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http://dx.doi.org/10.4191/kcers.2012.49.6.556

Growth Behavior of Nanocrystalline CrN Coatings by Inductively Coupled Plasma (ICP) Assisted Magnetron Sputtering  

Seo, Dae-Han (Department of Advanced Materials Science and Engineering, Mokpo National University)
Chun, Sung-Yong (Department of Advanced Materials Science and Engineering, Mokpo National University)
Publication Information
Journal of the Korean Ceramic Society / v.49, no.6, 2012 , pp. 556-560 More about this Journal
Abstract
Nanocrystalline CrN coatings were deposited by DC and ICP-assisted magnetron sputtering on Si (100) substrates. The influences of the ICP power on the microstructural and crystallographic properties of the coatings were investigated. For the generation of the ICP, radio frequency was applied using a dielectric-encapsulated coil antenna installed inside the deposition chamber. As the ICP power increased from 0 to 500W, the crystalline grain size decreased. It is believed that the decrease in the crystal grain size at higher ICP powers is due to resputtering of the coatings as a result of ion bombardment as well as film densification. The preferential orientation of CrN coatings changed from (111) to (200) with an increase in the ICP power. The ICP magnetron sputtering CrN coatings showed excellent surface roughness compared to the DC magnetron sputtering coatings.
Keywords
Inductively coupled plasma; ICP power; Crystal grain size; Preferential orientation;
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Times Cited By KSCI : 2  (Citation Analysis)
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