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http://dx.doi.org/10.4191/kcers.2014.51.3.190

Effects of Roll-to-Roll Sputtering Conditions on the Properties of Flexible TiO2 Films  

Park, Sang-Shik (School of Nano Materials Engineering, Kyungpook National University)
Publication Information
Journal of the Korean Ceramic Society / v.51, no.3, 2014 , pp. 190-196 More about this Journal
Abstract
Flexible $TiO_2$ films were deposited as dielectric materials for high-energy-density capacitors on polyethylene terephthalate (PET) substrates using a roll-to-roll sputtering method. Both the growth behavior and electrical properties of the flexible $TiO_2$ films were dependent on the sputtering pressure and $O_2$/Ar gas ratio during the sputtering process. All $TiO_2$ films had an amorphous structure regardless of the sputtering conditions due to the low substrate temperature. Microstructural characteristics such as the surface morphology and roughness of the films degraded with an increase in the sputtering pressure and $O_2$ gas concentration. The $TiO_2$ films deposited at a low pressure showed better electrical properties than those of films deposited at a high pressure. The $TiO_2$ films prepared at 10 mTorr exhibited a dielectric constant of approximately 90 at 1 kHz and a leakage current density of $5{\sim}6{\times}10^{-7}A/cm^2$ at 3 MV/cm.
Keywords
Flexible $TiO_2$ film; Roll-to-roll sputter; High-energy-density capacitor; Dielectric constant; Leakage current;
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Times Cited By KSCI : 2  (Citation Analysis)
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