Browse > Article
http://dx.doi.org/10.4191/KCERS.2006.43.1.038

The Plasma Modification of Polycarbonate and Polyethersulphone Substrates for Ta2O5 Thin Film Deposition  

Kang, Sam-Mook (Department of Advanced Materials Engineering, Sungkyunkwan University)
Yoon, Seok-Gyu (Department of Advanced Materials Engineering, Sungkyunkwan University)
Jung, Won-Suk (Department of Advanced Materials Engineering, Sungkyunkwan University)
Yoon, Dae-Ho (Department of Advanced Materials Engineering, Sungkyunkwan University)
Publication Information
Journal of the Korean Ceramic Society / v.43, no.1, 2006 , pp. 38-41 More about this Journal
Abstract
Surface of PC (Polycarbonate) and PES (Polyethersulphone) treated by plasma modification with rf power from 50 W to 200 W substrates in Ar (3 sccm), $O_2$ (12 sccm) atmosphere. From the results of modified substrates in XPS (X-ray Photoelectron Spectroscopy), the ratio of oxide containing bond increased with rf power. As the rf power was 200 W, the contact angle was the lowest value of 14.09 degree. And the datum from AFM (Atomic Force Microscopy), rms roughness value of PES and PC substrates increased with rf power. We could deposit $Ta_2O_5$ with good adhesion on plasma treated PES and PC substrates using by in-situ rf magnetron sputter.
Keywords
Plasma treatment; Adhesion; Contact angle; Polyethersulphone; Polycarbonate;
Citations & Related Records
연도 인용수 순위
  • Reference
1 J. T. Kim and D. C. Lee, 'A Sudy of the Surface Modification of Polyimide Film by Ion Implantation,' J. KIEEME, 11 [4] 293-97 (1998)
2 S. H. Han, Y. H. Lee, H. D. Kim, and G. H. Kim, 'Polymer Surface Modification by Plasma Source Ion Implantation,' Surf and Coating Tech., 93 261-64 (1997)   DOI   ScienceOn
3 K. Harth and H. Hibst, 'Surface Modification of Polypropylene in Oxygen and Nitrogen Plasmas,' Surf and Coating Tech., 59 350-55 (1993)   DOI   ScienceOn
4 W. Petasch, E. Rauchle, M. Walker, and P. Elsner, 'Improvement of the Adhesion of Low-Energy Polymers by a Short-Time Plasma Treatment' Surf and Coating Tech., 74-75 682-88 (1995)   DOI   ScienceOn
5 N. Sprang, D. Theirich, and J. Engemann, 'Plasma and Ion Beam Surface Treatment of Polyethylene,' Surf and Coating Tech., 74-75 689-95 (1995)   DOI   ScienceOn
6 M. Keil, C. S. Rastomjee, A. Rajagopal, and H. Sotobayashi, 'Argon Plasma-Induced Modifications at the Surface of Polycarbonate Thin Films,' Appl. Surf. Sci. 125 273-86 (1998)   DOI   ScienceOn
7 H. S. Nalwa, Handbook of Thin Film Materials; Vol 1, pp. 241-51, Academic Press, A Division of Harcourt, lnc., 2002
8 C. Chaneliere, J. L. Autran, R. A. B. Devine, and B. Balland, 'Tantalum Pentoxide Thin Films for Advanced Dielectric Applications,' Mater. Sci. Eng., R22 269-322 (1998)
9 F. Rubio, J. Denis, J. M. Albella, and J. M. Martinez-Duart, 'Sputtered $Ta_2O_5$ Antireflection Coatings for Silicon Solar Cells,' Thin Solid Films, 90 405-08 (1982)   DOI   ScienceOn
10 S. G. Yoon, H. K. Kim, G. Y. Kim, M. J. Kim, and H. M. Lee, et al., 'Characteristics Analysis and Manufacture of $Ta_2O_5$ Thin Films Prepared by Dual Ion-Beam Sputtering Deposition with Change of $Ar/O_2$ Gas Flow Rate of Assist Ion Beam(in Korean),' J. Kor. Ceram. Soc., 40 [12] 116569 (2003)