Etching Characteristics of Ba2Ti9O20(BTO) Thin Films in Inductively Coupled an Ar/Cl2 Plasma (Ar/Cl2 혼합가스를 이용한 Ba2Ti9O20(BTO) 박막의 유도결합 플라즈마 식각)
-
- Journal of the Korean Institute of Electrical and Electronic Material Engineers
- /
- v.24 no.4
- /
- pp.276-279
- /
- 2011