Browse > Article
http://dx.doi.org/10.4191/KCERS.2011.48.1.069

Structural and Corrosive Properties of ZrO2 Thin Films using N2O as a Reactive Gas by RF Reactive Magnetron Sputtering  

Jee, Seung-Hyun (Department of Materials Science and Engineering, Yonsei University)
Lee, Seok-Hee (Department of Materials Science and Engineering, Yonsei University)
Baek, Jong-Hyuk (Korea Atomic Energy Research Institute)
Kim, Jun-Hwan (Korea Atomic Energy Research Institute)
Yoon, Young-Soo (Department of Materials Science and Engineering, Yonsei University)
Publication Information
Journal of the Korean Ceramic Society / v.48, no.1, 2011 , pp. 69-73 More about this Journal
Abstract
A $ZrO_2$ thin film as a corrosion protective layer was deposited on Zircaloy-4 (Z-4) clad material using $N_2O$ as a reactive gas by RF reactive magnetron sputtering at room temperature. The Z-4 substrate was located in plasma or out of plasma during the $ZrO_2$ deposition process to investigate mechanical and corrosive properties for the plasma immersion. Tetragonal and monoclinic phases were existed in $ZrO_2$ thin film immersed in plasma. We observed that a grain size of the $ZrO_2$ thin film immersed in plasma state is larger than that of the $ZrO_2$ thin film out of plasma state. In addition, the corrosive property of the $ZrO_2$ thin films in the plasma was characterized using the weight gains of Z-4 after the corrosion test. Compared with the $ZrO_2$ thin film immersed out of plasma, the weight gains of $ZrO_2$ thin film immersed in plasma were larger. These results indicate that the $ZrO_2$ film with the tetragonal phase in the $ZrO_2$ can protect the Z-4 from corrosive phenomena.
Keywords
Protective layer; $N_2O$ reactive gas; Zirconium oxide($ZrO_2$); Cladding material; Corrosion;
Citations & Related Records
Times Cited By KSCI : 5  (Citation Analysis)
Times Cited By SCOPUS : 0
연도 인용수 순위
1 J. H. Lee, J.H Koo, H. S. Shim, and H. T. Jeon, "Characteristic of $ZrO_2$ Films Deposited by Using the Atomic Layer Deposition Method," J. Kor. Phys. Soc., 44 915-19 (2004).   과학기술학회마을
2 Nobuya Iwamoto, Yukio Makino, and Masayoshi Kamai, "Characterization of Rf-sputtered Zirconia Coatings," Thin Solid Films, 153 233-42 (1987).   DOI
3 S. Ben Amor, B. Rogier, G. Baud, M. Jacquet, and M. Nardin, "Characterization of Zirconia Films Deposited by r.f. Magnetron Sputtering," Mater. Sci. Eng. B, 57 [1] 28-39 (1998).   DOI
4 Kuo D.H. and Chien C.H., "Growth and Properties of Sputtered Zirconia and Zirconia-silica Thin Films," Thin Solid Films, 429 [1] 40-5 (2003).   DOI
5 S. H. Kim, K. H. Lee, J. H. Ko, and Y. S. Yoon, "Structural and Corrosive Properties of $ZrO_2$ Thin Films on Zircaloy-4 by RF Reactive Magnetron Sputtering," J. Kor. Phys. Soc., 49 [3] 1207-10 (2006).   과학기술학회마을
6 J. H. Baek, Y. H. Jeong, and I. S. Kim, "Effects of the Accumulated Annealing Parameter on the Corrosion Characteristics of a Zr-0.5Nb-1.0Sn-0.5Fe-0.25Cr Alloy," J. Nucl. Mat., 280 235-45 (2000).   DOI
7 J. B. Kang, "Mechanical Properties Observation of Ce-TZP Ceramics by Quantity Change of $CeO_2$(in Korean)," J. Kor. Ceram. Soc., 47 [5] 439-44 (2010).   과학기술학회마을   DOI
8 S. H. Choi, J. S. Kim, and Y. S. Yoon, "Effect of Plasma Immersion on Crystallinity of $V_2O_5$ Film Grown by dc Reactive Sputtering at Room Temperature," Thin Solid Films, 493 [1] 1-5 (2005).   DOI
9 S.-H. Chae, Y.-W. Kim, I.-H. Song, H.-D. Kim, and J. S. Bae, "Effects of Template Size and Content on Porosity and Strength of Macroporous Zirconia Ceramics(in Korean)," J. Kor. Ceram. Soc., 46 [1] 35-40 (2009).   과학기술학회마을   DOI   ScienceOn
10 K.-H. Lee, J.-P. Ahn, J.-S. Park, Y.-S. Lee, and B.-H. Lee, "Preparation and Characterization of Black Color Zirconia by Impregnation Method Used by Graphite(in Korean)," J. Kor. Ceram. Soc., 46 [4] 379-84 (2009).   과학기술학회마을   DOI
11 M. I. Maleto, L. I. Solovjeva, E. P. Turevskaya, K. A. Vorotilov, and M. I. Yanovskaya, "Alkoxy-Derived $Y_2O_3$-stabilized $ZrO_2$ Thin-Films," Thin Solid Films, 249 [1] 1-5 (1994).   DOI
12 J. S. Kim, H. A. Marzouk, and P. J. Reucroft, "Deposition and Structural Characterization of $ZrO_2$ and Yttria-Stabilized $ZrO_2$ Films by Chemical-Vapor-Deposition," Thin Solid Films, 254 [1] 33-8 (1995).   DOI
13 D. D. Hass, P. A. Parrish, and H. N. G. Wadley, "Electron Beam Directed Vapor Deposition of Thermal Barrier Coatings," J. Vac. Sci. Technol. A, 16 [6] 3396-401 (1998).   DOI
14 N. Sonnenberg, A. S. Longo, M. J. Cima, B. P. Chang, K. G. Ressler, P. C. McIntyre, and Y. P. Liu, "Preparation of Biaxially Aligned Cubic Zirconia Films on Pyrex Glass Substrates Using Ion-beam Assisted Deposition," J. Appl. Phys., 74 [2] 1027-34 (1993).   DOI