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http://dx.doi.org/10.5228/KSPP.2004.13.1.059

Nanotribology of PMMA Thin Films Using an AFM  

김승현 (국민대학교 신소재공학부)
김용석 (국민대학교 신소재공학부)
Publication Information
Transactions of Materials Processing / v.13, no.1, 2004 , pp. 59-64 More about this Journal
Abstract
Nano-scratch tests were performed on PMMA thin films spin-coated on a Si substrate using an atomic force microscopy (AFM) with loads ranging form 10nN to 100nN. At low loads, a ridge pattern was formed on the PMMA thin film surface. No wear particles were observed during the pattern-forming mild wear. At high loads, severe wear by plowing occurred, accompanied by wear particles. The film with the highest hardness showed the highest wear resistance. Friction force generated during the scratching was measured, which was closely related with surface deformation of the film. A simple empirical equation to deduce scratch hardness of the film from a linear fixed-distance scratch test was proposed, and scratching-speed dependency of the scratch hardness was displayed.
Keywords
Nanotribology; Nano-Scratch; PMMA; Thin Film; AFM; Friction Force; Wear Mechanism;
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