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http://dx.doi.org/10.4191/KCERS.2007.44.3.169

A Study on the CVD Deposition for SiC-TRISO Coated Fuel Material Fabrication  

Kim, Jun-Gyu (Department of Ceramic Engineering, Yonsei University)
Kum, E-Sul (Department of Ceramic Engineering, Yonsei University)
Choi, Doo-Jin (Department of Ceramic Engineering, Yonsei University)
Kim, Sung-Soon (Department of Ceramic Engineering, Yonsei University)
Lee, Hong-Lim (Department of Ceramic Engineering, Yonsei University)
Lee, Young-Woo (Functional Materials, Korea Atomic Energy Research Institute)
Park, Ji-Yeon (Functional Materials, Korea Atomic Energy Research Institute)
Publication Information
Abstract
TRISO coated fuel particle is one of the most important materials for hydrogen production using HTGR (high temperature gas cooled reactors). It is composed of three isotropic layers: inner pyrolytic carbon (IPyC), silicon carbide (SiC), outer pyrolytic carbon (OPyC) layers. In this study, TRISO coated fuel particle layers were deposited through CVD process in a horizontal hot wall deposition system. Also the computational simulations of input gas velocity, temperature profile and pressure in the reaction chamber were conducted with varying process variable (i.e temperature and input gas ratios). As deposition temperature increased, microstructure, chemical composition and growth behavior changed and deposition rate increased. The simulation showed that the change of reactant states affected growth rate at each position of the susceptor. The experimental results showed a close correlation with the simulation results.
Keywords
TRISO; IPyC; SiC; OPyC; CVD;
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Times Cited By KSCI : 1  (Citation Analysis)
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1 D. J. Choi, J. G. Lee, J. S. Soo, Y. W. Kim, and D. J. Kim, 'Low Pressure Chmical Vapor Deposition of Silicon Carbide( in Korean),' J. Kor. Ceram. Soc., 31 [3] 257-64 (1994)   과학기술학회마을
2 S. J. Xu, J. G. Zhou, and B. Z. Zhang, 'Effect of Deposition Temperature on the Properties of Pyrolytic SiC,' J. Nucl. Mater., 224 12-6 (1995)   DOI   ScienceOn
3 H. Nickel, H. Nabielek, G. Pott, and A. W. Mehner, 'Long Time Experience with the Development of HTR Fuel Elements in Germany,' Nucl. Eng. Des., 217 141-51 (2002)   DOI   ScienceOn
4 S. Kouadri-Mostefa, P. Serp , M. Hemati, and B. Caussat, 'Silicon Chemical Vapor Deposition (CVD) on Microporous Powders in a Fluidized Bed,' Powder Technology, 120 82- 7 (2001)   DOI   ScienceOn
5 K. Minato and K. Fukuda, 'CHemical Vapor Deposition of Silicon Carbide for Coated Fuel Particles,' J. Nucl. Mater., 149 233-46 (1987)   DOI   ScienceOn
6 B. G. Kim, Y. Choi, J. W. Lee, Y. W. Lee, D. S. Sohn, and G. M. Kim, 'Multi-Layer Coating of Silicon Carbide and Pyrolytic Carbon on $UO_2$ Pellets by a Combustion Reaction,' J. Nucl. Mater., 281 163-70 (2000)   DOI   ScienceOn
7 R. Moene, L. F. Kramer, J. Schoonman, M. Makkee, and J. A. Moulijn, 'Synthesis of High Surface Area Silicon Carbide Byfluidized Bed Chemical Vapour Deposition,' Appl. Catalysis A: General, 162 181-91 (1997)   DOI   ScienceOn
8 Y. J. Lee and D. J. Choi, 'Comparison of Diluent Gas Effect on the Growth Behavior of Horizontal CVD SiC with Analytical and Experimental Data,' Surface & Coating Tech., 177-178 415-19 (2004)   DOI   ScienceOn
9 P. A. Taylor, M. Bozack, W. J. Choyke, and J. T. Yates, 'XRay Photoelectron Spectroscopy Study of Si-C Film Growth by Chemical Vapor Deposition of Ethylene on Si(100),' J. Appl. Phys., 65 [3] 1099-105 (1989)   DOI
10 D. J. Kim and D. J. Choi, 'High-Temperature Corrosion Resistance of Chmically Vapor Deposited Silicon Carbide Against Hydrogen Chloride and Hydrogen Gaseous Environments,' J. Am. Ceram. Soc., 79 [2] 503-06 (1996)   DOI
11 D. Briggs and M. P. Seah, 'Practical Surface Analysis,' vol. 1, John Wiley & Sons Ltd., 1990
12 D. Lespiaux, F. Langlais, and R. Naslain, 'Chemisorption on $\beta$-SiC and Amorphous $SiO_2$ during CVD of Silicon Carbide from the Si-C-H-Cl System Correlations with the Nucleation Process,' J. Mater. Sci., 265 40-51 (1995)   DOI   ScienceOn
13 J. H. Oh, B. J. Oh, and D. J. Choi, 'The Effect of Input Gas Ratio on the Growth Behavior of Chemical Vapor Deposited SiC Films,' J. Mater. Sci., 36 1695-700 (2001)   DOI   ScienceOn
14 G. K. Miller, D. A. Petti, D. J. Varacalle Jr., and J. T. Maki, 'Statistical Approach and Benchmarking for Modeling of Multi-Dimensional Behavior in TRISO-Coated Fuel Particles,' J. Nucl. Mater., 317 69-82 (2003)   DOI   ScienceOn
15 Y. J. Lee, D. J. Choi, J. Y. Park, and G. W. Hong, 'The Effect of Diluent Gases on the Growth Behavior of CVD SiC Films with Temperature,' J. Mater. Sci., 35 4519-26 (2000)   DOI   ScienceOn