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http://dx.doi.org/10.4191/KCERS.2007.44.8.445

Effect of Boron Carbide on the Morphology of SiC Conversion Layer of Graphite Substrate formed by Chemical Vapor Reaction  

Hong, Hyun-Jung (Nano Materials Team, KICET(Korea Institute of Ceramic Engineering and Technology))
Riu, Doh-Hyung (Nano Materials Team, KICET(Korea Institute of Ceramic Engineering and Technology))
Cho, Kwang-Youn (Nano Materials Team, KICET(Korea Institute of Ceramic Engineering and Technology))
Kong, Eun-Bae (Nano Materials Team, KICET(Korea Institute of Ceramic Engineering and Technology))
Shin, Dong-Geun (Nano Materials Team, KICET(Korea Institute of Ceramic Engineering and Technology))
Shin, Dae-Kyu (Hynix Semiconductor)
Lee, Jae-Sung (Department of Metallurgy and Materials Engineering, Hanyang University)
Publication Information
Abstract
A conversion layer of SiC was fabricated on the graphite substrate by a chemical vapor reaction method in order to enhance the oxidation resistance of graphite. The effect of boron carbide containing powder bed on the morphology of SiC conversion layer was investigated during the chemical vapor reaction of graphite with the reactive silicon-source at $1650^{\circ}C\;and\;1700^{\circ}C$ for 1 h. The presence of boron species enhanced the conversion of graphite into SiC, and altered the morphology of the conversion layer significantly as well. A continuous and thick SiC conversion layer was formed only when the boron source was used with the other silicon compounds. The boron is deemed to increase the diffusion of SiOx in SiC/C system.
Keywords
CVR; Chemical Vapor Reaction; Graphite; SiC coating; Boron carbide doping;
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Times Cited By KSCI : 6  (Citation Analysis)
Times Cited By SCOPUS : 0
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