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http://dx.doi.org/10.4191/kcers.2014.51.5.375

A Comparative Study of Nanocrystalline TiAlN Coatings Fabricated by Direct Current and Inductively Coupled Plasma Assisted Magnetron Sputtering  

Chun, Sung-Yong (Department of Advanced Materials Science and Engineering, Mokpo National University)
Kim, Se-Chul (Department of Advanced Materials Science and Engineering, Mokpo National University)
Publication Information
Journal of the Korean Ceramic Society / v.51, no.5, 2014 , pp. 375-379 More about this Journal
Abstract
Nanocrystalline TiAlN coatings were prepared by reactively sputtering TiAl metal target with $N_2$ gas. This was done using a magnetron sputtering system operated in DC and ICP (inductively coupled plasma) conditions at various power levels. The effect of ICP power (from 0 to 300 W) on the coating microstructure, corrosion and mechanical properties were systematically investigated using FE-SEM, AFM and nanoindentation. The results show that ICP power has a significant influence on coating microstructure and mechanical properties of TiAlN coatings. With increasing ICP power, the coating microstructure evolved from the columnar structure typical of DC sputtering processes to a highly dense one. Average grain size of TiAlN coatings decreased from 15.6 to 5.9 nm with increasing ICP power. The maximum nano-hardness (67.9 GPa) was obtained for the coatings deposited at 300 W of ICP power. The smoothest surface morphology (Ra roughness 5.1 nm) was obtained for the TiAlN coating sputtered at 300 W ICP power.
Keywords
Inductively coupled plasma; ICP power; TiAlN coatings; Nanocrystalline; Comparative study;
Citations & Related Records
Times Cited By KSCI : 5  (Citation Analysis)
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