Study of the Effect of $N_2$ Gas in Etched ZnO Thin Films in $Cl_2$ /Ar Plasma
($N_2$ 가스를 첨가한 $Cl_2$ /Ar 플라즈마에 의해 식각된 ZnO 박막의 식각 특성)
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- Proceedings of the Korean Institute of Surface Engineering Conference
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- 2009.10a
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- pp.223-224
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- 2009