• 한국연소학회:학술대회논문집
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• 대한연소학회 2003년도 제27회 KOSCO SYMPOSIUM 논문집
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• pp.209-214
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• 2003

Numerical simulations are performed at atmospheric pressure in order to understand the effect of additives on flame speed, flame temperature, the radical concentration, the NOx formation in freely propagating $CH_4/O_2/N_2$ flames. The additives used are carbon dioxide and hydrogen chloride which have a combination of physical and chemical behavior on hydrocarbon flame. In the flame established with the same mole of methane and additive, $CO_2$ addition significantly contributes toward the reduction of flame speed and flame temperature by the physical effect, whereas addition of HCl mainly does by the chemical effect. The impact of HCl addition on the decrease of the radical concentration is about 1.6-1.8 times as large as $CO_2$ addition. Hydrogen chloride addition is higher on the reduction of EINO than $CO_2$ addition because of the chemical effect of HCl.

• 대한화학회지
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• 제36권1호
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• pp.81-86
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• 1992

M(S-S,ph)(N-N,H) (M = Ni(II), Pd(II), Pt(II); (S-S,ph) = 1,2-diphenylethylenedithiolate; (N-N,H)=1,10-phenanthroline) 착물의 친전자성 및 친핵성 리간드 반응을 조사하였다. norbornadiene과의 반응성은 중심금속의 역결합의 정도에 의존하며 2,5-dithia-3,4-diphenyl-tricyclo[4,4,1,0]-undeca-3,8-diene을 생성하였다. methyl iodide와의 반응은 (N-N,H) 리간드의 이탈 능력에 지배되며 메틸화된 $M(S-S,ph)_2$ 착물을 생성하였다. 이 반응의 주생성무리은 열 분해에 의해 얻어진 ${\alpha},{\alpha}{\prime}$,-bismethylthiostibene $(CH_3S-SCH_3,ph)$의 구조로부터 M(S-S,CN)(N-N,H)((S-S,CN) = 1,2-dicyanoethylenedithiolate)의 새로운 혼합 리간드 착물을 합성하였다.

• 한국표면공학회지
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• 제39권3호
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• pp.137-141
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• 2006

Process window for infinite etch selectivity of silicon nitride $(Si_3N_4)$ layers to ArF photoresist (PR) was investigated in dual frequency superimposed capacitive coupled plasma (DFS-CCP) by varying the process parameters such as low frequency power $(P_{LF})$, $CH_2F_2$ and $H_2$ flow rate in $CH_2F_2/H_2/Ar$ plasma. It was found that infinite etch selectivities of $Si_3N_4$ layers to the ArF PR on both blanket and patterned wafers can be obtained for certain gas flow conditions. The etch selectivity was increased to the infinite values as the $CH_2F_2$ flow rate increases, while it was decreased from the infinite etch selectivity as the $H_2$ flow rate increased. The preferential chemical reaction of the hydrogen with the carbon in the polymer film and the nitrogen on the $Si_3N_4$ surface leading to the formation of HCN etch by-products results in a thinner steady-state polymer and, in turn, to continuous $Si_3N_4$ etching, due to enhanced $SiF_4$ formation, while the polymer was deposited on the ArF photoresist surface.

• 폴리머
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• 제27권6호
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• pp.528-535
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• 2003

불소계 섬유용 발수$.$발유제의 제조에 일반적으로 쓰이는 과불소알킬아크릴레이트 및 노말알킬아크릴레이트의 공중합체를 유화 중합법으로 제조할 시 계면활성제, 유기용매, 내구성 향상 목적으로 소량 첨가되는 기능성 단량체 및 공중합체의 결정 용융 온도 (T$_{m}$ )변화에 따른 고분자 라텍스의 입자 직경 변화와 그들의 표면 특성 (접촉각 및 발수도)의 변화를 관찰하였다 또한 WAXD 실험을 통해 공중합체의 T$_{m}$ 의 변화에 따른 공중합체의 곁사슬의 채움구조 변화를 조사하였으며 이를 통해 표면 특성과의 관계를 연구하였다. 그리고 과불소알킬아크릴레이트와 더불어 말단기가 약간 다른 불소아크릴레이트, [CH$_2$= CH$CO_2$CH$_2$(CF$_2$CF$_2$)nH] (n=4,5,6)를 사용한 불소아크릴레이트 공중합체도 동시에 합성하여 공중합체의 곁사슬의 채움구조, 말단기($CH_3$-,CF$_3$-,CHIF$_2$-)의 종류 및 농도변화에 따른 표면 특성 (접촉각, 발수도 등)의 변화를 관찰하였다.

• 분석과학
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• 제19권2호
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• pp.131-141
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• 2006

새로운 산소-질소($N_2O_2$)계 네 자리 리간드 N,N'-bis(2-hydroxybenzyl)-ethylenediamine($H-BHE{\cdot}2HBr$)의 브롬산염을 합성하였다. 또한 $H-BHE{\cdot}2HBr$의 페놀기 5-위치에 치환기로 브롬, 염소, 메틸기 및 메톡시기를 가진 $Br-BHE{\cdot}2HBr$, $Cl-BHE{\cdot}2HBr$, $CH_3-BHE{\cdot}2HBr$ 및 $CH_3O-BHE{\cdot}2HBr$을 합성하였다. 그리고 페놀기 대신에 naphthalen-2-ol을 가진 $Nap-BHE{\cdot}2HBr$도 합성하였다. 합성된 리간드들의 양성자 해리는 수용액에서 전위차 적정한 결과 4 단계로 일어났으며, 계산된 각 리간드의 총괄 양성자 해리상수(${\log}{\beta}_p$) 값은 Br-BHE < Cl-BHE < H-BHE < Nap-BHE < $CH_3$-BHE < $CH_3O$-BHE의 순서로 Hammett 상수(${\sigma}_P$) 값의 순서와 비교적 같은 경향을 나타내었다. 전이금속(II) 이온들의 착물의 안정도상수(${\log}K_{ML}$) 값의 크기는 Co(II) < Ni(II) < Cu(II) > Zn(II) > Cd(II) > Pb(II)의 순서이었다. 또한 각 리간드들의 전이금속(II) 이온들의 착물 안정도상수(${\log}K_{ML}$) 값들의 크기 순서도 리간드의 총괄 양성자 해리상수(${\log}{\beta}_p$) 값과 서로 잘 일치하였다.

• 한국연소학회:학술대회논문집
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• 한국연소학회 2000년도 제21회 KOSCO SYMPOSIUM 논문집
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• pp.77-82
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• 2000

Numerical simulations of freely propagating flames burning stoichiometric $CH_4$/$O_2$/$N_2$ mixtures are performed at atmospheric pressure in order to understand the effect of the $O_2$ enrichment level on $CH_4$/Air flame. A chemical kinetic mechanism is employed, the adopted scheme involving 54 gas-phase species and 632 forward reactions. The calculated flame. speeds are compared with the experiments for the flames established at several $O_2$ enrichment level, the results of which is in excellent agreement. As a result of the increased $O_2$ enrichment level from 0.21 to 1, the mole fraction of CO in the burned gas is increased. The flame speed and the temperature in the burned gas are also increased, but the thickness of the flame is severely shrunken in the preheat region.

• 한국표면공학회:학술대회논문집
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• 한국표면공학회 2009년도 춘계학술대회 논문집
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• pp.250-251
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• 2009

For the fabrication of a multilevel resist (MLR) based on a very thin amorphous carbon (a-C) layer an $Si_{3}N_{4}$ hard-mask layer, the selective etching of the $Si_{3}N_{4}$ layer using physical-vapor-deposited (PVD) a-C mask was investigated in a dual-frequency superimposed capacitively coupled plasma etcher by varying the following process parameters in $CH_{2}F_{2}/H_{2}/Ar$ plasmas : HF/LF powr ratio ($P_{HF}/P_{LF}$), and $CH_{2}F_{2}$ and $H_2$ flow rates. It was found that infinitely high etch selectivities of the $Si_{3}N_{4}$ layers to the PVD a-C on both the blanket and patterned wafers could be obtained for certain gas flow conditions. The $H_2$ and $CH_{2}F_{2}$ flow ratio was found to play a critical role in determining the process window for infinite $Si_{3}N_{4}$/PVDa-C etch selectivity, due to the change in the degree of polymerization. Etching of ArF PR/BARC/$SiO_x$/PVDa-C/$Si_{3}N_{4}$ MLR structure supported the possibility of using a very thin PVD a-C layer as an etch-mask layer for the $Si_{3}N_{4}$ layer.

• 한국연소학회지
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• 제8권2호
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• pp.1-6
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• 2003

Numerical simulations are conducted at atmospheric pressure in order to understand the effect of the oxygen enrichment level on structure of $CH_4/O_2/N_2$ premixed flames. Under several equivalence ratios the flame speeds are calculated and compared with those obtained from the experiments, the results of which are in good agreement. The effects of the oxygen enrichment are investigated on flames under fuel-rich conditions. As the oxygen enrichment level is increased from 0.21 to 1, the flame speed and the temperature are increased. The emission index of $CO_2$ is decreased in cases of flames for fuel rich mixtures, so the efficiency of combustion may be decreased. The maximum emission index of NO is obtained for 0.6 of the oxygen enrichment level.

• 한국전기전자재료학회논문지
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• 제25권12호
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• pp.974-978
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• 2012

The effect of Cu coating on the sensing properties of nano $SnO_2:Cu$ based sensors for the $CH_4$, $CH_3CH_2CH_3$ gas was studied. This work was focussed on investigating the change of sensitivity of nano $SnO_2:Cu$ based sensors for $CH_4$, $CH_3CH_2CH_3$ gas by Cu coating. Nano sized $SnO_2$ powders were prepared by solution reduction method using stannous chloride($SnCl_2{\cdot}2H_2O$), hydrazine($N_2H_2$) and NaOH and subsequent heat treatment. XRD patterns showed that nano $SnO_2$ powders with rutile structure were grown with (110), (101), (211) dominant peak. The particle size of nano $SnO_2:Cu$ powders at 8 wt% Cu was about 50 nm. $SnO_2$ particles were found to contain many pores, according to SEM analysis. The sensitivity of nano $SnO_2:Cu$ based sensors was measured for 5 ppm $CH_4$ gas and $CH_3CH_2CH_3$ gas at room temperature by comparing the resistance in air with that in target gases. The sensitivity for both $CH_4$ and $CH_3CH_2CH_3$ gases was improved by Cu coating on the nano $SnO_2$ surface. The response time and recovery time of the $SnO_2:Cu$ gas sensors for the $CH_4$ and $CH_3CH_2CH_3$ gases were 18~20 seconds, and 13~15 seconds, respectively.

• 한국대기환경학회지
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• 제29권2호
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• pp.171-185
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• 2013

Wetland has been known as a major biogenic source of $CH_4$ in globe. In a global scale, the amounts of 55~150 Tg $CH_4$ are released into the atmosphere annually from wetlands; and it accounts for about 21% of total $CH_4$ annual global emission. From August 2010 to August 2011, measurements of major greenhouse gas ($CO_2$, $CH_4$, $N_2O$) emissions were conducted from a freshwater wetland at Kunsan ($35^{\circ}56^{\prime}38.94^{\prime\prime}N$, $126^{\circ}43^{\prime}16.62^{\prime\prime}E$), Korea by using floating closed static chamber method. Flux measurements for these gases from western coastal tidal flat at Seocheon ($36^{\circ}07^{\prime}13.85^{\prime\prime}N$, $126^{\circ}35^{\prime}43.18^{\prime\prime}E$), Korea were managed from July 2011 to February 2012 by using closed static chamber method. The average gas fluxes and ranges from freshwater wetland experiment were $0.155{\pm}0.29\;mg\;m^{-2}\;hr^{-1}$ (-0.054~0.942 $mg\;m^{-2}\;hr^{-1}$) for $CH_4$, $17.30{\pm}73.27\;mg\;m^{-2}\;hr^{-1}$ (-52.44~261.66 $mg\;m^{-2}\;hr^{-1}$) for $CO_2$, and $0.004{\pm}0.01\;mg\;m^{-2}\;hr^{-1}$ (-0.02~0.07 $mg\;m^{-2}\;hr^{-1}$) for $N_2O$, respectively. Monthly base flux measurement results revealed that $CH_4$ fluxes during summer months in high water temperature were significantly high, and at least order of one higher than those during other months. The average fluxes and ranges of these greenhouse gases from tidal flat during the experimental period were $0.002{\pm}0.08\;mg\;m^{-2}\;hr^{-1}$ (-0.16~0.22 $mg\;m^{-2}\;hr^{-1}$) for $CH_4$, $-31.18{\pm}75.33\;mg\;m^{-2}\;hr^{-1}$ (-298.87~101.93 $mg\;m^{-2}\;hr^{-1}$) for $CO_2$, and $0.001{\pm}0.01\;mg\;m^{-2}\;hr^{-1}$ (-0.017~0.03 $mg\;m^{-2}\;hr^{-1}$) for $N_2O$, respectively. Comparing the results of gas emissions from tidal flat to those from freshwater wetland, we found significantly lower emissions from tidal flat based on the experiment. Physicochemical parameters of water and soil at these experimental plots were also sampled and analyzed for understanding their correlation with these gas emissions.