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Study of Properties of HfO2 thin film for Low Power Mobile Information Device  

Kim, Won Bae (송원대학교 전기전자공학과)
Lee, Ho Young (초당대학교 정보통신공학과)
Publication Information
Journal of Satellite, Information and Communications / v.10, no.3, 2015 , pp. 89-93 More about this Journal
Abstract
Ion-beam irradiation(IB) on $HfO_2$ surface induced high-performance liquidcrystal(LC) driving at a 1-V threshold with vertical alignment of liquid crystals(LC). The high-k materials Atomic layer deposition was used to obtain LC orientation on ultrathin and high-quality films of $HfO_2$ layers. To analyze surface morphological transition of $HfO_2$ which can act as physical alignment effect of LC, atomic force microscopy images are employed with various IB intensities. The contact angle was measured to elucidate the mechanism of vertical alignment of LC on $HfO_2$ with IB irradiation. Contact angle measurement show the surface energy changes via IB intensity increasing.
Keywords
$HfO_2$ ultrathin film; Liquid Crystal Display; High-k materials; Low driving voltage; pretilt angle;
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