• Title/Summary/Keyword: $AlCl_3$ metallic compound

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Antioxidative Effect of Aster yomena (Kitm.) Extract on C6 Glioma Cell Line Damaged by AlCl3, Dementia Inducer (치매유발물질인 염화알루미늄으로 손상된 C6 신경교종 세포주에서의 항산화 효과)

  • Seo, Young-Mi
    • Korean Journal of Clinical Laboratory Science
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    • v.52 no.4
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    • pp.408-416
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    • 2020
  • This study examined the neuronal cytotoxicity of aluminum chloride (AlCl3), a dementia inducer, and the protective effects of Aster yomena (Kitam.)(AY) extract on AlCl3-induced cytotoxicity in cultured C6 glioma cells. The antioxidative effects, such as the inhibitory ability of xanthine oxidase (XO) and superoxide anion-radical (SAR) scavenging ability, on cell viability were examined. AlCl3 decreased the cell viability significantly in a dose-dependent manner, and the XTT50 value was 130.0 μM in these cultures. The cytotoxicity of AlCl3 was determined to be mid-toxic according to the Borenfreund and Puerner' toxic criteria. Quercetin (QU), an antioxidant, increased the cell viability reduced by AlCl3-induced cytotoxicity. The protective effect of the AY extract on AlCl3-induced cytotoxicity was analyzed. The AY extract increased the cell viability remarkably compared to the AlCl3-treated group and showed the inhibitory ability of XO and SAR-scavenging ability. The cytotoxicity of AlCl3 was correlated with oxidative stress, and the AY extract effectively prevented AlCl3-induced cytotoxicity through its antioxidative effects. In conclusion, natural resources, such as the AY extract, may be a putative agent for improving the cytotoxicity of heavy metallic compounds correlated with oxidative stress, such as AlCl3, a morbid agent.

Surface properties of Al(Si, Cu) alloy film after plasma etching (Al(Si, Cu)합금막의 플라즈마 식각후 표면 특성)

  • 구진근;김창일;박형호;권광호;현영철;서경수;남기수
    • Electrical & Electronic Materials
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    • v.9 no.3
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    • pp.291-297
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    • 1996
  • The surface properties of AI(Si, Cu) alloy film after plasma etching using the chemistries of chlorinated and fluorinated gases with varying the etching time have been investigated using X-ray Photoelectron Spectroscopy. Impurities of C, Cl, F and O etc are observed on the etched AI(Si, Cu) films. After 95% etching, aluminum and silicon show metallic states and oxidized (partially chlorinated) states, copper shows Cu metallic states and Cu-Cl$_{x}$(x$_{x}$ (x$_{x}$ (1

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