• Clean Technology
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• v.27 no.4
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• pp.291-296
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• 2021

Recently, there has been increasing demand for advancing photocatalytic techniques that are capable of the efficient removal of organic pollutants in water. TiO₂, a representative photocatalytic material, has been commonly used as an effective photocatalyst, but it is rather expensive and an alternative is required that will fulfill the requirements of both high performing photocatalytic activities and cost-effectiveness. In this work, ZnO, which is more cost effective than TiO₂, was synthesized by using a microreactor-assisted nanomaterials (MAN) process. The process enabled a continuous production of ZnO nanoparticles (NPs) with a flower-like structure with high uniformity. In order to resolve the limited light absorption of ZnO arising from its large band gap, Ag NPs were uniformly decorated on the flower-like ZnO surface by using the MAN process. The plasmonic effect of Ag NPs led to a broadening of the absorption range toward visible wavelengths. Ag NPs also helped inhibit the electron-hole recombination by drawing electrons generated from the light absorption of the flower-like ZnO NPs. As a result, the Ag-ZnO nanocomposites showed improved photocatalytic activities compared with the flower-like ZnO NPs. The photocatalytic activities were evaluated through the degradation of methylene blue (MB) solution. Scanning electron microscopy (SEM), x-ray diffraction (XRD), and energy-dispersive x-ray spectroscopy (EDS) confirmed the successful synthesis of Ag-ZnO nanocomposites with high uniformity. Ag-ZnO nanocomposites synthesized via the MAN process offer the potential for cost-effective and scalable production of next-generation photocatalytic materials.

• Proceedings of the Korean Vacuum Society Conference
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• 2012.08a
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• pp.324-325
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• 2012

반도체 소자의 미세화가 진행됨에 따라 고품질의 절연막, 즉 낮은 두께에서 높은 밀도와 낮은 누설 전류를 필요로 하게 되었다. 이를 위해 기존의 화학 기상 증착법을 이용한 절연막 증착의 공정 압력을 낮추어 1 Pa 이하의 공정 압력에서 절연막 증착 공정이 필요로 하게 되었다. 본 연구에서는 화학 기상 증착법을 이용하여 최저 0.1 mtorr의 극 저압에서 SiO2 절연막증착 공정을 구현하였고, 증착된 박막의 특성을 평가하였다. Fig. 1은 공정 압력의 변화에 따른 화학 기상 증착 장비의 플라즈마 상태를 나타낸 결과이다. 1.5 mtorr의 공정 압력 까지는 플라즈마의 상태가 균일하게 나타나지만, 그 이하의 압력에서는 플라즈마 균일도가 떨어지는 결과가 나타났다. 이는 기존의 플라즈마 공정을 이용하여 절연막 증착 공정이 어려움을 제시하는 결과이며, 이의 해결을 위해 새로운 형태의 플라즈마 장치가 필요함을 시사한다. Fig. 2는 각각의 공정 압력에 다른 $SiO_2$ 박막의 증착 결과를 AFM을 이용하여 측정한 결과이다. 박막의 표면 거칠기 값은 0.9 mTorr까지는 3 nm 수준이며, 0.1 mTorr에서는 0.4 nm로 측정되었다. 플라즈마 상태가 균일하지 않은 0.1 mTorr에서도 비교적 균일한 박막을 얻을 수 있었으나, 높은 공정 업력에 비해 전체적인 균일도도 낮은 결과이며, 이는 플라즈마 상태를 보완함으로서 해결 가능하다. 측정된 박막의 밀도는 2.311~2.59 g/$cm^3$의 수준으로 벌크 상태의 밀도 값에 근접한 결과를 얻었으며 이는 저압에서 증착한 $SiO_2$ 박막의 품질이 높음을 시사한다. 절연막의 증요한 특성 중 하나인 누설 전류 값은 MIM 구조를 이용하여 측정하였다. 측정된 누설 전류 값은 10~12 A 수준으로 기존 반도체 소자 공정에 적용 가능한 수준이다. 고 품질의 절연체 박막 증착을 위해서는 플라즈마 구조를 보완할 필요가 있으며, 이를 이용하면 반도체 소자 제작에 요구되어 지는 절연막 증착이 가능할 것으로 예상된다.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.9 no.1
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• pp.23-28
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• 1999

Au fine particles dispersed $TiO_{2}$ film was prepared on silica glass substrate by sol-gel dipping and firing process. The $TiO_{2}$ films were fabricated from the system of titanium tetraisopropoxide-EtOH-HCl-$H_{2}O$-hydrogen tetrachloroaurat (III) tetrahydrate. The conditions for the formation of clear solution and dissolving high concentration of Au compound were examined. Photoreduction process was adopted to control the size of gold metal particles. Phase evolution of matrix $TiO_{2}$ and variation of Au particle with UV irradiation were investigated by XRD, SEM, TEM and UV-visible spectrophotometer. The effect of CPCl (Cetylpyridinium chloride monohydrate) as a dispersion agent was evaluated.

• Journal of the Korea Organic Resources Recycling Association
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• v.32 no.1
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• pp.21-29
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• 2024

In this study, EMC(Epoxy molding compound) waste from the semiconductor molding process is recycled and synthesized into silica nanoparticles, which are then applied as abrasive materials contains CMP(Chemical mechanical polishing) slurry. Specifically, silanol precursor is extracted from EMC waste according to the ultra-sonication method, which provides heat and energy, using ammonia solution as an etchant. By employing as-extracted silanol via a facile sol-gel process, uniform silica nanoparticles(e-SiO₂, experimentally synthesized SiO₂) with a size of ca. 100nm are successfully synthesized. Through physical and chemical analysis, it was confirmed that e-SiO₂ has similar properties compared to commercially available SiO₂(c-SiO₂, commercially SiO₂). For practical CMP applications, CMP slurry is prepared using e-SiO₂ as an abrasive and tested by polishing a semiconductor chip. As a result, the scratches that are roughly on the surface of the chip are successfully removed and turned into a smooth surface. Hence, the results present a recycling method of EMC waste into silica nanoparticles and the application to high-quality CMP slurry for the polishing process in semiconductor packaging.

• Journal of Korean Society of Environmental Engineers
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• v.28 no.12
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• pp.1323-1330
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• 2006

In this study, five different odor causing compounds in the Nakdong river and rapid sand filtered waters were treated by oxidation from $O_3/H_2O_2$ process. In addition, the change in BDOC formation by the $O_3/H_2O_2$ process was also investigated for considering this advanced oxidation Process as a pre-treatment to the BAC treatment process. The experimental result showed that the removal efficiency of geosmin was higher with the use of 5 mg/L of $O_3$ and 0.2 mg/L of $H_2O_2$ than with the use of 20 mg/L of $O_3$ alone for the sand filtered water. And in general, the removal efficiency of geosmin in raw water was $12{\sim}27%$ lower than the one in sand filtered water. In sand filtered water. the removal efficiencies of geosmin and IPMP decreased when $H_2O_2/O_3$ ratio increases above the optimum ratio. The optimum ratio of $H_2O_2/O_3$ dose was $0.5{\sim}1.0$ for geosmin and $0.2{\sim}1.0$ for IPMP. However, the optimum ratio of $H_2O_2/O_3$ in raw water remove geosmin appealed to $1.0{\sim}3.0$. According to the experimental results for the removal of 5 different odor causing compounds under varied $O_3$ doses, the removal efficiency of IPMP was the highest with 60% and, in overall, $O_3/H_2O_2$ process showed higher removal efficiency than $O_3$ alone process. The BDOC formation by the $O_3/H_2O_2$ process increased from $0.1{\sim}0.25$ to $0.19{\sim}0.34$ comparing to $O_3$ process alone. Therefore, it is concluded that the advanced oxidation process with $O_3/H_2O_2$ can be used as a pretreatment to the BAC treatment process.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.29 no.3
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• pp.123-131
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• 2019

In this study, the development of transparent UV blocking material using $TiO_{2-x}$ oxide thin film process was developed. A process technology is related to a process technology for making a sample with ultraviolet-shielding property of visible light transmittance of 78 % or more (total light transmittance at 550 nm) and of a UV cut-off characteristic of more than 95 % at 315 nm in ultraviolet wavelength band. In this study, it is possible to establish a flexible device process condition of high performance ultraviolet (UV) shielding thin film, to design mixed type of transparent flexible device with heterogeneous characteristics and to formulate composite deposition technology, according to various market demands. Establishment of actual roll-to-roll continuous process and equipment and process technology will affect related industries greatly.

• Proceedings of the Membrane Society of Korea Conference
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• 2004.05b
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• pp.163-167
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• 2004

Dimethyl ether(DME)는 대기 오염 문제와 에너지 문제가 대두됨에 따라 저공해 경유 대체 연료로 각광받고 있는 물질이다. 최근 들어 메탄올로부터 고체산 촉매를 이용하여 DME를 합성하고자 하는 연구가 활발히 진행 중이다[1-4]. 메탄올로부터 DME의 합성시 촉매로는 제올라이트나 SiO$_2$/${\gamma}$-Al$_2$O$_3$를 사용하기도 하지만 ${\gamma}$-Al$_2$O$_3$나 변형된 ${\gamma}$-Al$_2$O$_3$가 일반적으로 사용된다.(중략)

• Journal of Industrial Technology
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• v.27 no.A
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• pp.25-29
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• 2007

Ozone alone, Ozone/GAC, Ozone/$H_2O_2$ and Ozone/GAC/$H_2O_2$ processes were introduced for treatment of humic acid, which is a representative refractory organic compound. $H_2O_2$ and GAC used as catalysts for experiment. The treatment efficiencies of humic acid in each process were analyzed for pH variation, DOC removal, and $UV_{254}$ decrease. $UV_{254}$ decrease in Ozone/GAC and Ozone/GAC/$H_2O_2$ processes were the highest with about 93%, and Ozone alone and Ozone/$H_2O_2$ processes were 88%. DOC removal in Ozone/GAC/$H_2O_2$ process was the highest with 71%. Removal by Ozone/GAC, Ozone alone, and Ozone/$H_2O_2$ processes were 66%, 39%, and 47%, respectively.

• Journal of Korean Society of Water and Wastewater
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• v.24 no.1
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• pp.109-117
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• 2010

In the present study, the degradation characteristics of Lindane by Advanced Oxidation Processes(UV/$H_2O_2$, Photo-Fenton process) were studied. The degradation efficiency of Lindane in aqueous solution was investigated at various initial pH values, Fenton's reagent concentrations and initial concentrations of Lindane. GC-ECD was used to analyze lindane. Lindane has not been degraded without application of AOPs over two hours. But, approximately 5% of lindane was degraded with UV or $H_2O_2$ alone. Lindane with UV/$H_2O_2$ process showed approximately 7% higher removal efficiency than $H_2O_2$ process. In the UV/$H_2O_2$ process, the pH values did not affect the removal efficiency. The optimal mole ratio of $H_2O_2/Fe^{2+}$ for lindane degradation is about 1.0 in Photo-Fenton process. Also, the experimental results showed that lindane removal efficiency increased with the decrease of initial concentration of lindane. Under the same conditions, the order lindane of removal efficiency is as following : Photo-Fenton process > UV/$H_2O_2$ process > $H_2O_2$ process. In addition, intermediate products were identified by GC-MS techniques. Than PCCH(Pentachlorocyclohexene) was identified as a reaction intermediate of the Photo-Fenton process.

• Journal of the Microelectronics and Packaging Society
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• v.5 no.1
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• pp.39-44
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• 1998

절연체기판으로서는 아루미나 세라믹 기판을 사용하고 전극으로서는 copper를 사용 하여 DBC공정으로 접합하여 제조하였다. 접합재료는 전처리과정을 거친다음 불활성기체 분 위기 하에서 1065~1083$^{\circ}C$의 온도로 1~60분 동안 유지시켜 접합하였다. 본 실험에서 접합 된 세라믹기판과 Cu의 계면의 SEM 관찰 결과 안정된 접합면이 생성되었으며 접합강도는 약 116MPa로 양호한 값을 얻었다. 또한 Al2O3/Copper 접합계면을 ESCA를 통하여 분석한 결과 CuAlO2의 화합물의 생성을 확인하였다. 이 DBC공정은 제조공정의 단순화를 실현시켜 대량생산에 적합함으로 전자부품 모듈생산에 유용하게 적용될 수있을것이다.