• 한국연소학회:학술대회논문집
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• 2003.12a
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• pp.209-214
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• 2003

Numerical simulations are performed at atmospheric pressure in order to understand the effect of additives on flame speed, flame temperature, the radical concentration, the NOx formation in freely propagating $CH_4/O_2/N_2$ flames. The additives used are carbon dioxide and hydrogen chloride which have a combination of physical and chemical behavior on hydrocarbon flame. In the flame established with the same mole of methane and additive, $CO_2$ addition significantly contributes toward the reduction of flame speed and flame temperature by the physical effect, whereas addition of HCl mainly does by the chemical effect. The impact of HCl addition on the decrease of the radical concentration is about 1.6-1.8 times as large as $CO_2$ addition. Hydrogen chloride addition is higher on the reduction of EINO than $CO_2$ addition because of the chemical effect of HCl.

• Journal of the Korean Chemical Society
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• v.36 no.1
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• pp.81-86
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• 1992

The electrophilic and nucleophilic reactions of M(S-S,ph)(N-N,H) (M = Ni(II), Pd(II), Pt(II); (S-S,ph) = 1,2-diphenylethylenedithiolate; (N-N,H)=1,10-phenanthroline) complexes have been investigated. Reaction with norbornadiene depended upon the back donating ability of the central metal ion and produced 2,5-dithia-3,4-diphenyl-tricyclo[4,4,1,0]-undeca-3,8-diene. In the reaction with methyl iodide, the effect of cleavage of (N-N,H) ligand affected the yield of methylated $M(S-S,ph)_2$ product. The structure of the thermolysis product, ${\alpha},{\alpha}{\prime}$-bismethylthiostibene $(CH_3S-SCH_3,ph)$ of methylated complexes indicates that the main product of the nucleophilic reaction is $M(CH_3S-SCH_3,ph)(S-S,ph)$. We have synthesized a new mixed-ligand complex M(S-S,CN)(N-N,H)((S-S,CN) = 1,2-dicyanoethylenedithiolate) through the nucleophilic reaction of ligand.

• Journal of the Korean institute of surface engineering
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• v.39 no.3
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• pp.137-141
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• 2006

Process window for infinite etch selectivity of silicon nitride $(Si_3N_4)$ layers to ArF photoresist (PR) was investigated in dual frequency superimposed capacitive coupled plasma (DFS-CCP) by varying the process parameters such as low frequency power $(P_{LF})$, $CH_2F_2$ and $H_2$ flow rate in $CH_2F_2/H_2/Ar$ plasma. It was found that infinite etch selectivities of $Si_3N_4$ layers to the ArF PR on both blanket and patterned wafers can be obtained for certain gas flow conditions. The etch selectivity was increased to the infinite values as the $CH_2F_2$ flow rate increases, while it was decreased from the infinite etch selectivity as the $H_2$ flow rate increased. The preferential chemical reaction of the hydrogen with the carbon in the polymer film and the nitrogen on the $Si_3N_4$ surface leading to the formation of HCN etch by-products results in a thinner steady-state polymer and, in turn, to continuous $Si_3N_4$ etching, due to enhanced $SiF_4$ formation, while the polymer was deposited on the ArF photoresist surface.

• Polymer(Korea)
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• v.27 no.6
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• pp.528-535
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• 2003

The effects of surfactants, organic solvents, and functional monomers on the emulsion polymerization of perfluoroalkyleoylacryaltes and n-alkylacrylates were investigated. In particular, the dependence of the surface properties, contact angle and water repellency on the crystal melting temperature (T$\_$m/) of the fluorocopolymer and the variation of polymer latex particle sizes was investigated. Using WAXD experiments and synthesizing different types of fluorocopolymers which have fallowing fluoroacrylaytes [CH$_2$=CHCO$_2$CH,$_2$(CF$_2$CF$_2$) nH] (n = 4, 5 or 6), the relationship between the molecular packing structure of pendent side groups of fluorocopolymers and the surface properties was also investigated. We observed that the structure of primary carbon atoms of pendent side groups of fluorocopolymers plays key role in determining the surface properties.s.

• Analytical Science and Technology
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• v.19 no.2
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• pp.131-141
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• 2006

Hydrobromic acid salt of a $N_2O_2$ tetradentate ligand, N,N'-bis(2-hydroxybenzyl)-ethylene-diamine ($H-BHE{\cdot}2HBr$) was synthesized. $Br-BHE{\cdot}2HBr$, $Cl-BHE{\cdot}2HBr$, $CH_3-BHE{\cdot}2HBr$ and $CH_3O-BHE{\cdot}2HBr$ having Br, Cl, $CH_3$ and $CH_3O$ substituents at 5-position of the phenol group of $H-BHE{\cdot}2HBr$ were also synthesized. $Nap-BHE{\cdot}2HBr$ having naphthalen-2-ol instead of the phenol group was also synthesized. The potentiometry study in aqueous solution revealed that the proton dissociations of the synthesized ligands occurred in four steps and the order of the calculated overall proton dissociation constants (${\log}{\beta}_p$) of each ligand was Br-BHE < Cl-BHE < H-BHE < Nap-BHE < $CH_3$-BHE < $CH_3O$-BHE. The order showed a similar trend to that of Hammett substituent constants(${\sigma}_P$). The order of the stability constants (${\log}K_{ML}$) was CO(II) < Ni(II) < Cu(II) > Zn(II) > Cd(II) > Pb(II). The order in their stability constants (${\log}K_{ML}$) of each transition metal complex agreed well with that of the overall proton dissociation constants (${\log}{\beta}_p$).

• 한국연소학회:학술대회논문집
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• 2000.12a
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• pp.77-82
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• 2000

Numerical simulations of freely propagating flames burning stoichiometric $CH_4$/$O_2$/$N_2$ mixtures are performed at atmospheric pressure in order to understand the effect of the $O_2$ enrichment level on $CH_4$/Air flame. A chemical kinetic mechanism is employed, the adopted scheme involving 54 gas-phase species and 632 forward reactions. The calculated flame. speeds are compared with the experiments for the flames established at several $O_2$ enrichment level, the results of which is in excellent agreement. As a result of the increased $O_2$ enrichment level from 0.21 to 1, the mole fraction of CO in the burned gas is increased. The flame speed and the temperature in the burned gas are also increased, but the thickness of the flame is severely shrunken in the preheat region.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2009.05a
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• pp.250-251
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• 2009

For the fabrication of a multilevel resist (MLR) based on a very thin amorphous carbon (a-C) layer an $Si_{3}N_{4}$ hard-mask layer, the selective etching of the $Si_{3}N_{4}$ layer using physical-vapor-deposited (PVD) a-C mask was investigated in a dual-frequency superimposed capacitively coupled plasma etcher by varying the following process parameters in $CH_{2}F_{2}/H_{2}/Ar$ plasmas : HF/LF powr ratio ($P_{HF}/P_{LF}$), and $CH_{2}F_{2}$ and $H_2$ flow rates. It was found that infinitely high etch selectivities of the $Si_{3}N_{4}$ layers to the PVD a-C on both the blanket and patterned wafers could be obtained for certain gas flow conditions. The $H_2$ and $CH_{2}F_{2}$ flow ratio was found to play a critical role in determining the process window for infinite $Si_{3}N_{4}$/PVDa-C etch selectivity, due to the change in the degree of polymerization. Etching of ArF PR/BARC/$SiO_x$/PVDa-C/$Si_{3}N_{4}$ MLR structure supported the possibility of using a very thin PVD a-C layer as an etch-mask layer for the $Si_{3}N_{4}$ layer.

• Journal of the Korean Society of Combustion
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• v.8 no.2
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• pp.1-6
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• 2003

Numerical simulations are conducted at atmospheric pressure in order to understand the effect of the oxygen enrichment level on structure of $CH_4/O_2/N_2$ premixed flames. Under several equivalence ratios the flame speeds are calculated and compared with those obtained from the experiments, the results of which are in good agreement. The effects of the oxygen enrichment are investigated on flames under fuel-rich conditions. As the oxygen enrichment level is increased from 0.21 to 1, the flame speed and the temperature are increased. The emission index of $CO_2$ is decreased in cases of flames for fuel rich mixtures, so the efficiency of combustion may be decreased. The maximum emission index of NO is obtained for 0.6 of the oxygen enrichment level.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.25 no.12
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• pp.974-978
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• 2012

The effect of Cu coating on the sensing properties of nano $SnO_2:Cu$ based sensors for the $CH_4$, $CH_3CH_2CH_3$ gas was studied. This work was focussed on investigating the change of sensitivity of nano $SnO_2:Cu$ based sensors for $CH_4$, $CH_3CH_2CH_3$ gas by Cu coating. Nano sized $SnO_2$ powders were prepared by solution reduction method using stannous chloride($SnCl_2{\cdot}2H_2O$), hydrazine($N_2H_2$) and NaOH and subsequent heat treatment. XRD patterns showed that nano $SnO_2$ powders with rutile structure were grown with (110), (101), (211) dominant peak. The particle size of nano $SnO_2:Cu$ powders at 8 wt% Cu was about 50 nm. $SnO_2$ particles were found to contain many pores, according to SEM analysis. The sensitivity of nano $SnO_2:Cu$ based sensors was measured for 5 ppm $CH_4$ gas and $CH_3CH_2CH_3$ gas at room temperature by comparing the resistance in air with that in target gases. The sensitivity for both $CH_4$ and $CH_3CH_2CH_3$ gases was improved by Cu coating on the nano $SnO_2$ surface. The response time and recovery time of the $SnO_2:Cu$ gas sensors for the $CH_4$ and $CH_3CH_2CH_3$ gases were 18~20 seconds, and 13~15 seconds, respectively.

• Journal of Korean Society for Atmospheric Environment
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• v.29 no.2
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• pp.171-185
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• 2013

Wetland has been known as a major biogenic source of $CH_4$ in globe. In a global scale, the amounts of 55~150 Tg $CH_4$ are released into the atmosphere annually from wetlands; and it accounts for about 21% of total $CH_4$ annual global emission. From August 2010 to August 2011, measurements of major greenhouse gas ($CO_2$, $CH_4$, $N_2O$) emissions were conducted from a freshwater wetland at Kunsan ($35^{\circ}56^{\prime}38.94^{\prime\prime}N$, $126^{\circ}43^{\prime}16.62^{\prime\prime}E$), Korea by using floating closed static chamber method. Flux measurements for these gases from western coastal tidal flat at Seocheon ($36^{\circ}07^{\prime}13.85^{\prime\prime}N$, $126^{\circ}35^{\prime}43.18^{\prime\prime}E$), Korea were managed from July 2011 to February 2012 by using closed static chamber method. The average gas fluxes and ranges from freshwater wetland experiment were $0.155{\pm}0.29\;mg\;m^{-2}\;hr^{-1}$ (-0.054~0.942 $mg\;m^{-2}\;hr^{-1}$) for $CH_4$, $17.30{\pm}73.27\;mg\;m^{-2}\;hr^{-1}$ (-52.44~261.66 $mg\;m^{-2}\;hr^{-1}$) for $CO_2$, and $0.004{\pm}0.01\;mg\;m^{-2}\;hr^{-1}$ (-0.02~0.07 $mg\;m^{-2}\;hr^{-1}$) for $N_2O$, respectively. Monthly base flux measurement results revealed that $CH_4$ fluxes during summer months in high water temperature were significantly high, and at least order of one higher than those during other months. The average fluxes and ranges of these greenhouse gases from tidal flat during the experimental period were $0.002{\pm}0.08\;mg\;m^{-2}\;hr^{-1}$ (-0.16~0.22 $mg\;m^{-2}\;hr^{-1}$) for $CH_4$, $-31.18{\pm}75.33\;mg\;m^{-2}\;hr^{-1}$ (-298.87~101.93 $mg\;m^{-2}\;hr^{-1}$) for $CO_2$, and $0.001{\pm}0.01\;mg\;m^{-2}\;hr^{-1}$ (-0.017~0.03 $mg\;m^{-2}\;hr^{-1}$) for $N_2O$, respectively. Comparing the results of gas emissions from tidal flat to those from freshwater wetland, we found significantly lower emissions from tidal flat based on the experiment. Physicochemical parameters of water and soil at these experimental plots were also sampled and analyzed for understanding their correlation with these gas emissions.