• 제목/요약/키워드: $C_2H_4$

검색결과 17,969건 처리시간 0.048초

Kinetics and Stereochemistry of CO Substitution Reactions of Half-Open Chromocene Carbonyls(Ⅱ) : Reactions of Cp$(\eta^{5}-2,4-Me_{2}C_{5}H_{5})$CrCO and Phosphines

  • Chung, Jong-Jae;Roh, Byung-Gill
    • Bulletin of the Korean Chemical Society
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    • 제14권6호
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    • pp.669-673
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    • 1993
  • The CO substitution reactions of the complex, $Cp(S-2,4-Me_2C_5H_5)CrCo$ with $PR_3(PR_3=PMePh_2,\;P(OCH_3)_3,\;PMe_2Ph)$ were investigated spectrophotometrically at various temperatures. From the reaction rates, it was suggested that the CO substitution reaction took place by first-order (dissociative) pathway. Activation parameters in decaline were ${\Delta}H^{\neq}\;=\;22.0\;kcal{\cdot}mol^{-1}$, ${\Delta}S^{\neq}=\;-3.8cal{\cdot}mol^{-1}{\cdot}K^{-1}$. Unusually low value of ${\Delta}S{\neq}$ suggests an ${\eta}^5-S{\to}{\eta}^5-U$ conversion of the pentadienyl ligand. This suggestion was confirmed by the Extended-Huckel molecular orbital (EHMO) calculations, which revealed that the total energy of $Cp(S-2,4-Me_2C_5H_5$)CrCO is about 0.42 kcal/mol more lower than that of $Cp(U-2,4-Me_2C_5H_5)CrCO$ and the energy of $[Cp(U-2,4-Me_2C_5H_5)Cr{\cdots}CO]^{\neq} $ transition state is about 2.43 kcal/mol lower than that of $[Cp(S-2,4-Me_2C_5H_5)Cr{\cdots}CO]^{\neq}$ transition state.

Electrical Characteristics of SiO2/4H-SiC Metal-oxide-semiconductor Capacitors with Low-temperature Atomic Layer Deposited SiO2

  • Jo, Yoo Jin;Moon, Jeong Hyun;Seok, Ogyun;Bahng, Wook;Park, Tae Joo;Ha, Min-Woo
    • JSTS:Journal of Semiconductor Technology and Science
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    • 제17권2호
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    • pp.265-270
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    • 2017
  • 4H-SiC has attracted attention for high-power and high-temperature metal-oxide-semiconductor field-effect transistors (MOSFETs) for industrial and automotive applications. The gate oxide in the 4H-SiC MOS system is important for switching operations. Above $1000^{\circ}C$, thermal oxidation initiates $SiO_2$ layer formation on SiC; this is one advantage of 4H-SiC compared with other wide band-gap materials. However, if post-deposition annealing is not applied, thermally grown $SiO_2$ on 4H-SiC is limited by high oxide charges due to carbon clusters at the $SiC/SiO_2$ interface and near-interface states in $SiO_2$; this can be resolved via low-temperature deposition. In this study, low-temperature $SiO_2$ deposition on a Si substrate was optimized for $SiO_2/4H-SiC$ MOS capacitor fabrication; oxide formation proceeded without the need for post-deposition annealing. The $SiO_2/4H-SiC$ MOS capacitor samples demonstrated stable capacitance-voltage (C-V) characteristics, low voltage hysteresis, and a high breakdown field. Optimization of the treatment process is expected to further decrease the effective oxide charge density.

Reactions, Hydrogenation and Isomerization of Unsaturated Esters with a Rhodium(I)-Perchlorato Complex

  • Jeong Hyun Mok;Chin Chong Shik
    • Bulletin of the Korean Chemical Society
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    • 제7권6호
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    • pp.468-471
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    • 1986
  • The isolated products from the reactions of $Rh(ClO_4)(CO)(PPh_3)_2$ (1) with CH_2$ = $CHCO_2C_2H_5$ (2) and trans-$CH_3CH$ = $CHCO_2C_2H_5$ (3) contain 80∼ 90% of $[Rh(CH_2 = CHCO_2C_2H_5)(CO)(PPh_3)_2]ClO_4$ (4) and [Rh(trans-$CH_3CH = CHCO_2C_2H_5(CO)(PPh_3)_2]ClO_4$ (5), respectively where 2 and 3 seem to be coordinated through the carbonyl oxygen. It has been found that complex 1 catalyzes the isomerization of $CH_2 = CH(CH_2)_8CO_2C_2H_5$ (6) to $CH_3(CH_2)_nCH = CH(CH_2)_{7-n}CO_2C_2H_5$ (n = 0∼7) under nitrogen at 25$^{\circ}C$. The isomerization of 6 is slower than that of $CH_2 = CH(CH_2)_9CH_3$ to $CH_3(CH_2)_nCH$ = $CH(CH_2)_{8-n}CH_3$ (n = 0∼8), which is understood in terms of the interactions between the carbonyl oxygen of 6 and the catalyst. It has been also observed that complex 1 catalyzes the hydrogenation of 2, 3, 6, trans-$C_6H_5CH = CHCO_2C_2H_5$ (7), $CH_3(CH_2)_7CH = CH(CH_2)_7CO_2C_2H_5$ (8) and $CH_2 = CH(CH_2)_9CH_3$ (9), and the isomerization (double bond migration) of 6 and 9 under hydrogen at 25$^{\circ}C$. The interactions between the carbonyl oxygen of the unsaturated esters and the catalyst affect the hydrogenation in such a way that the hydrogenation of the unsaturated esters becomes slower than that of simple olefins.

$N_2/CH_4$가스비에 따른 Hydrogenated Amorphous Carbon Nitride 박막의 특성 (Hydrogeneted Amorphous Carbon Nitride Films on Si(100) Deposited by DC Saddle Field Plasma Enhanced Chemical Vapor Deposition)

  • 장홍규;김근식;황보상우;이연승;황정남;유영조;김효근
    • 한국진공학회지
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    • 제7권3호
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    • pp.242-247
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    • 1998
  • DC saddle-field-plasma-enhanced chemical-vapor deposition(PECVD) 장치를 이용 하여 상온에서 p-type Si(100)기판위에 hydrogenated amorphous carbon nitride [a-C:H(N)] 박막을 증착하였다. 원료가스인 $CH_4$$N_2$의 전체압력은 90mTorr로 고정하고 $N_2/CH_4$비를 0 에서 4까지 변화하면서 제작한 a-C:H(N)박막의 미세구조의 변화를 연구하였다. 진공조의 도달 진공도는 $1\times10^{-6}$Torr이고, 본 실험시 $N_2+CH_4$가스의 유량은 5sccm으로 고정하고 배 기량을 조절하여 진공조의 가스 압력을 90mTorr로 고정하였으며 기판에 200V의 직류 bias 전압을 인가하였다. $\alpha$-step과 X-ray photoelectron spectroscopy(XPS)를 이용한 분석결과 $N_2/CH_4$비가 0에서 0.5로 증가함에 따라 박막 두께는 4840$\AA$에서 2600$\AA$으로 급격히 감소하 였으며, 박막내의 탄소에 대한 질소함유량(N/C비)는 N2/CH4비가 4일 때 최대 0.25로 증가하 는 것을 확인하였다. 또한 XPS 스펙트럼의 fitting 결과 $N_2/CH_4$비가 증가할수록 CN결합이 증가하였다. Fourier Transformation Infrared(FT-IR) 분석결과 $N_2/CH_4$비가 증가함에 따라 박막내의 C-H결합은 감소하고, N-H, C≡N결합은 증가하였다. Optical bandgap 측정 결과 $N_2/CH_4$비가 0에서 4로 증가함에 따라 a-C:H(N)박막의 bandgap 에너지는 2.53eV에서 2.3eV 로 감소하는 것을 확인하였다.

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Synthesis of ArOTiCl3 complexes and their application for ethylene polymerization and copolymerization

  • Wang, Jianwei;Ren, Yingchun;Xu, Sheng;Mi, Puke
    • Advances in materials Research
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    • 제6권3호
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    • pp.303-316
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    • 2017
  • In this article, novel olefin polymerization catalyst with lower cost and simple synthetic process were developed, $ArOTiCl_3$ complexes [$(2-OMeC_6H_4O)TiCl_3(C1)$, $(2,4-Me_2C_6H_3O)TiCl_3(C2)$, $TiCl_3(1,4-OC_6H_4O)TiCl_3(C3)$, $TiCl_3(1,4-OC_6H_2O-Me_2-2,5)$ $TiCl_3(C4)$] and corresponding $(ArO)_2TiCl_2$ complexes [$TiCl_2(OC_6H_4-OMe-2)_2(C5)$ and $TiCl_2(OC_6H_3-Me_2-2,6)_2(C6)$] have been synthesized by the reaction of $TiCl_4$ with phenol, all these complexes were well characterized with $^1H$ NMR, $^{13}C$ NMR, MASS and EA. When combined with methylaluminoxane (MAO), the $ArOTiCl_3/MAO$ system shows high activity for ethylene copolymerization with 1-octene and copolymer was obtained with broaden molecular weight distribution (MWD). The $^{13}C$ NMR result of polymer indicates that the 1-octene incorporation in polymer reached up to 8.29 mol%. The effects of polymerization temperature, concentration of polymerization monomer and polymerization time on the catalytic activity have been investigated.

화합물내에서의 수소원자의 이상적 위치계산 (Calculation of the Ideal Positions of Hydrogen Atoms in Compounds)

  • 서일환;김경한;오미란;박균하;김문집
    • 한국결정학회지
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    • 제8권1호
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    • pp.59-63
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    • 1997
  • 화합물내에 존재하는 다음 7가지 수소원자의 이상적인 위치들의 한가지 계산법을 보였다. (1) 3급 C-H, (2) 2급 C-H, (3) 1급 C-H, (4) 방향환 C-H와 N-H, (5) 수산기 O-H, (6) 말단평면내의 2개의 수소 (7) 선형인 X-C-H를 갖는 아세틸렌 C-H.

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새로운 H-자형 이메소겐 화합물의 액정특성에 치환기가 미치는 효과 (The Effect of Substituents on the Liquid Crystalline Behavior of New H-Shaped Dimesogenic Conpounds)

  • 박주훈;진정일
    • 대한화학회지
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    • 제42권3호
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    • pp.315-322
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    • 1998
  • 새로운 에메소겐 액정화합물들을 합성하였고, 이들의 열적 및 액정 성질을 DSC와 가열판이 부착된 편광현미경을 사용하여 조사하였다. 이 화합물들 즉, 1,10-bis[2,5-bis(4-substitutedphenoxycarbonyl)phenoxy]decane은 "H-자형" 이합체 대칭화합물의 구조로 중앙의 테페프탈로일 단위에 oxydecamethyleneoxy 격자를 통하여 상호 연결된 두 개의 bis(p-substitutedphenoxy)terephthalate 단위로 이루어졌다. 메소겐의 치환기는 X=-F, -H, -I, -Cl, -Br, $-NO_2,\;-CF_3,\;-OC_4H_9-CN$$-C_6H_5$를 바꾸어 보았다. $X=-OC_4H_9-CN$$C_6H_5$ 화합물은 단방성 네마틱액정이었으며 이에 비하여 X=-F, -H, -I, -Cl, -Br, $-NO_2$$-CH_3$는 액정이 아니었다. 이 화합물들의 네마틱 그룹 효율은 $-C_6H_5>-CN>-OC_4H_9$ 순이었다.

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높은 온도에서 Urea와 금속이온과의 반응으로 얻어진 금속 Complexes의 합성과 분광학적 연구 (Synthesis and Spectroscopic Studies of Metal Complexes Formed in the Reaction of Metal Ions with Urea at High Temperature)

  • Gaballa, Akmal S.;Teleb, Said M.;Nour, El-Metwally
    • 대한화학회지
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    • 제51권4호
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    • pp.339-345
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    • 2007
  • Urea는 높은 온도(60~80 °C)의 수용액 상태에서 PtCl2, H2[PtCl6]·6H2O, H2[IrCl6] Ni(CH3CO2)2 와 반응해서 각각 (1)[PtCl2(Urea)]·2H2O, (2)(NH4)2[PtCl6], (3)(NH4)2[IrCl6]·H2O, (4)[Ni2(OH)2(NCO)2(H2O)2]의 complexes를 생성 한다. complexe 1에서 urea는 중성 bidentate 리간드로써 Pt(II)와 배위한다. complexe 2,3,4에서는 높은 온도에서 반 응하는 동안 배위 urea분자들이 분해되고 다양한 반응생성물들을 얻을 수 있다. 모든 complexes은 각각 적당한 수득률 로 dark green(1) yellow(2), pale brown (3) faint green(4)의 침전물로 분리된다. 반응생성물은 열분석, IR, 1H and 13C NMR spectra에 의해 측정 되었다. 이 complexes의 구성을 설명하는 일반적인 매카니즘이 제시되었다.

Evidence for Nitrogen-Bonded Acrylonitrile to Iridium (Ⅰ) in Acrylonitrilecarbonylbis(triphenylphosphine)iridium (Ⅰ) perchlorate

  • Park, Soon-Heum;Park, Hwa-Kun;Chin, Chong-Shik
    • Bulletin of the Korean Chemical Society
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    • 제5권4호
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    • pp.167-169
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    • 1984
  • Analyses of $_1$H-NMR, infrared and electronic spectral data for $[Ir(CH_2 = CHCN)(CO)(P(C_6H_5)_3)_2]ClO_4 (1)$prepared by the reaction of $Ir(OClO_3)(CO)(P(C_6H_5)_3)_2$ with $CH_2 = CHCN$, agree with the suggestion that 1 is a mixture of the nitrogen-bonded acrylonitrile complex, $[(CO)(P(C_6H_5)_3)_2Ir-NCCH = CH_2]ClO_4$ and other compound which may be the C = C ${\Pi}$ -system-bonded acrylonitrile complex, "[(CO)(P(C6H5)3)2Ir-CHCN = CH2]ClO4.

Coated $Si_3N_4$-TiC Ceramic 공구의 마모 특성 (Wear Characteristics of Coated $Si_3N_4$-TiC Ceramic Tool)

  • 김동원;권오관;이준근;천성순
    • Tribology and Lubricants
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    • 제4권2호
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    • pp.44-51
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    • 1988
  • Titanium carbide(TiC), Titanium nitride(TiN), and Titanium carbonnitride(Ti(C,N)) films were deposited on $Si_3N_4$-TiC composite cutting tools by chemical vapor deposition(CVD) using $TiCl_4-CH_4-H_2$, $TiCl_4-N_2-H_2$, and $TiCl_4-CH_4-N_2-H_2$ gas mixtures, respectively. The experimental results indicate that TiC coatings compared with TiN coatings on $Si_3N_4$ -TiC ceramic have an improved microstructural property, good thermal shock resistance, and good interfacial bonding. However TiN coatings compared with TiC coatings have a low friction coefficient with steel and good chemical stability. It is found by cutting test that coated insert compared with $Si_3N_4$-TiC ceramic have a superior flank and crater wear resistance. And multilayer coating compared with monolayer coating shows a improved wear resistance.