. In this paper, $ZrO_2$, $CeO_2$, and $MnO_2$ abrasives were added de-ionized water (DIW) and pH control as a function of KOH contents. We have investigate the possibility of new abrasive for the oxide CMP application.

  • PDF

A Study on the Oxide CMP Characteristics of using Mixed Abrasive Slurry(MAS) (혼합 연마제 슬러리를 이용한 Oxide CMP 특성에 관한 연구)

  • Lee, Sung-Il;Park, Sung-Woo;Lee, Woo-Sun;Seo, Yong-Jin
    • Proceedings of the KIEE Conference
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    • 2006.07b
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    • pp.1267-1268
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    • 2006
  • Chemical mechanical polishing (CMP) technology has been widely used for global planarization of multi-level interconnection for ULSI applications. However, the cost of ownership and cost of consumables are relatively high because of expensive slurry. In this paper, we studied the mixed abrasive slurry (MAS). In order to save the costs of slurry, the original silica slurry was diluted by do-ionized water (DIW). And then, $ZrO_2,CeO_2$, and $MnO_2$ abrasives were added in the diluted slurry in order to promote the mechanical force of diluted slurry. We have also investigate the possibility of mixed abrasive slurry for the oxide CMP application.

  • PDF

Effects of Silica Slurry Dispersion and pH on the Oxide CMP (슬러리 분산 및 pH가 Oxide CMP에 미치는 영향)

  • Han, Sung-Min;Park, Sung-Woo;Lee, Woo-Sun;Seo, Yong-Jin
    • Proceedings of the KIEE Conference
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    • 2006.07b
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    • pp.1271-1272
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    • 2006
  • CMP(chemical mechanical polishing) process has been attracted as an essential technology of multi-level interconnection. However, the COO(cost of ownership) is very high, because of high consumable cost. Especially, among the consumables, slurry dominates more than 40%. So, we focused how to reduce the consumption of raw slurry. In this paper, $ZrO_2$, $CeO_2$, and $MnO_2$ abrasives were added de-ionized water (DIW) and pH control as a function of KOH contents. We have investigate the possibility of new abrasive for the oxide CMP application.

  • PDF