• Title/Summary/Keyword: ${\zeta}$-potential of film

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Measurements and methods for analyzing zeta potential of the external surface of hollow fiber membranes (중공사막 외부표면의 제타전위 측정방법 고찰)

  • Lee, Taeseop;Lee, Sangyoup;Lee, Joohee;Hong, Seungkwan
    • Journal of Korean Society of Water and Wastewater
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    • v.23 no.3
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    • pp.353-362
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    • 2009
  • A new method and equipment for measuring the zeta potential of the external surface of hollow fiber (HF) membranes is reported. An existing commercial streaming potential analyzer in conjunction with home-made test cells was used to determine the electrokinetic surface characteristics of various HF membranes. It was shown that measurements of the external surface of HF membrane using the home-made test cells designed in this study were easy and reliable. The zeta potential values were quite accurate and reproducible. By varying the physical shape of the test cells to adjust hydrodynamics inside the test cells, several upgrade versions of home-made test cells were obtained. It was shown that the zeta potential of the external surface of HF membranes was most influenced by membrane materials as well as the way of surface modification. However, the overall surface charge of tested HF membranes were much less than that of commercial polyamide thin-film-composite (TFC) reverse osmosis (RO) membranes due to the lack of surface functional groups. For the HF membranes with the same material, the effect of pore size on the zeta potential was not significant, implying the potential of accurate zeta potential measurements for various HF membranes. The results obtained in this study are expected to be useful for better understating of electrokinetic surface characteristics of the external surface of HF membranes.

Continuous Surface Treatment and Dyeability of PTT Film via $UV/O_3$ Irradiation (UV/Ozone 조사에 의한 PTT 필름의 연속식 표면처리와 염색성)

  • Jang Jinho;Park Dae Sun
    • Textile Coloration and Finishing
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    • v.17 no.1
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    • pp.7-13
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    • 2005
  • Continuous and intense UV irradiation on PTT film using two types of UV bulbs at different irradiation power level was carried out to modify surface characteristics of the film including zeta potential, wettability, surface energy, and dyeability. ESCA analysis of the irradiated film showed higher O/C ratio than the untreated film indicating photooxidation of outer surface layer. ATR analysis showed that the ester bonds were broken and some new groups were produced such as carboxylic acid, phenolic hydroxy, and other esters, implying that ester bonds of PTT was responsible for the observed photooxidation effect. The surface of the treated PTT film became more hydrophilic and wettable to water, coupled with increased surface energy. Polar component of the surface energy increased and nonpolar component decreased with increasing irradiation energy. The treatment also decreased zeta potential of the modified surface and nanoscale roughness increased with increasing irradiation. The dyeability of the treated films to catonic dyes was significantly improved by electrostatic and polar interaction between dye molecules and the anionic film surface. The UV irradiation seems to be a viable polymer surface modification technology, which has advantages such as no vacuum requirement and continuous process unlike plasma treatment.

Post Ru CMP Cleaning for Alumina Particle Removal

  • Prasad, Y. Nagendra;Kwon, Tae-Young;Kim, In-Kwon;Park, Jin-Goo
    • Proceedings of the Materials Research Society of Korea Conference
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    • 2011.05a
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    • pp.34.2-34.2
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    • 2011
  • The demand for Ru has been increasing in the electronic, chemical and semiconductor industry. Chemical mechanical planarization (CMP) is one of the fabrication processes for electrode formation and barrier layer removal. The abrasive particles can be easily contaminated on the top surface during the CMP process. This can induce adverse effects on subsequent patterning and film deposition processes. In this study, a post Ru CMP cleaning solution was formulated by using sodium periodate as an etchant and citric acid to modify the zeta potential of alumina particles and Ru surfaces. Ru film (150 nm thickness) was deposited on tetraethylorthosilicate (TEOS) films by the atomic layer deposition method. Ru wafers were cut into $2.0{\times}2.0$ cm pieces for the surface analysis and used for estimating PRE. A laser zeta potential analyzer (LEZA-600, Otsuka Electronics Co., Japan) was used to obtain the zeta potentials of alumina particles and the Ru surface. A contact angle analyzer (Phoenix 300, SEO, Korea) was used to measure the contact angle of the Ru surface. The adhesion force between an alumina particle and Ru wafer surface was measured by an atomic force microscope (AFM, XE-100, Park Systems, Korea). In a solution with citric acid, the zeta potential of the alumina surface was changed to a negative value due to the adsorption of negative citrate ions. However, the hydrous Ru oxide, which has positive surface charge, could be formed on Ru surface in citric acid solution at pH 6 and 8. At pH 6 and 8, relatively low particle removal efficiency was observed in citric acid solution due to the attractive force between the Ru surface and particles. At pH 10, the lowest adhesion force and highest cleaning efficiency were measured due to the repulsive force between the contaminated alumina particle and the Ru surface. The highest PRE was achieved in citric acid solution with NaIO4 below 0.01 M at pH 10.

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Polishing of Oxide film by colloidal silica coated with nano ceria (나노 세리아 입자가 표면 코팅된 콜로이달 실리카 슬러리의 Oxide film 연마특성)

  • Kim, Hwan-Chul;Lee, Seung-Ho;Kim, Dae-Sung;Lim, Hyung-Mi
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2005.07a
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    • pp.35-37
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    • 2005
  • 100, 200nm 크기의 colloidal silica 각각에 나노 ceria 입자를 수열합성법으로 코팅하였다. Colloidal silica 입자에 ceria를 코팅 시 slurry의 pH조절과 수열처리에 이용하여 silica에 ceria가 코팅됨을 TEM과 zeta-potential을 이용하여 확인하였다. 연마 슬러리의 분산 안정성과 연마효율을 높이기 위하여 슬러리의 pH 는 9로 하였으며, 이때의 zeta-potential 값은 -25 mV이었다. 1 wt%로 제조된 연마슬러리를 이용하여, 4 inch $SiO_2$, $Si_3N_4$ wafer를 압력변화에 따른 연마특성을 관찰 하였다. Ceria coated colloidal silica 100 nm, 200 nm와 commercial한 $CeO_2$입자를 연마압력 6 psi로 oxide film을 연마한 결과 연마율이 각각 2490 ${\AA}/min$, 4200 ${\AA}/min$, 4300 ${\AA}/min$으로 측정되었다. 또한 $SiO_2$, $Si_3N_4$ film의 6 psi압력에서 ceria coated colloidal silica 100 nm, 200 nm와 commercial 한 $CeO_2$입자의 선택비는 3, 3.8, 6.7 이었다. 입자크기가 클수록 연마율이 높으며, Preston equation을 따라 연마 압력과 연마율이 비례하였다.

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UV-induced Crosslinking of Poly(vinyl acetate) Films Containing Benzophenone (벤조페논을 함유한 폴리비닐아세테이트 필름의 자외선 조사에 의한 가교)

  • Sim, Young-Jae;Seo, Eun-Kyo;Choi, Gyong-Jun;Yoon, Sung-Jong;Jang, Jin-Ho
    • Textile Coloration and Finishing
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    • v.21 no.4
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    • pp.33-38
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    • 2009
  • Poly(vinyl acetate) films containing benzophenone were photocrosslinked by continuous UV irradiation.UV irradiation of PVAc film containing 5% benzophenone induced bulk crosslinking of the polymer indicated by 84.1% of gel fraction after ethyl acetate extraction. The crosslinking was attributed to the recombination of tertiary polymer radicals generated upon UV irradiation, which was enhanced by the hydrogen abstraction of benzophenone. Also the UV irradiation resulted in scission of ester linkage and photooxidation of PVAc surface, which was verified by ATR and zeta potential analysis, implying that the PVAc surface became more polar and hydrophilic. The zeta potential proportionally increased from +4.5mV to -26.8 mV with increasing UV irradiation. Also the surface energy of the PVAc film increased with higher UV irradiation upto 56.5 $mJ/m^2$ by the enhanced Lewis acid/base component with larger contribution of Lewis acid parameter. Accordingly the crosslinked PVAc showed higher thermal stability with increasing UV energy.

A Study on the Removal of LPP CMP Induced Defect (LPP(Landing Plug Poly) CMP Induced Defect 제거에 관한 연구)

  • Oh, Pyeong-Won;Choi, Jea-Gon;Choi, Yong-Soo;Choi, Geun-Min;Song, Yong-Wook
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2004.07a
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    • pp.235-238
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    • 2004
  • 본 연구는 반도체소자 제조공정에 적용되는 CMP공정 중 LPP(Landing Plug Poly) Contact간의 소자 분리를 위해 진행되는 LPP CMP의 후 세정 과정에서 유발되는 방사형 Defect 제거에 관한 내용이다. 방사형 Defect은 LPP CMP 후에 노출되는 BPSG, Poly, Nitride Film과 연마재로 사용되는SiO2 입자, 후 세정과정에서 적용되는 SC-1, DHF, $NH_4OH$ Chemical과 Brush와의 상호작용에 의해 발생되며, Cleaning시의 산성 분위기 하에서 각 물질간의 pH와 Zeta Potential의 차이에서 기인한다. 이 Defect을 제거하기 위해 LPP CMP후에 Film 표면에 노출되는 각 물질의 표면 특성과 CMP 후 오염입자의 흡착과 재 흡착에 영향을 미치는 Electrostatic force와 Van der Waals force, PVA Brush에 의한 Mechanical force의 상호작용을 고려하여 최적 후 세정 조건을 제시 하였다.

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Effect of Slurry Property on Preparation of Zirconia Film in Electrophoretic Deposition (전착법에서 용액특성이 지르코니아 막형성에 미치는 영향)

  • 김상우;이병호;손용배;송휴섭
    • Journal of the Korean Ceramic Society
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    • v.36 no.9
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    • pp.991-996
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    • 1999
  • Effect of solution property on the weight varation and microstructural change of film was studied by electrophoretic deposition in order to obtain a homogeneous and dense zirconia film. As a result of weight kinetics of film which obtained in alcohol or aqueous solution having different polarity experimental data showed large deviation from theoretical ones calculated by Zhang's kinetic model. It had been shown that the weight affecting factors was largely dependent on properties other than dielectric constant and viscosity of solvent zeta potential appiled field and time. In initial stage a main factor of the drastic weight increase was the capillary drag of porous substrate. The cause of weight decrease with time in aqueous solution after 300 s was attributed to the defect of film by sagging and electrolytic reaction. The electrolyte film which prepared in alcohol solution with good wetting for substrate had better homogeneous and dense microstructure than one in aqueous solution with high surface tension.

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Preparation and Characterization of Antireflective Film in $TiO_2-SiO_2$ System by Sol-Gel Method (Sol-Gel법에 의한 $TiO_2-SiO_2$계 저반사 박막의 제조 및 특성)

  • 윤태일;최세영;이용근;이재호
    • Journal of the Korean Ceramic Society
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    • v.30 no.9
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    • pp.775-783
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    • 1993
  • TiO2-SiO2 system anti-reflective(AR) film was prepared to decrease reflectance on the glass surface. The experiments were carried out as fellow, 1) preparation & hydrolysis of TiO2-SiO2 system sols. 2) glass dipping, and 3) drying & heat treatment. We investigated the refractive index and thickness of film with viscosity, zeta-potential of sol, sol concentration, withdrawal speed, drying and heat treatment condition. As a result, we prepared good qualitative Quarter-Half-Quarter type anti-reflective film that had minimum, 0.02% and average reflectance, 0.087% in the visible region.

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Photooxidation of Poly(vinyl butyral) Films by UV/Ozone Irradiation (자외선/오존 조사에 의한 Poly(vinyl butyral)의 광산화)

  • Joo, Jin-Woo;Jang, Jinho
    • Textile Coloration and Finishing
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    • v.27 no.2
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    • pp.113-118
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    • 2015
  • Poly(vinyl butyral), PVB was photooxidized by UV/ozone irradiation and the effect of UV energy on the surface properties of the UV-irradiated PVB film were investigated by the measurement of reflectance, surface roughness, contact angles, elemental composition, and zeta potential. With increasing UV energy, reflectance decreased in the visible and ultraviolet regions particularly at the wavelength of 400nm. The irradiation produced nano-scale surface roughness including the maximum peak-to-valley roughness increased from 274nm for the unirradiated PVB to 370nm at the UV energy of $5.3J/cm^2$. The improved hydrophilicity was due to the higher $O_{1s}/C_{1s}$ resulting from the introduction of polar groups such as C=O bonds. The surface energy of the PVB film increased from $35.3mJ/m^2$ to $39.3mJ/m^2$ at the irradiation of $15.9J/cm^2$. While the zeta potentials decreased proportionally with increasing UV energy, the cationic dyeability of the PVB increased accordingly resulting from the improved affinity of the irradiated PVB surfaces containing the photochemically introduced anionic and dipolar dyeing sites.

Influence of pH on Sensitivity of $WO_3$ NO gas sensor fabricated by Sol-Coprecipitation method (Sol-Coprecipitation 법에 의한 NO 감지용 $WO_3$ 센서 제조시 pH의 영향)

  • Kim, Suk-Bong;Lee, Dae-Sik;Lee, Duk-Dong;Huh, Jeung-Soo
    • Journal of Sensor Science and Technology
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    • v.10 no.2
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    • pp.118-124
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    • 2001
  • When particles are dissolved in solution, they have different zeta-potentials depending on pH. Zeta-potential has an influence on particle separation, which can control particle size. And the size of $WO_3$ particle affects the sensitivity of $WO_3$ sensor for detecting NO gas. Therefore we study influence of pH on NO-sensing $WO_3$ gas sensor fabricated by Sol-Coprecipitation method. As pH increases from 2 to 7, dynamic mobility of $WO_3$ precursor was increased. When pH was 7, it showed the largest distribution separation. It means when pH is 7, we can make $WO_3$ powder which has smaller particle size. And it is confirmed by particle size analysis of $WO_3$ powder, X-ray diffration result of $WO_3$ sensing layer and surface morphology. It also affect NO sensing characteristics of $WO_3$ gas sensor. The sensing film synthesized at pH 7 showed the largest sensitivity.

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