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http://dx.doi.org/10.4191/KCERS.2010.47.6.479

Microstructure and Mechanical Properties of Nanocrystalline TiN Films Through Increasing Substrate Bias  

Chun, Sung-Yong (Department of Advanced Materials Science and Engineering, Mokpo National University)
Publication Information
Journal of the Korean Ceramic Society / v.47, no.6, 2010 , pp. 479-484 More about this Journal
Abstract
Microstructural and mechanical properties of the TiN films deposited on Si substrates under various substrate bias voltages by a reactive magnetron sputtering have been studied. It was found that the crystallographic texture, microstructural morphology and mechanical property of the TiN films were strongly depended on the substrate bias voltage. TiN films deposited without bias exhibited a mixed (200)-(111) texture with a strong (200) texture, which subsequently changed to a strong (111) texture with increasing bias voltage. It is also observed that the crystallite size decreases with increasing bias voltage, which corresponds to the increasing diffraction peak width of XRD patterns. The average surface roughness was calculated from AFM images of the films; these results indicated that the average surface roughness was increased with an increase in the bias voltage of the coatings.
Keywords
TiN coating; Substrate bias; Texture; Stress; Nanoindentation;
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Times Cited By KSCI : 1  (Citation Analysis)
Times Cited By SCOPUS : 2
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