• 제목/요약/키워드: $Al-SiC_p$

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분말압출법으로 제조된 $SiC_p$/2024Al 복합재료에 있어서 압출온도와 다이각이 기계적 성질에 미치는 영향 (The Effect of Extrusion Temperature and Die Angle on Mechanical Properties of $SiC_p$/2024Al Composites Fabricated by Powder Extrusion Method)

  • 성병진
    • 한국분말재료학회지
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    • 제2권1호
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    • pp.44-52
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    • 1995
  • Effects of the extrusion temperature and die angle on the tensile properties of SiCIyAl composites in powder extrusion have been investigated. SiCP/Al composites were extruded at various extrusion temperatures (450, 500, $550^{\circ}C$) under the extrusion ratio of 25 : 1. The ram speed was maintained at 13 cm/min for all the extrusion conditions. The surface of the extruded rod appeared to be smooth without tearing at 450 and 50$0^{\circ}C$, whereas it was very rough due to tearing at $550^{\circ}C$. It was found that the tensile strength and elongation of the composites extruded at $500^{\circ}C$ are greater than those of composites extruded at $450^{\circ}C$ This is due to the easier plastic deformation of composite extruded at $500^{\circ}C$, compared with the composites extruded at $450^{\circ}C$. The effect of die angle was examined under 20=60, 120, $180^{\circ}$die angles at extrusion temperature of $500^{\circ}C$ under 25:1 extrusion ratio. The tensile strength of the composites extruded with 20=$60^{\circ}$approved to be higher than that of the composties extruded with 28 : 120 and $180^{\circ}$This is attributable to the higher extrusion pressure, which mixed composite powders could be densely consolidated at elevated temperatures, resulting from high friction force between billet and sliding surface of conical die.

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The Effect of SiON Film on the Blistering Phenomenon of Al2O3 Rear Passivation Layer in PERC Solar Cell

  • 조국현;장효식
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
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    • pp.364.1-364.1
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    • 2014
  • 고효율 태양전지로 가기 위해서는 태양전지의 후면 패시베이션은 중요한 역할을 한다. 후면 패시베이션 막으로 사용되는 $Al_2O_3$ 막은 $Al_2O_3/Si$ 계면에서 높은 화학적 패시베이션과 Negative Fixed Charge를 가지고 있어 적합한 Barrier막으로 여겨진다. 하지만 이후에 전면 Metal paste의 소성 공정에 의해 $800^{\circ}C$이상 온도를 올려주게 됨에 따라 $Al_2O_3$ 막 내부에 결합되어 있던 수소들이 방출되어 blister가 생성되고 막 질은 떨어지게 된다. 우리는 blister가 생성되는 것을 방지하기 위한 방법으로 PECVD 장비로 SiNx를 증착하는 공정 중에 $N_2O$ 가스를 첨가하여 SiON 막을 증착하였다. SiON막은 $N_2O$가스량을 조절하여 막의 특성을 변화시키고 변화에 따라 소성시 막에 미치는 영향에 대하여 조사하였다. 공정을 위해 $156{\times}156mm2$, $200{\mu}m$, $0.5-3.0{\Omega}{\cdot}cm$ and p-type 단결정 실리콘 웨이퍼를 사용하였고, $Al_2O_3$ 막을 올리기 전에 RCA Cleaning 실행하였다. ALD 장비를 통해 $Al_2O_3$ 막을 10nm 증착하였고 RF-PECVD 장비로 SiNx막과 SiON막을 80nm 증착하였다. 소성로에서 $850^{\circ}C$ ($680^{\circ}C$) 5초동안 소성하고 QSSPC를 통해 유효 반송자 수명을 알아보았다.

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TiAlCrSiN 박막의 고온 산화 부식 (High-temperature Oxidation of the TiAlCrSiN Film)

  • 이동복;김민정
    • 한국표면공학회:학술대회논문집
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    • 한국표면공학회 2016년도 추계학술대회 논문집
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    • pp.107-107
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    • 2016
  • TiCrAlSiN films were developed in order to improve the high-temperature oxidation resistance, corrosion resistance, and mechanical properties of conventional TiN films that are widely used as hard films to protect and increase the lifetime and performance of cutting tools or die molds. In this study, a nano-multilayered TiAlCrSiN film was deposited by cathodic arc plasma deposition. It displayed relatively good oxidation resistance at $700-900^{\circ}C$, owing to the formation protective oxides of $Al_2O_3$, $Cr_2O_3$, and $SiO_2$, and semiprotective $TiO_2$. At $1000^{\circ}C$, the increased temperature led to the formation of the imperfect oxide scale that consisted primarily of the outer ($TiO_2$,$Al_2O_3$)-mixed scale and inner ($TiO_2$, $Al_2O_3$, $Cr_2O_3$)-mixed scale.

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NaAlSiO4-KAlSiO4-SiO2-H2O 4성분계(成分系)의 불변점부근(不變點附近)의 P-T 곡선(曲線)의 변이(變移) (THE SEQUENCE OF P-T CURVES AROUND A QUATERNARY INVARIANT POINT IN THE SYSTEM NaAlSiO4-KAlSiO4-SiO2-H2O)

  • 김기태
    • 자원환경지질
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    • 제5권2호
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    • pp.77-86
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    • 1972
  • Bowen의 "Petrogeny's Residua System"으로 알려져 있는 NaAlSiO_4-KAlSiO_4-SiO_2-H_2O계(系)는 대륙지각(大陸地殼)에 있어 화성암(火成岩)과 변성암(變成岩) 간(間)의 상(相)의 관계(關係)를 이해(理解)하는데 대단히 중요(重要)한 것이다. 그럼에도 불구하고 이 계내(系內)의 상(相)의 관계(關係)는 아직 Mohorovicic 불연속면(不連續面) 이상(以上)의 위치(位置)의 P-T 범위(範圍)의 것 조차 완전(完全)히 알려져 있지 않다. 그러므로 이 상(相)들 간(間)의 관계(關係)를 알 필요(必要)가 있다. 본(本) 연구(硏究)는 Schreinemaker 법칙(法則)을 적용한 계내(系內)에 있는 불변점(不變點)(~5kb/${\sim}635^{\circ}C$) 부근(附近)에 있는 순서를 추이(推理)하였는데 이는 주(主)로 Morse (1969a&6) 실험자료에 근거하였다. 결론(結論)으로 불변점(不變點)(~5kb/${\sim}635^{\circ}C$) 부근(附近)에서의 P-T 곡선(曲線)의 순서(順序)는 각각(各各) P-T 투영(投影)에서는 (L), (Anl), (Or), (V), (Ne), 및 (Ab)의 순(順)이고 P-T 곡선(曲線) (L)은 P-T 구역(區域) 하부(下部)로 연장되며 (Anl) 곡선(曲線)은 불변점(不變點)보다 높은 온도(溫度)와 낮은 압력(壓力)의 구역(區域)으로 연장(延長)된다는 것을 알았다.

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MAS (Metal-$Al_2O_3$-Si) 구조에 있어서 전기적 특성에 관한 연구 (A Study for Electrical Characteristics of MAS (Metal-$Al_2O_3$-Si) Structure)

  • 박성희;이동엽;장지근;이영희
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1987년도 전기.전자공학 학술대회 논문집(I)
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    • pp.461-464
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    • 1987
  • With the fabrication of Al-$Al_2O_3$-n(p) type Si devices, the analysis and measurement of various characteristics, this study presented the electric physical property theory for the charge distribution of MAS device $Al_2O_3$ films, and inquired out the devices available. In order to study them, Al-(450A)$Al_2O_3$-n(p) type Si was the main objects in the study. They were examined through carrier injection, C-V curves of devices on time, ${\Delta}V_{FB}$-t curves, I-V curves and $Al_2O_3$ film's breakdown characteristics.

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분사주조한 $SiC_p$ 입자강화 알루미늄 복합재료의 미세조직과 마멸특성 (Microstructure and Wear Behavior of $SiC_p-reinforced$ Aluminum Matrix Composites Fabricated by Spray Casting Process)

  • 박종성;김명호
    • 한국주조공학회지
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    • 제15권6호
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    • pp.574-587
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    • 1995
  • The $SiC_p-reinforced$ preforms fabricated by spray casting process were hot-extruded and subsequently T6-treated, and the morphology of the silicon phase and the grain size for these preforms and extruded samples were examined by Image Analyzer. Experimental observation revealed that with increase in volume percent of SiC particles, the grain size and silicon phase of the $Al-Si/SiC_p$ composites become finer, the shape of Si phase is changed from blocky to granular type, and aspect ratio of Si phase tend to become unity. Wear-tests with various sliding velocities, show that the wear resistance of spray cast specimen is increased remarkably compare to the permanent mold cast specimen at the sliding velocity range of $1.98{\sim}2.38m/sec$.. Microstructural observations for the worn surfaces of specimens revealed that wear resistance of Al-Si alloys at certain sliding velocities could be improved not only by the fine grain size of aluminum matrix but also the fine size and granular shape of silicon phases. The wear resistance of $SiC_p$ reinforced aluminum composites was found to be sensitive to the volume percentage of the reinforcing particles. The worn surfaces with various sliding velocities, show that change in wear mechanism seems to occur at the sliding velocity of near 2m/sec for all samples, and such a change in mechanism is delayed with increase in $SiC_p$ volume fraction.

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$Ta_2O_5/Al/SiO_2/P-Si$ MIS형(形) 태양전지(太陽電池)의 제작(製作)과 특성(特性) (Fabrication and Characteristics of $Ta_2O_5/Al/SiO_2/p-Si$ MIS Solar Cells)

  • 노경석;손연규
    • 태양에너지
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    • 제6권2호
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    • pp.70-75
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    • 1986
  • The fabrication procedure and characteristics of $Ta_2O_5/Al/SiO_2/p-Si$ MIS solar cells forming a fine grating pattern of aluminum evaporated on to p-type silicon crystal are discribed. The proper temperature for oxide growing of these cells was found to be about $450^{\circ}C$ for 20 minutes with oxygen flow. The conversion efficiency increased about 3% after $750{\AA}$ thickness of tantalium silica film spin on anti-reflective coating. The best results showed that $V_{oc}=0.545V,\;J_{sc}=34mA$ and F.F = 0.65, which represent that the conversion efficiency is 12%.

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다결정 3C-SiC 박막 다이오드의 전기적 특성 (Electrical characteristics of polycrystalline 3C-SiC thin film diodes)

  • 정귀상;안정학
    • 센서학회지
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    • 제16권4호
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    • pp.259-262
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    • 2007
  • This paper describes the electrical characteristics of polycrystalline (poly) 3C-SiC thin film diodes, in which poly 3C-SiC thin films on n-type and p-type Si wafers, respectively, were deposited by APCVD using HMDS, $H_{2}$, and Ar gas at $1150^{\circ}C$ for 3 hr. The schottky diode with Au/poly 3C-SiC/Si (n-type) structure was fabricated. Its threshold voltage ($V_{bi}$), breakdown voltage, thickness of depletion layer, and doping concentration ($N_{D}$) value were measured as 0.84 V, over 140 V, 61 nm, and $2.7{\times}10^{19}cm^{-3}$, respectively. Moreover, for the good ohmic contact, Al/poly 3C-SiC/Si (n-type) structure was annealed at 300, 400, and $500^{\circ}C$, respectively for 30 min under the vacuum condition of $5.0{\times}10^{-6}$ Torr. Finally, the p-n junction diodes fabricated on the poly 3C-Si/Si (p-type) were obtained like characteristics of single 3CSiC p-n junction diode. Therefore, poly 3C-SiC thin film diodes will be suitable for microsensors in conjunction with Si fabrication technology.

Al-Si계 피스톤 합금의 경질양극산화피막의 특성에 관한 연구 (A Study on the Charactristics od Hard Anodizing fikm of Al-Si Pistom Alloys)

  • 문종환;이진형;권혁상
    • 한국표면공학회지
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    • 제23권1호
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    • pp.34-43
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    • 1990
  • Al-Si piston alloys such as AlS10CuMg have been anodized to examine apossibility of forming a hard film aat relatively higher temperatures compard with those in conventional sulfuric acid processes. Three types of electrolytes have been employed in this study ; electrolyte A(15% H2SO4, $0^{\circ}C$), electrolyte B(12% H2SO4, 1% oxalic, $10^{\circ}C$), electrolyte C(tartaric acid 125g/L+oxalic 75g/L+aluminum sulfate 225g/L, $25^{\circ}C$). Hard anodisine process in electrolyte B at a current density of 1.54A/dm2 produced a harder film of VHN 396 at a relatibely low film forming voltage compared with those obtained in other electrolyte at equivalent current density. A liner relationship between hardness and abrasion resistance exists for Al-Si piston alloys. The hardness of anodized film decreasees with increasing silicon content in Al-Si alloys and also with bath temperature. The film hardeness of Na-modified alloy os higher than that of P-modified alloy due to its finer microstructre. The film on the silicon phase in Al-Si alloys is observed to be formed by lateral growth of oxide film nucleated at surroundings.

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N-Type c-Si 이종접합 태양전지 제작을 위한 a-Si:H(p) 가변 최적화 (A Study of Optimization a-Si:H(p) for n-type c-Si Heterojunction Solar Cell)

  • 허종규;윤기찬;최형욱;이영석;;김영국;이준신
    • 한국신재생에너지학회:학술대회논문집
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    • 한국신재생에너지학회 2009년도 춘계학술대회 논문집
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    • pp.77-79
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    • 2009
  • Amorphous/crystalline silicon heterojunction solar cells, TCO/a-Si:H (p)/c-Si(n)/a-Si:H(n)/Al, are investigated. The influence of various parameters for the front structures was studied. We used thin (10 nm) a-Si:H(p) layers of amorphous hydrogenated silicon are deposited on top of a thick ($500{\mu}m$) crystalline c-Si wafer. This work deals with the influence of the a-Si:H(p) doping concentration on the solar cell performance is studied.

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