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http://dx.doi.org/10.7316/KHNES.2020.31.5.480

A Numerical Study on the Flow Uniformity according to Chamber Shapes Used for Test of the Semi-Conductor Chip  

LEE, DAEGYU (Mechanical Engineering, Graduate School of Jeonbuk National University)
MA, SANG-BUM (Clean Energy R&D Department, Korea Institute of Industrial Technology)
KIM, SUNG (Clean Energy R&D Department, Korea Institute of Industrial Technology)
KIM, JEONG-YEOL (Clean Energy R&D Department, Korea Institute of Industrial Technology)
KANG, CHAEDONG (Mechanical Engineering, Jeonbuk National University)
KIM, JIN-HYUK (Clean Energy R&D Department, Korea Institute of Industrial Technology)
Publication Information
Transactions of the Korean hydrogen and new energy society / v.31, no.5, 2020 , pp. 480-488 More about this Journal
Abstract
This study was conducted to improve the flow uniformity inside the chip tester through changing the flow path formation according to the inlet and outlet position of chamber. The internal flow and velocity distributions of the modified chamber models (Cases 1-3) were compared with the reference chamber model through three-dimensional Reynolds-averaged Navier-Stokes equations with k-ε turbulence model. The modified chamber models showed the superior flow uniformity characteristics compared to the reference chamber model. To investigate the flow uniformity in the chip tester, the standard deviation of the velocity was defined and compared. Through the internal flow analysis and assesment of the standard deviation, Case 2 among the test cases including the reference model showed the best flow uniformity generally.
Keywords
Chamber; Computational fluid dynamics; Semi-conductor test; Flow uniformity;
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