1 |
D. M. Yeo, and S. Y. Shin, “Polymer-silica Hybrid rmooptic Switch with Low Crosstalk,” Optic. Comm., 267 [2] 388-93 (2006).
DOI
ScienceOn
|
2 |
M. C. Oh, C. Zhang, H. J. Lee, W. H. Steier, and H. R. Fet-terman, “Low-Loss Interconnection Between Electrooptic and Passive Polymer Waveguide With a Vertical Taper,” IEEE Photon. Technol. Lett., 14 [8] 1121-23 (2002).
DOI
ScienceOn
|
3 |
W. Jiang, L. Gu, X. Chen, and R. T. Chen, “Photonic Crystal Waveguide Moduluators for Silicon Photonics: Device Physics and Some Recent Progress,” Solid State Electron., 51 [10] 1278-86 (2007).
DOI
ScienceOn
|
4 |
G. Shi, G. Xu, and G. Han, “Preparation and Photoluminescence of Nanocrystalline Si-rich Silicon Oxide Films by PECVD,” Mater. Lett., 61 [2] 463-65 (2006).
DOI
ScienceOn
|
5 |
M. Burchielli, G. Conte, G. Fameli, C. Felici, M. C. Rossi, A. Rubino, S. Salvatori, and F. Villani, “Functional Properties of Silicon Nanocrystals in Oxygen-rich Amorphous Matrices Formed by Laser Irradiation of Substoichiometric Silicon Oxides,” Mater. Sci. Eng. C, 19 [1-2] 175-79 (2002).
DOI
ScienceOn
|
6 |
J. H. Son, H. B. Kim, C. N. Whang, M. C. Sung, K. Jeong, S. Im, and K. H. Chae, “Visible Photoluminescence from Si Ion-beam-mixed /Si/ Layers Deposited by E-beam Evaporation,” Nucl. Instrum. Meth. Phys. Res. B, 216 346-49 (2004).
DOI
ScienceOn
|
7 |
S. V. Bhat, A. Govindaraj, and C. N. R. Rao, “Tuning the Emission Bands of Nanophosphors Through the Refractive Index of the Medium,” Chem. Phys. Lett., 422 [4-6] 323-27 (2006).
DOI
ScienceOn
|
8 |
R. H. Doremus, “Diffusion of Oxygen and Silicon in Silicon: Silicon Monoxide Model,” Mater. Res. Soc., 16 [1] 185-91 (2001).
DOI
ScienceOn
|
9 |
M. Saadoun, B. Bessaïs, N. Mliki, M. Ferid, H. Ezzaouia, and R. Bennaceur, “Formation of Luminescent Phase from Vapour Etching-based Porous Silicon,” Appl. Surf. Sci., 210 [3] 240-48 (2003).
DOI
ScienceOn
|
10 |
A. L. Lopez, M. A. Mijares, and O. Malik, “Optical and Electrical Properties of Silicon Rich Oxide Films for Optical Sensors,” Sensor Actuator. A, 132 [1] 278-82 (2006).
DOI
ScienceOn
|
11 |
F. Bertin, T. Baron, D. Mariolle, F. Martin, A. Chabli, and M. Dupuy, “Charaterization of Deposited Nanocrystalline Silicon by Spectroscopic Ellipsometry,” Phys. Stat. Sol., 175 [405] 405-12 (1999).
DOI
|
12 |
C. Gravalidis, S. Logothetidis, N. Hatziaras, A. Laskarakis, I. Tsiaoussis, and N. Frangis, “Characterization of Si Nanocrystals into Matrix,” Appl. Surf. Sci., 253 [1] 385-88 (2006).
DOI
ScienceOn
|
13 |
H. Wong, V. Filip, C. K. Wong, and P. S. Chung, “Silicon Integrated Photonics Begins to Revolutionize,” Microelectron. Reliab., 47 [1] 1-10 (2007).
DOI
ScienceOn
|
14 |
M. Riera, J. A. Rodriguez, J. Barreto, and C. Dominguez, “Modeling of Non-stoichiometric Silicon Oxides Obtained by Plasma Enhanced Chemical Vapour Deposition Process,” Thin Solid Films, 515 [7-8] 3380-86 (2007).
DOI
ScienceOn
|
15 |
T. S. Iwayama, Y. Terao, A. Kamiya, M. Takeda, S. Nakao, and K. Saitoh, “Visible Photoluminescence from Silicon Nanocrystals Formed in Silicon Dioxide by Ion Implantation and Thermal Processing,” Thin Solid Films, 276 [1-2] 104-07 (1996).
DOI
ScienceOn
|
16 |
C. S. Yang, C. J. Lin, P. Y. Kuei, S. F. Horng, C. C. H. Hsu, and M. C. Liaw, “Quantum Size Effects on Photoluminescence from Si Nanocrystals in PECVD Silicon-richoxide,” Appl. Sur. Sci., 113-114 116-20 (1997).
DOI
ScienceOn
|
17 |
H. Jimenez, E. Restrepo, and A. Devia, “Effect of the Substrate Temperature in ZrN Coatings Grown by the Pulsed Arc Technique Studied by XRD,” Surf. Coating. Tech., 201 [3-4] 1594-601 (2006).
DOI
ScienceOn
|
18 |
S. T. Lin and C. Lee, “Growth of Tantalum Boron Nitride Films on Si by Ratio Frequency Reactive Sputtering: Effect of /Ar Flow Ratio,” Mater. Chem. Phys., 82 [3] 691-97 (2003).
DOI
ScienceOn
|
19 |
L. S. Liao, X. M. Bao, N. S. Li, X. Q. Zheng, and N. B. Min, “Blue-, Green-, and Red-light Emission from - Implanted Thermal Films on Crystalline Silicon,” J. Lumin., 68 [2] 199-204 (1996).
DOI
ScienceOn
|
20 |
L. Bi, Y. He and J. Y. Feng, “Effect of Post-annealing in Oxygen Atmosphere on the Photoluminescence Properties of Nc-si Rich Films,” J. Cryst. Growth., 289 [2] 564- 67 (2006).
DOI
ScienceOn
|
21 |
S. Charvet, R. Madelon, R. Rizk, B. Garrido, O. G. Varona, M. Lopez, A. P. Rodriguez, and J. R. Morante, “Substrate Temperature Dependence of the Photoluminescence Efficiency of Co-sputtered Si/ Layers,” J. Lumin., 80 [1] 241-45 (1999).
DOI
ScienceOn
|
22 |
P. Roura, J. Farjas, A. Pinyol, and E. Bertran, “The Crystallization Temperature of Silicon Nanoparticles,” Nanotechnol., 18 [17] 175705.1-4 (2007).
DOI
ScienceOn
|
23 |
A. Sassella, A. Borghesi, F. Corni, A. Monelli, G. Ottaviani, R. Tonini, B. Pivac, M. Bacchetta, and L. Zanotti, “Infrared Study of Si-rich Silicon Oxide Films Deposited by Plasmaenhanced Chemical Vapor Deposition,” J. Vac. Sci. Technol. A, 15 [2] 377-89 (1997).
DOI
ScienceOn
|
24 |
S. Charvet, R. Madelon, F. Gourbilleau, and R. Rizk, “Ellipsometric Spectroscopy Study of Photoluminescent Si/Systems Obtained by Magnetron Co-sputtering,” J. Lumin., 80 [1-4] 257-61 (1999).
DOI
ScienceOn
|
25 |
B. Sun, Y. R. Chen, P. Zhou, C. H. Xu, Y. F. Kong, Y. X. Zheng, and L. Y. Chen, “Ellipsometric Study of the Optical Properties of Silicon-Based Si: Composite Thin Films under Different Annealing Temperatures,” J. Korean Phys. Soc., 49 [5] 2184-87 (2006).
|
26 |
J. Xu, H. Umehara, and I. Kojima, “Effect of Deposition Parameters on Composition, Structures, Density and Topography of CrN Films Deposited by r.f. Magnetron Sputtering,” Appl. Surf. Sci., 201 [1-4] 208-18 (2002).
DOI
ScienceOn
|
27 |
M. Barozzi, E. Iacob, L. Vanzetti, M. Bersani, M. Anderle, G. Pucker, and C. Kompocholis, “Analytical Methodology Development for Silicon-rich-oxide Chemical and Physical Characterization,” Rev. Adv. Mater. Sci., 15 [1] 56-62 (2007).
|
28 |
R. Schmidt, A. Basu, A. W. Brinkman, T. P. A. Hase, Z. Klusek, S. Pierzgalski, and P. K. Datta, “Structural Properties of rf Magnetron Sputter Deposited Nickel Manganate Thin Films,” Surf. Sci., 595 [1-3] 239-48 (2005).
DOI
ScienceOn
|
29 |
R. Tilley, “Colour and the Optical Properties of Materials,” pp. 110-17, John Willey & Sons, New York, 2000.
|
30 |
S. G. Jung, “Display Process and Thin Film Thickness Measurement,” Prospective of Industrial Chemistry, 8 [4] 96-105 (2005).
|