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http://dx.doi.org/10.4191/KCERS.2008.45.9.567

Microstructure and Hardness Changes of the CVD-ZrC Film with Different Deposition Temperature  

Park, Jong-Hoon (Nuclear Materials Research Division, Korea Atomic Energy Research Institute)
Jung, Choong-Hwan (Nuclear Materials Research Division, Korea Atomic Energy Research Institute)
Kim, Weon-Ju (Nuclear Materials Research Division, Korea Atomic Energy Research Institute)
Kim, Do-Jin (Department of Materials Engineering College of Engineering, Chungnam National University)
Park, Ji-Yeon (Nuclear Materials Research Division, Korea Atomic Energy Research Institute)
Publication Information
Journal of the Korean Ceramic Society / v.45, no.9, 2008 , pp. 567-571 More about this Journal
Abstract
The properties of a grown film by the chemical vapor deposition process depend on the deposition temperature because the deposition mechanism of the CVD film is controlled by the deposition temperature. The preferred orientation of the zrC film changed from (111) to (220) or (200) with an increase of the deposition temperature. The grain size of the ZrC film changes from $0.8{\mu}m$ to $2.5{\mu}m$ in the range of 1350 to $1500^{\circ}C$. The hardness of the deposited ZrC film depended on the preferred orientation and the grain size. The hardness of the ZrC film deposited at $1400^{\circ}C$ was 31 GPa.
Keywords
Zirconium carbide; CVD; Deposition temperature; Preferred orientation; Grain size; Hardness;
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